公开(公告)号：JPH05217970A

公开(公告)日：1993-08-27

申请号：JP24774592

申请日：1992-09-17

Applicant: IBM

Inventor： TEIBAA RUISU BAUAA ,  UIRIAMU ARUBAATO KIYABUARIEERU ,  DEEBUIDO KURAIDO RINERU ,  REIMONDO ROBAATO RATSUKERU

IPC: H01L21/301 ,  B28D5/00 ,  H01L21/304 ,  H01S5/02 ,  H01S5/028

Abstract: PURPOSE: To provide a device for cleaving a GaAs bar from a cell, which can be used in ultrahigh vacuum by using a jaw for propagating the cleavage on one end of a laser bar and using a jaw for supplying a bias force on the other end of the laser bar. CONSTITUTION: A jaw 37, being tightly fastened to a plate, supplies a main force component to be used for cleaving a bar 23 from a cell 1. A jaw 39 can slide in a hole and includes a weight 43 which is located on an uncleaved face. The function of the jaw 39 and weight 43 is to give downward force to the bar 23, when the cleavage 24 advances from one side of the cell 1 to the other side. The destruction of the bar in an early stage and the formation of can be prevented by this function of the jar 39 and the weight 43. Thus, a GaAs bar manufacturing device which does not come into contact with an important section of a top face of the cell can be obtained.

公开(公告)号：JPH05109876A

公开(公告)日：1993-04-30

申请号：JP8076092

申请日：1992-04-02

Applicant: IBM

Inventor： JIYOSEFU SUKINAA ROOGAN ,  REIMONDO ROBAATO RATSUKERU ,  ROBAATO ERI TONPUKINSU ,  ROBAATO PIITAA UESUTAAFUIIRUDO

IPC: B23Q3/15 ,  B23Q11/14 ,  H01L21/683 ,  H02N13/00

Abstract: PURPOSE: To provide an electrostatic chuck which may be used in a widely changing thermal cycle. CONSTITUTION: An electrostatic chuck 40 is constituted from top to bottom, an isolating layer 42, an electrostatic pattern layer 44 including a conductive electrostatic pattern 46 arranged on a substrate 45, a heating layer 50 including a conductive heating pattern 54 arranged on a substrate 52, and a heat sink stage 70 in which a cooling channel 78 and a temperature control chamber 80 are provided.

公开(公告)号：JPH07201962A

公开(公告)日：1995-08-04

申请号：JP26648694

申请日：1994-10-31

Applicant: IBM

Inventor： MAIKERU SUKOTSUTO BAANZU ,  JIYON HAWAADO KERAA ,  JIYOSEFU SUKINAA ROOGAN ,  REIMONDO ROBAATO RATSUKERU ,  ROBAATO IIRAI TOMUKIN ,  ROBAATO PIITAA UESUTOFUIIRUDO

IPC: B23Q3/15 ,  H01L21/00 ,  H01L21/683 ,  H02N13/00 ,  H01L21/68

Abstract: PURPOSE: To obtain superior insulating characteristic, to obtain a flat clamp surface, and to form a high clamp force for a work piece by machining an element part, forming an anode oxidized insulating surface, and operating assembly by using a mount. CONSTITUTION: The outer diameter size of electrodes 100 and 200 is rough machined, the recessed parts are finished by machining, and the vertical surface and the bottom part of the electrode 100 are finished by machining. Then, oxidized surface layers 102 and 202 are formed on the electrodes 100 and 200, and they are mounted to a mount 400. A step difference is formed between a surface 410 corresponding to a top face 110 of the circular electrode 100 and a surface 420 corresponding to a top face 220 of the base electrode 200, and a clamp force is affected by this step difference. When the step difference between the surfaces 110 and 220 is 0.00508 mm, it is allowable. Therefore, superior insulating characteristic is obtained, a flat clamp surface is obtained, and a clamp force for a workpiece can be increased.

公开(公告)号：JPS59164957A

公开(公告)日：1984-09-18

申请号：JP22455783

申请日：1983-11-30

Applicant: Ibm

Inventor： TOOMASU MAIKERU BANKUSU ,  REIMONDO ROBAATO RATSUKERU ,  SAMIYUERU FURANKURIN SUPENSAA ,  JIYON KIYUIRIAN UOOKAA

IPC: G01N1/00 ,  G01N30/18 ,  G01N30/24

CPC classification number: G01N30/24 ,  G01N35/1095