METHOD FOR MANUFACTORING A CARBON-BASED MEMORY ELEMENT AND MEMORY ELEMENT
    1.
    发明申请
    METHOD FOR MANUFACTORING A CARBON-BASED MEMORY ELEMENT AND MEMORY ELEMENT 审中-公开
    用于制造基于碳的存储元件和存储元件的方法

    公开(公告)号:WO2012001599A2

    公开(公告)日:2012-01-05

    申请号:PCT/IB2011052790

    申请日:2011-06-24

    Abstract: A method for manufacturing a resistive memory element (1) comprises: providing a storage layer (2) comprising a resistance changeable material; said resistance changeable material comprising carbon; providing contact layers (3, 4) for contacting the storage layer (2), wherein the storage layer (2) is disposed between a bottom contact layer (3) and a top contact layer (4); and doping the resistance changeable material with a dopant material. A resistive memory element (1) includes a bottom contact layer (3), a top contact layer (4) and a storage layer (2) disposed between the bottom contact layer (3) and the top contact layer (4), wherein the storage layer (2) comprises a resistance changeable material that is doped with a dopant material.

    Abstract translation: 一种用于制造电阻式存储元件(1)的方法,包括:提供包括电阻可变材料的存储层(2); 所述电阻变化材料包含碳; 提供用于接触所述存储层(2)的接触层(3,4),其中所述存储层(2)设置在底部接触层(3)和顶部接触层(4)之间; 并用掺杂剂材料掺杂电阻可变材料。 电阻式存储器元件(1)包括底部接触层(3),顶部接触层(4)和设置在底部接触层(3)和顶部接触层(4)之间的存储层(2),其中 存储层(2)包括掺杂有掺杂剂材料的电阻可变材料。

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