公开(公告)号：JP2003251563A

公开(公告)日：2003-09-09

申请号：JP2002055665

申请日：2002-03-01

Applicant: IBM

Inventor： TANAKA SHUNSUKE ,  SHINOHARA MASAKI ,  ISHIMOTO KOICHI

IPC: B24B57/02 ,  B24B57/00 ,  H01L21/304

Abstract: PROBLEM TO BE SOLVED: To provide a slurry collection device which can save the quantity of the slurry to be disposed and can suppress any stuffing of a discharge pipe to discharge the slurry, and also to provide a method therefor. SOLUTION: The slurry collection device 1 includes an annular shielding member 2 disposed around a turntable T of a grinding device E, and an annular slurry collector 3 disposed around the shielding member 2. The turntable T is connected to an upper end of a main rotary shaft T1 protruded from a bottom part of a sink S of the grinding device E, and raised from the bottom part of the sink S. The slurry collection device 1 is inserted between the entire circumference of the turntable T and the inner surface of the sink S. COPYRIGHT: (C)2003,JPO

公开(公告)号：JP2003266308A

公开(公告)日：2003-09-24

申请号：JP2002055746

申请日：2002-03-01

Applicant: IBM

Inventor： SHINOHARA MASAKI ,  TANAKA SHUNSUKE ,  ISHIMOTO KOICHI

IPC: B24B57/02 ,  B24B37/00 ,  H01L21/304

Abstract: PROBLEM TO BE SOLVED: To provide a slurry supply pipe and a retention preventing method which can reduce costs for CMP by reducing the amount of slurry to be discarded and by reducing a process time for CMP. SOLUTION: This slurry supply pipe 1 comprises a T-shaped joint 2 connected in the middle of a circulation path L, a movable pipe 3 rotatably connected to a branch pipe 20 of the T-shaped joint 2, and a driving means 4 for rotating the movable pipe 3. The driving means 4 rotates each of two rollers 40 supporting the outer circumferential face of the movable pipe 3 from below clockwise to have the movable pipe driven in the same direction. Each of the rollers 40 is connected to a rotating machine. COPYRIGHT: (C)2003,JPO

公开(公告)号：JP2001141657A

公开(公告)日：2001-05-25

申请号：JP30876699

申请日：1999-10-29

Applicant: IBM

Inventor： UDA MITSURU ,  YAMAGUCHI TAKESHI ,  SHINOHARA MASAKI

IPC: G01B11/30 ,  G01B11/24 ,  G01N21/84 ,  G01N21/956 ,  H01L21/027 ,  H01L21/66

Abstract: PROBLEM TO BE SOLVED: To provide an illumination device for macroinspection, by which whether a defocus defect or the like is contained on the face to be fine worked of a resist pattern or the like formed on a semiconductor substrate such as a wafer or the like can be inspected especially visually and clearly, and to provide an apparatus and a method for inspection in which the obtained illumination device for macroinspection is used. SOLUTION: This macroinspection apparatus 10 comprises an illumination device 12 for macroinspection, which is equipped with a light source used to irradiate coherent light 14. The macroinspection apparatus comprises a support means 20 used to support a substrate 18 which is irradiated with the coherent light 14 from the illumination device 12 for macroinspection and on which the face 16 to be fine worked of a prescribed pattern is formed. The macroinspection apparatus comprises a judgment means 24 in which whether a pattern formed on the substrate 18 is deformed from the prescribed pattern is judged by diffracted light 22 from the face 16 to be fine worked. The illumination device 12 for macroinspection is constituted of a device which irradiates light containing coherent light in two colors in the relationship of complementary colors.

