公开(公告)号：JPH04224824A

公开(公告)日：1992-08-14

申请号：JP5566691

申请日：1991-02-28

Applicant: IBM

Inventor： KURISHIYUNA GANDEII SAKUDEBU ,  JIYON PATORITSUKU HAMERU ,  RANII WAIIRIN KUUON ,  ROBAATO NIIRU RANGU ,  RIIOU RORENSU RAINHAN ,  HAABANZU SHINGU SAKUDEBU

IPC: C08G73/10 ,  C08L79/08 ,  H01L21/312 ,  H01L23/29 ,  H01L23/498 ,  H01L23/532 ,  H05K1/00

公开(公告)号：JPH07140666A

公开(公告)日：1995-06-02

申请号：JP9326594

申请日：1994-05-02

Applicant: IBM

Inventor： UIRIAMU ROSU BURANSUBUORUDO ,  JIEIMUZU TOOMASU FUAHEI ,  JIYOOJI JIYOZEFU HETSUFUERON ,  UUSON FUAN ,  PUREMURASA JIYAGANASAN ,  AAMADO DAUODO KATONANI ,  MAAMOUDO EMU KOOJIYASUTEE ,  RANII WAIIRIN KUUON ,  KIMU YAN RII ,  HAABANSU SUINGUU SASHIYUDEBU ,  KURISHIYUNA GANDEII SASHIYUDEB ,  RATONAMU SUURIYAKUMARAN ,  ROBAATO RABUIN UTSUDO

IPC: C08L25/02 ,  C08L61/10 ,  C08L101/00 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027

Abstract: PURPOSE: To provide a compsn. which is hardly subjected to a disadvantageous reaction with environment pollutant material and to enhance the allowance to the variable or long delay between exposure and baking after the exposure or between the baking after the exposure and developing. CONSTITUTION: This aq. base developable microlithographic resist compsn. contains a film formable polymer, such as polyhydroxy styrene having chemically bonded iterative hydroxyl groups, an acid unstable compd. contg. a ketal component, such as 2-(2-methoxypropyl) and an acid generating compd., such as N-(trifluoromethyl sulfonyloxy)-nitronaphthalimide, which forms an acid by exposure to chemical rays in the mixture. The acid generated by the exposure induces cleavage of at least part of the compds. contg. the ketal component and the exposed compsn. is made selectively more soluble in the aq. base as compared with the non-exposed compsn.

公开(公告)号：JPH03204649A

公开(公告)日：1991-09-06

申请号：JP32135990

申请日：1990-11-27

Applicant: IBM

Inventor： RANII WAIIRIN KUUON ,  HAABANZU SHINGU SAKUDEBU ,  KURISHIYUNA GANDEII SAKUDEBU

IPC: C08F2/46 ,  C08G73/10 ,  C08K5/23 ,  C08K5/28 ,  C08L79/08 ,  G03F7/038 ,  G03F7/039 ,  G03F7/075 ,  G03F7/26 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE: To attain thermal stabilization by using a specified bis-(3-amino-4- hydroxyphenyl) compd., a diacid anhydride such as specified bis-(3,4- dicarboxyphenyl) anhydride or aliphatic tetracarboxylic acid anhydride and a photoactive compd. CONSTITUTION: This photosensitive polyimide compsn. consists of bis-(3-amino-4- hydroxyphenyl) compd. represented by formula I, a diacid anhydride such as bis-(3,4-dicarboxyphenyl) anhydride represented by formula II or aliphatic tetracarboxylic acid anhydride and a photoactive compd. such as bisazide. In the formula I, Q is -O-, -S-, etc. In the formula II, Z is -O-, -S-, -O-Ar-S-Ar-O, etc. Thermal stabilization is attained.

公开(公告)号：JPH03206458A

公开(公告)日：1991-09-09

申请号：JP3168190

申请日：1990-02-14

Applicant: IBM

Inventor： UIRIAMU ROSU BURANZUBOURUDO ,  KURISUTOFUAA JIYON NOOAZU ,  RANII WAIIRIN KUUON ,  SUTEIIBU SEIICHI MIURA ,  MERUBIN UOREN MONGOMERII ,  UEIN MAATEIN MOROO ,  HAABANZU SHINGU SAKUDEBU

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE: To chemically increase sensitivity by irradiation with UV, electron beams or X-rays by using a specified polymerizable or molecular compsn. and a specified precursor of sulfonic acid. CONSTITUTION: This photoresist contains a polymerizable or molecular compsn. whose solubility depends on the presence of a protective group capable of removal with an acid and a precursor of sulfonic acid generating the strong acid when exposed with radiation, that is, an N-fluoroalkylsulfonyloxyimide sensitizer and a polymerizable resin or a molecular monomer having a protective group such as a carbonate or carboxylate group capable of removal with the acid. When the sulfonyloxyimide sensitizer is used in various photoresist compsns, the sensitivities are increased and exposure is carried out under various radiation conditions. Chemical amplification is attained.

公开(公告)号：JPH0680613A

公开(公告)日：1994-03-22

申请号：JP819693

申请日：1993-01-21

Applicant: IBM

Inventor： GUREGORII BUREITA ,  DANIERU JIYOZEFU DOOSON ,  MAAMUUDO MOSUTAFUA KOOJIYASUTE ,  RANII WAIIRIN KUUON ,  ERUUTSUDO HAABAATO MEISHII ,  DEIBITSUDO POORU MERITSUTO ,  UEIN MAATEIN MOROO ,  SUTANREE YUUJIIN PEROO ,  HAABANZU SHINGU SAKUDEBU ,  ROBAATO RABIN UTSUDO ,  HIROSHI ITOU

IPC: B01J31/02 ,  C07B61/00 ,  C07C68/06 ,  C07C69/96 ,  C08F8/00 ,  C08F12/24 ,  C08G8/28

公开(公告)号：JPH05232707A

公开(公告)日：1993-09-10

申请号：JP30589892

申请日：1992-10-21

Applicant: IBM

Inventor： NIKORASU JIEFURIIZU KUREKAKU ,  UIRAADO AARU KONREE ,  RANII WAIIRIN KUUON ,  RIIOU RORENSU RAINHAN ,  SUKOTSUTO AASAA MAKUDONARUDO ,  HAABANZU SHINGU SAKUDEBU ,  FUUBERUTO SHIYUROOSAA ,  KAARUTON GURANTO UIRUSON

IPC: G03F7/004 ,  G03F7/029 ,  G03F7/038 ,  G03F7/039 ,  G03F7/26 ,  G03F7/36 ,  G03F7/38 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE: To form a positive resist image on a substrate by using an arom. polymer resin, a crosslinking agent having the function of an acid catalyst and an acid generating agent. CONSTITUTION: A substrate is coated with a compsn. contg. a film forming arom. polymer resin having functional groups which activate the resin to electrophilic arom. substitution, a crosslinking agent having the function of an acid catalyst and forming carbonium ions at the time of reaction with an acid and a radiation-degradable acid generating agent which absorbs radiation for forming an image. The resultant film is imagewise exposed with medium or deep UV and the resin in the exposed part of the film is made dense. The film is then brought into contact with an org. metallic reagent, an org. metallizing agent is absorbed in the unexposed region having higher permeability and the film is etched with reactive ions to form a positive resist pattern.