公开(公告)号：US3868271A

公开(公告)日：1975-02-25

申请号：US36962073

申请日：1973-06-13

Applicant: IBM

Inventor： POLEY NEIL M ,  WHITAKER HOWARD L

IPC: H01J17/02 ,  B08B11/04 ,  C03C23/00 ,  H01J17/16 ,  B08B3/00

CPC classification number: C03C23/0075

Abstract: An improved method of cleaning a glass substrate prior to evaporation of chrome metal electrodes upon it. The substrate is cleaned by the use of glow discharge in a wet active gas, preferably air or forming gas.

Abstract translation: 一种在铬金属电极蒸发之前清洁玻璃基板的改进方法。 通过在湿活性气体中使用辉光放电来清洗基板，优选空气或形成气体。

公开(公告)号：US3627663A

公开(公告)日：1971-12-14

申请号：US3627663D

申请日：1968-03-25

Applicant: IBM

Inventor： DAVIDSE PIETER D ,  WHITAKER HOWARD L

IPC: C23C14/35 ,  H01J37/34 ,  C23C15/00

CPC classification number: C23C14/35 ,  H01J37/34

Abstract: A substrate to be coated by RF sputtering is partially or completely surrounded by a target, which has a similarly shaped cathode surrounding and supporting the target. The target and the cathode may be formed of a pair of parallel plates or a hollow member. By controlling the pressure of the gas within the partially evacuated chamber in which at least the target is disposed and/or the spacing of the cathode plates or the size and geometrical configuration of the hollow member, a single common negative glow can be produced by either having the negative glow from the two parallel cathode plates overlap or touch each other or having a single negative glow within the hollow member.

公开(公告)号：US3437505A

公开(公告)日：1969-04-08

申请号：US3437505D

申请日：1965-06-28

Applicant: IBM

Inventor： NARKEN BERNT ,  WHITAKER HOWARD L

IPC: C03C17/04 ,  B01J8/42 ,  B05D1/24 ,  C23D5/00 ,  C23D5/04 ,  H01B3/08 ,  H01L23/31 ,  C23D3/00 ,  B44D1/34

CPC classification number: B05D1/24 ,  B01J8/42 ,  C23D5/00 ,  H01B3/088 ,  H01L23/3157 ,  H01L2924/0002 ,  H01L2924/19041 ,  H01L2924/00

公开(公告)号：CA963062A

公开(公告)日：1975-02-18

申请号：CA159878

申请日：1972-12-27

Applicant: IBM

Inventor： WHITAKER HOWARD L ,  WILSON DONALD M

IPC: G09F13/26 ,  H01J17/49

公开(公告)号：CA959115A

公开(公告)日：1974-12-10

申请号：CA156039

申请日：1972-11-08

Applicant: IBM

Inventor： POLEY NEIL M ,  WHITAKER HOWARD L ,  WILSON DONALD M

IPC: H01J9/26 ,  H01J5/46 ,  H01J9/02 ,  H01J9/32 ,  H01J17/49 ,  H05K3/28

Abstract: A water removable material ordinarily used as a brazing stop-off - i.e. to restrict the flow of a molten metal and thereby to prevent wetting of an underlying surface in a brazing or soldering process - has been found useful presently as a means to prevent oxidation of, or other damage to, terminal metallurgy of metallized glass components during protracted periods of baking, gas-filling and glass sealing processing incidental to fabrication of gas discharge display panel assemblies. The subject baking, gas-filling and sealing processing involves hours or even days of variant temperature treatment, which should be distinguished from seconds or at most minutes of brazing treatment. The protective function required of the water removable coating during this prolonged processing period is considered unique and eliminates certain application and removal process operations associated with the use of other protective media (e.g. sintered glass frit).

公开(公告)号：CA884480A

公开(公告)日：1971-10-26

申请号：CA884480D

Applicant: IBM

Inventor： DAVIDSE PIETER D ,  WHITAKER HOWARD L

公开(公告)号：CA977968A

公开(公告)日：1975-11-18

申请号：CA159459

申请日：1972-12-20

Applicant: IBM

Inventor： HABERLAND PETER H ,  LAY FRANK M ,  SKOLNIK MARVIN B ,  SPENCER OLIVER S ,  MURPHY THOMAS J ,  WAGNER PETER R ,  WHITAKER HOWARD L ,  WILSON DONALD M

IPC: H05K3/28 ,  H01J20060101 ,  H01J9/02 ,  H01J9/26 ,  H01J9/32 ,  H01J11/10 ,  H01J11/12 ,  H01J11/24 ,  H01J11/46 ,  H01J65/04

公开(公告)号：CA831476A

公开(公告)日：1970-01-06

申请号：CA831476D

Applicant: IBM

Inventor： WHITAKER HOWARD L ,  NARKEN BERNT