公开(公告)号：DE3886754D1

公开(公告)日：1994-02-10

申请号：DE3886754

申请日：1988-10-19

Applicant: IBM DEUTSCHLAND

Inventor： BAYER THOMAS ,  BARTHA JOHANN DR ,  GRESCHNER JOHANN DR ,  KERN DIETER ,  MATTERN VOLKER ,  STOEHR ROLAND

IPC: C08J7/00 ,  C23F4/00 ,  H01L21/00 ,  H01L21/302 ,  H01L21/3065 ,  H01J37/20

Abstract: The invention relates to a vacuum reactor for etching thermally poorly conducting substrates with a high etching rate uniformity, in which the substrates (33) to be etched are arranged in a holder (35, 36) at a specific distance from the cathode (31) to which RF energy is applied. In an advantageous embodiment of the invention, the cathode is raised in the region of the substrate (33) to be etched and brought up to the underside of the substrate as far as a distance of approximately 0.2 mm. The cathode consists of aluminium, and is provided in the region of the substrate to be etched with a layer (32) acting as a complete radiator. The heat formed during the RIE is dissipated by thermal radiation, and the radiation reflected back onto the substrates from the cathode is absorbed by the layer (32). The invention also comprises a process for etching thermally poorly conducting substrates, in particular for etching plastic substrates.

公开(公告)号：DE3475452D1

公开(公告)日：1989-01-05

申请号：DE3475452

申请日：1984-05-30

Applicant: IBM

Inventor： FORSTER THEODOR ,  KERN DIETER ,  VETTIGER PETER ,  WILSON ALAN DIXON

IPC: H01J37/305 ,  G03F7/20 ,  H01J37/317 ,  H01L21/027 ,  H01J37/304

Abstract: Data from a computer are supplied to a pattern generator and represent the shape to be produced. The origin coordinates and incremental steps are signalled to a digital-analog converter. The resulting signals are supplied to the electron beam deflection coils (19,21) following amplification (29). A detector determines a signal representing the rate of electron back-scattering. The signal is amplified and applied to a multi-level range coder. The corresponding level signal is applied to a stepping rate selector which produces a corresponding stepping rate correction which corresponds to the signal level. This is converted to an ac voltage for application to a VCO controlling the beam stepping rate signal for the pattern generator.