PROXIMITY EFFECT CORRECTION METHOD FOR E-BEAM LITHOGRAPHY

    公开(公告)号:DE3475452D1

    公开(公告)日:1989-01-05

    申请号:DE3475452

    申请日:1984-05-30

    Applicant: IBM

    Abstract: Data from a computer are supplied to a pattern generator and represent the shape to be produced. The origin coordinates and incremental steps are signalled to a digital-analog converter. The resulting signals are supplied to the electron beam deflection coils (19,21) following amplification (29). A detector determines a signal representing the rate of electron back-scattering. The signal is amplified and applied to a multi-level range coder. The corresponding level signal is applied to a stepping rate selector which produces a corresponding stepping rate correction which corresponds to the signal level. This is converted to an ac voltage for application to a VCO controlling the beam stepping rate signal for the pattern generator.

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