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公开(公告)号：DE69112157D1
公开(公告)日：1995-09-21
申请号：DE69112157
申请日：1991-06-08
Applicant: IBM
Inventor： CIBULSKY MICHAEL J , PAPATHOMAS KOSTAS , SCHMITT GEORGE P
Abstract: A dicyandiamide crosslinked epoxy prepreg substantially free from dicyandiamide crystals is obtained by subjecting an epoxy composition containing dicyandiamide to elevated temperature to thereby form a substantially prereacted product, adding solvents if desired, desolvating, and then thermally advancing the prereacted product to the desired state of crosslinking to thereby form the prepreg.
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公开(公告)号：DE69112157T2
公开(公告)日：1996-04-18
申请号：DE69112157
申请日：1991-06-08
Applicant: IBM
Inventor： CIBULSKY MICHAEL J , PAPATHOMAS KOSTAS , SCHMITT GEORGE P
Abstract: A dicyandiamide crosslinked epoxy prepreg substantially free from dicyandiamide crystals is obtained by subjecting an epoxy composition containing dicyandiamide to elevated temperature to thereby form a substantially prereacted product, adding solvents if desired, desolvating, and then thermally advancing the prereacted product to the desired state of crosslinking to thereby form the prepreg.
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公开(公告)号：CA1048328A
公开(公告)日：1979-02-13
申请号：CA214897
申请日：1974-11-27
Applicant: IBM
Inventor： CANESTARO MICHAEL J , ABOLAFIA OSCAR R , SCHMITT GEORGE P , CUTILLO JOSEPH G
IPC: C08F2/50 , C08F299/02 , C08G59/00 , C08G59/40 , C08G59/50 , G03F7/032 , G03F7/038 , H01L21/027 , H05K3/00
Abstract: PHOTO-PROCESSABLE COATINGS of the Invention A photo-processable coating is formed using (1) an epoxy prepolymer which is solid at room temperature and which has at least 2 epoxy groups per molecule, (2) an alpha, beta ethylenically unsaturated carboxylic acid, (3) a primary aromatic amine, and (4) a photo-initiator.
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公开(公告)号：CA960077A
公开(公告)日：1974-12-31
申请号：CA134218
申请日：1972-02-08
Applicant: IBM
Inventor： LEVY M FRANK , SCHMITT GEORGE P
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