公开(公告)号：DE3856187D1

公开(公告)日：1998-06-25

申请号：DE3856187

申请日：1988-06-28

Applicant: IBM DEUTSCHLAND

Inventor： ASCH KARL ,  KEYSER JOACHIM ,  MEISSNER KLAUS ,  ZAPKA WERNER

IPC: B23K26/00 ,  B08B7/00 ,  G03F1/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/268 ,  H01L21/30 ,  H01L21/304

公开(公告)号：DE3856187T2

公开(公告)日：1999-02-04

申请号：DE3856187

申请日：1988-06-28

Applicant: IBM DEUTSCHLAND

Inventor： ASCH KARL ,  KEYSER JOACHIM ,  MEISSNER KLAUS ,  ZAPKA WERNER

IPC: B23K26/00 ,  B08B7/00 ,  G03F1/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/268 ,  H01L21/30 ,  H01L21/304

公开(公告)号：SG42877A1

公开(公告)日：1997-10-17

申请号：SG1996000393

申请日：1992-11-11

Applicant: IBM

Inventor： TAM ANDREW C ,  ZAPKA WERNER ,  WOLBOLD GERCHARD ERICH

IPC: G03F1/20 ,  H01L21/027 ,  H01L21/30 ,  G03F1/16

Abstract: A mask for use with high energy radiation sources in precision projection processing by excimer lasers, for example, is described. The mask comprises a suitable substrate, such as silicon, upon which a multilayer dielectric stack is formed which acts as a reflective coating for the impinging excimer laser radiation, minimizing energy absorption by the mask substrate. The mask transparent areas are defined by the through-holes in the mask. The through-holes are formed with a conically undercut edge profile to define a thin object plane for the mask and minimize scattering of the radiation from the through-hole sidewalls. A method for fabricating the mask is also described.

公开(公告)号：DE3581758D1

公开(公告)日：1991-03-28

申请号：DE3581758

申请日：1985-03-13

Applicant: IBM

Inventor： BEHRINGER UWE ,  BOHLEN HARALD ,  NEHMIZ PETER ,  ZAPKA WERNER

IPC: G03F1/00 ,  G01B11/00 ,  G03F1/08 ,  G03F1/16 ,  G03F7/20 ,  H01J37/304 ,  H01J37/317 ,  H01L21/027 ,  H01L21/26 ,  H01L21/30 ,  H01L21/308 ,  H01L21/32 ,  H01L21/66

Abstract: To test transmission masks (3) for electron or ion beam lithography, the corpuscular beam (2) is inclined to guide the shadow image of a mask portion across a pinhole diaphragm (20, 40) comprising at least one aperture with submicron dimensions. The test for geometrical errors is effected with a single hole diaphragm (20) arranged above a scintillator (21) connected to a photomultiplier (22); the single hole diaphragm is positioned below selected measuring points of the exposure mask to determine the accurate position of the measuring point relative to the diaphragm by beam tilting. The relative spacing of two measuring points is derived from the interferometrically measured table displacement and the beam inclination. To test the entire mask area for errors and impurity particles, a multihole diaphragm (40) is used having submicron apertures arranged in matrix fashion above an integrated circuit of the charge transfer type which provides a MOS capacitor as a particle detector underneath each diaphragm opening. The exposure mask is scanned in steps, effecting several single exposures at each position by inclining the beam.

公开(公告)号：CA1242272A

公开(公告)日：1988-09-20

申请号：CA503284

申请日：1986-03-04

Applicant: IBM

Inventor： BANDARA UPALI ,  ELSNER GERHARD ,  HEINRICH VOLKER ,  HINKEL HOLGER ,  LANG ARTUR ,  PRINZ ERWIN ,  STEINER WERNER ,  ZAPKA WERNER

IPC: G11B5/84 ,  G01N3/56 ,  G01N13/00 ,  G01N27/00 ,  G11B5/00 ,  G11B5/012 ,  G11B5/58 ,  G11B17/32 ,  G11B33/10 ,  G11B5/455 ,  G01N17/00 ,  G01N19/00

Abstract: SYSTEM FOR TESTING MAGNETIC HEAD/DISK INTERFACES Method for measuring the properties of a slider/disk interface in a magnetic disk storage apparatus by measuring a triboelectric current flowing between disk and slider. Rotational speed is adjusted between 100 and 500 rpm so as to obtain a frictional contact between disk and slider. The shape of the tribo current curve obtained during the measuring time interval is analyzed. An early maximum of the tribo current amplitude and a subsequent continual decay indicates a good slider/disk interface and a long lifetime.