公开(公告)号：BR8600996A

公开(公告)日：1986-11-18

申请号：BR8600996

申请日：1986-03-07

Applicant: IBM

Inventor： BABICH EDWARD DARKO ,  HATZAKIS MIHAEL ,  JACOBS SCOTT LAURENCE ,  PARASCZCAK JURI ROSTYSLAV ,  SHAW JANE MARGARET ,  WITMAN DAVID FRANK

IPC: C08L61/00 ,  C08K5/549 ,  C08L33/00 ,  C08L33/02 ,  C08L61/04 ,  C08L61/06 ,  G03C1/00 ,  G03C1/72 ,  G03F7/004 ,  G03F7/038 ,  G03F7/26 ,  G03F7/38 ,  H01L21/027 ,  C08J7/04

公开(公告)号：DE3673219D1

公开(公告)日：1990-09-13

申请号：DE3673219

申请日：1986-03-11

Applicant: IBM

Inventor： BABICH EDWARD DARKO ,  HATZAKIS MICHAEL ,  LIUTKIS JOHN JOSEPH ,  PARASCZCAK JURI ROSTYSLAV ,  SHAW JANE MARGARET

IPC: G03C5/00 ,  C08F2/48 ,  C08F290/00 ,  C08F299/00 ,  C08F299/08 ,  C08K5/07 ,  C08L83/07 ,  G03F7/00 ,  G03F7/004 ,  G03F7/038 ,  G03F7/075 ,  H01L21/30

公开(公告)号：AU5260586A

公开(公告)日：1986-09-25

申请号：AU5260586

申请日：1986-01-22

Applicant: IBM

Inventor： BABICH EDWARD DARKO ,  HATZAKIS MICHAEL ,  JACOBS SCOTT LAURENCE ,  PARASCZCAK JURI ROSTYSLAV ,  SHAW JANE MARGARET ,  WITMAN DAVID FRANK

IPC: C08L61/00 ,  C08K5/549 ,  C08L33/00 ,  C08L33/02 ,  C08L61/04 ,  C08L61/06 ,  G03C1/00 ,  G03C1/72 ,  G03F7/004 ,  G03F7/038 ,  G03F7/26 ,  G03F7/38 ,  H01L21/027 ,  C08G8/28 ,  C08J3/24 ,  C08K5/54 ,  C08L61/10 ,  G03F7/02

公开(公告)号：DE3484271D1

公开(公告)日：1991-04-18

申请号：DE3484271

申请日：1984-12-11

Applicant: IBM

Inventor： BABICH EDWARD DARKO ,  HATZAKIS MICHAEL ,  PARASZCAK JURIJ ROSTYSLAV ,  SHAW JANE MARGARET

IPC: G03C1/72 ,  G03F7/004 ,  G03F7/023 ,  G03F7/038 ,  G03F7/075 ,  H01L21/027 ,  G03F7/022

Abstract: A composition of matter is obtained by interreacting a quinone diazo compound and an organosilicon compound. Such a composition can be used as a resist in a lithographic process.

公开(公告)号：AU595127B2

公开(公告)日：1990-03-22

申请号：AU2012588

申请日：1988-07-28

Applicant: IBM

Inventor： BABICH EDWARD DARKO ,  WITMAN DAVID FRANK ,  SHAW JANE MARGARET ,  PARASCZCAK JURI ROSTYSLAV ,  JACOBS SCOTT LAURENCE ,  HATZAKIS MICHAEL

IPC: C08L61/00 ,  C08K5/549 ,  C08L33/00 ,  C08L33/02 ,  C08L61/04 ,  C08L61/06 ,  G03C1/00 ,  G03C1/72 ,  G03F7/004 ,  G03F7/038 ,  G03F7/26 ,  G03F7/38 ,  H01L21/027 ,  C08G8/28 ,  C08K5/54 ,  C08K5/56 ,  G03F7/02

公开(公告)号：AU576049B2

公开(公告)日：1988-08-11

申请号：AU5260586

申请日：1986-01-22

Applicant: IBM

Inventor： BABICH EDWARD DARKO ,  HATZAKIS MICHAEL ,  JACOBS SCOTT LAURENCE ,  PARASCZCAK JURI ROSTYSLAV ,  SHAW JANE MARGARET ,  WITMAN DAVID FRANK

