公开(公告)号：JPS6336240A

公开(公告)日：1988-02-16

申请号：JP12609787

申请日：1987-05-25

Applicant: IBM

Inventor： UIRIAMU ROSU BURANSUBUORUDO ,  MINGUUFUI CHIYOU ,  UIRAADO AARU KONREI ,  DEERU MARI KUROKATSUTO ,  JIIN MARII JIYOSEFU FURECHIETS ,  JIYOOJI JIYOSEFU HEFUARON ,  HIROSHI ITOO ,  NANSHII EREN IWAMOTO ,  KAARUTON GURANTO UIRUSON

IPC: G03C1/72 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

公开(公告)号：JPH07140666A

公开(公告)日：1995-06-02

申请号：JP9326594

申请日：1994-05-02

Applicant: IBM

Inventor： UIRIAMU ROSU BURANSUBUORUDO ,  JIEIMUZU TOOMASU FUAHEI ,  JIYOOJI JIYOZEFU HETSUFUERON ,  UUSON FUAN ,  PUREMURASA JIYAGANASAN ,  AAMADO DAUODO KATONANI ,  MAAMOUDO EMU KOOJIYASUTEE ,  RANII WAIIRIN KUUON ,  KIMU YAN RII ,  HAABANSU SUINGUU SASHIYUDEBU ,  KURISHIYUNA GANDEII SASHIYUDEB ,  RATONAMU SUURIYAKUMARAN ,  ROBAATO RABUIN UTSUDO

IPC: C08L25/02 ,  C08L61/10 ,  C08L101/00 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027

Abstract: PURPOSE: To provide a compsn. which is hardly subjected to a disadvantageous reaction with environment pollutant material and to enhance the allowance to the variable or long delay between exposure and baking after the exposure or between the baking after the exposure and developing. CONSTITUTION: This aq. base developable microlithographic resist compsn. contains a film formable polymer, such as polyhydroxy styrene having chemically bonded iterative hydroxyl groups, an acid unstable compd. contg. a ketal component, such as 2-(2-methoxypropyl) and an acid generating compd., such as N-(trifluoromethyl sulfonyloxy)-nitronaphthalimide, which forms an acid by exposure to chemical rays in the mixture. The acid generated by the exposure induces cleavage of at least part of the compds. contg. the ketal component and the exposed compsn. is made selectively more soluble in the aq. base as compared with the non-exposed compsn.