公开(公告)号：JP2000258128A

公开(公告)日：2000-09-22

申请号：JP5366099

申请日：1999-03-02

Applicant: IBM

Inventor： UDA MITSURU ,  SHINOHARA MASAKI

IPC: G01B9/02 ,  G01B11/06

Abstract: PROBLEM TO BE SOLVED: To visually inspect film thickness unevenness with high accuracy by improving the coherence between light rays reflected by the surfaces of a film and a substrate by projecting light having an intensity peak having a specific half-value width or smaller upon the substrate. SOLUTION: A light source section S the intensity peak of which has a half-value width of

公开(公告)号：JPH11281971A

公开(公告)日：1999-10-15

申请号：JP4987098

申请日：1998-03-02

Applicant: Internatl Business Mach Corp ,  インターナショナル・ビジネス・マシーンズ・コーポレイション

Inventor： SHINOHARA MASAKI ,  UDA MITSURU

IPC: G09F9/35 ,  G02F1/13 ,  G02F1/1333 ,  G02F1/1335 ,  G02F1/1343 ,  G02F1/136 ,  G02F1/1368

CPC classification number: G02F1/13439 ,  G02F1/133553 ,  G02F1/136 ,  G02F2001/133357

Abstract: PROBLEM TO BE SOLVED: To give a flat light reflection face to reduce the loss of reflected light due to diffraction.
SOLUTION: An active matrix type reflection liquid crystal element is provided with an array substrate having switching elements corresponding to picture elements and an array of picture element electrodes 32 connected to switching elements, and a counter substrate which has a transparent electrode facing the array of picture element electrodes 32 with a liquid crystal layer between them. Each picture element electrode 32 is formed so as to have an array of electrode studs, namely, split electrodes 68, Areas between studs are filled with an insulating material 64. The surface of the stud array is smoothed by chemical and mechanical polishing treatment. A dielectric light reflection film is provided on the flat surface of the stud array, and a liquid crystal molecule orienting film is provided on this film.
COPYRIGHT: (C)1999,JPO

Abstract translation: 要解决的问题：给出平坦的光反射面以减少由于衍射引起的反射光的损失。 解决方案：有源矩阵型反射液晶元件设置有具有对应于像素的开关元件和连接到开关元件的像素电极32的阵列的阵列基板，以及具有面向图案阵列的透明电极的对置基板 元件电极32之间具有液晶层。 每个像素电极32形成为具有电极柱的阵列，即分离电极68，螺柱之间的区域填充有绝缘材料64.通过化学和机械抛光处理来平滑螺柱阵列的表面。 在螺柱阵列的平坦表面上设置电介质光反射膜，并且在该膜上设置液晶分子取向膜。

公开(公告)号：JPH08248425A

公开(公告)日：1996-09-27

申请号：JP1769295

申请日：1995-02-06

Applicant: IBM

Inventor： UDA MITSURU ,  SHINOHARA MASAKI ,  NISHIDA MAMORU

IPC: G02F1/1335 ,  G02F1/1339 ,  G02F1/1362

Abstract: PURPOSE: To provide a liquid crystal display device improved in display luminance by improving the numerical aperture of a sub-pixel and a manufacturing method for the device in the projection type liquid crystal display device using a reflection type liquid crystal light valve and a manufacturing method for the device. CONSTITUTION: According to the above manufacturing method, the liquid crystal display device is constructed by forming a light absorbing layer 26 on a semiconductor substrate 1, forming plural light reflecting films 32 on the light absorbing layer 26 through an insulating film 28, forming an insulating film 36 on the whole surface, applying positive photoresist to the whole surface on the insulating film 36 to form a resist layer, applying exposure to the resist layer from above to form a mask, with the resist layer left on the areas among plural self-aligning light reflecting films 32, and etching the insulating film 36 by the mask to form a column-like spacer 34 on the plural light reflecting films 32.

公开(公告)号：JP2001100192A

公开(公告)日：2001-04-13

申请号：JP26440399

申请日：1999-09-17

Applicant: IBM

Inventor： SHINOHARA MASAKI ,  UDA MITSURU ,  IVAN GEORGE COLGAN

IPC: G02F1/1333 ,  G02F1/1335 ,  G02F1/135 ,  G02F1/136 ,  G02F1/1362 ,  G02F1/1368

Abstract: PROBLEM TO BE SOLVED: To effectively shield incident light from a gap part of a light reflection layer in a liquid crystal light valve of a liquid crystal display device, especially of a reflective liquid crystal display device. SOLUTION: In the liquid crystal display device having a semiconductor substrate, a counter substrate, the light reflection layer and a liquid crystal, the liquid crystal light valve provided with an effective light shielding means is constructed by arranging a light absorption body layer and a light shielding body placed between the light absorption body layer and the light reflection layer.