IPC: C08L61/00 ,  C08K5/549 ,  C08L33/00 ,  C08L33/02 ,  C08L61/04 ,  C08L61/06 ,  G03C1/00 ,  G03C1/72 ,  G03F7/004 ,  G03F7/038 ,  G03F7/26 ,  G03F7/38 ,  H01L21/027 ,  C08G8/28 ,  C08J3/24 ,  C08K5/54 ,  C08L61/10 ,  G03F7/02

公开(公告)号：DE69024452T2

公开(公告)日：1996-07-11

申请号：DE69024452

申请日：1990-10-08

Applicant: IBM

Inventor： BABICH EDWARD DARKO ,  GELORME JEFFREY DONALD ,  HATZAKIS MICHAEL ,  SHAW JANE MARGARET ,  STEWART KEVIN JAY ,  WITMAN DAVID FRANK

IPC: G03F7/031 ,  C08F2/50 ,  C08G59/68 ,  C08G77/14 ,  C08G77/22 ,  C08G85/00 ,  C08L83/04 ,  C08L83/06 ,  G03F7/027 ,  G03F7/029 ,  G03F7/075

Abstract: An ultraviolet light sensitive photoinitiator composition that includes at least one anthracene derivative represented by the formula: wherein X is CH=CH2 or -(-CH2-)-n0-(-R) with R being H or wherein each R , R and R individually is selected from the group of alkyl, alkenyl, aryl, wherein each R , R and R individually is selected from the group of alkyl, alkenyl and aryl; wherein m is an integer of 0 to 4, p is an integer of 0 to 4; and is n being 1 to 2; and onium salt; and an organic solvent. The composition is used for cationic polymerization of cationic polymerizable materials including in the formation of a pattern of a photoresist. Also certain novel epoxy-functionalized organosilicons are provided that are sensitive to radiation including E-beam radiation and exhibit resistance to oxygen reactive ion etching.

公开(公告)号：DE69024452D1

公开(公告)日：1996-02-08

申请号：DE69024452

申请日：1990-10-08

Applicant: IBM

Inventor： BABICH EDWARD DARKO ,  GELORME JEFFREY DONALD ,  HATZAKIS MICHAEL ,  SHAW JANE MARGARET ,  STEWART KEVIN JAY ,  WITMAN DAVID FRANK

IPC: G03F7/031 ,  C08F2/50 ,  C08G59/68 ,  C08G77/14 ,  C08G77/22 ,  C08G85/00 ,  C08L83/04 ,  C08L83/06 ,  G03F7/027 ,  G03F7/029 ,  G03F7/075

Abstract: An ultraviolet light sensitive photoinitiator composition that includes at least one anthracene derivative represented by the formula: wherein X is CH=CH2 or -(-CH2-)-n0-(-R) with R being H or wherein each R , R and R individually is selected from the group of alkyl, alkenyl, aryl, wherein each R , R and R individually is selected from the group of alkyl, alkenyl and aryl; wherein m is an integer of 0 to 4, p is an integer of 0 to 4; and is n being 1 to 2; and onium salt; and an organic solvent. The composition is used for cationic polymerization of cationic polymerizable materials including in the formation of a pattern of a photoresist. Also certain novel epoxy-functionalized organosilicons are provided that are sensitive to radiation including E-beam radiation and exhibit resistance to oxygen reactive ion etching.

公开(公告)号：DE3679434D1

公开(公告)日：1991-07-04

申请号：DE3679434

申请日：1986-03-11

Applicant: IBM

Inventor： BABICH EDWARD DARKO ,  HATZAKIS MICHAEL ,  JACOBS SCOTT LAURENCE ,  PARASCZCAK JURI ROSTYSLAV ,  SHAW JANE MARGARET ,  WITMAN DAVID FRANK

IPC: C08L61/00 ,  C08K5/549 ,  C08L33/00 ,  C08L33/02 ,  C08L61/04 ,  C08L61/06 ,  G03C1/00 ,  G03C1/72 ,  G03F7/004 ,  G03F7/038 ,  G03F7/26 ,  G03F7/38 ,  H01L21/027 ,  G03F7/075