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1.发明公开BASE SUBSTRATE FOR EPITAXIAL DIAMOND FILM, METHOD FOR MANUFACTURING THE BASE SUBSTRATE FOR EPITAXIAL DIAMOND FILM, EPITAXIAL DIAMOND FILM MANUFACTURED BY THE BASE SUBSTRATE FOR EPITAXIAL DIAMOND FILM, AND METHOD FOR MANUFACTURING THE EPITAXIAL DIAMOND FILM 有权基础衬底外延金刚石膜，工艺用于生产基础衬底外延金刚石薄膜中外延金刚石薄膜制成的外延金刚石薄膜基底和制造方法外延金刚石膜
公开(公告)号：EP2009135A4
公开(公告)日：2010-12-29
申请号：EP07708033
申请日：2007-02-05
Applicant: IMAI YOSHIO
Inventor： SAWABE ATSUHITO , MAEDA SHINTARO , NOGUCHI HITOSHI
IPC: C23C16/02 , C23C16/27 , C30B29/04 , H01L21/205
CPC classification number: C30B23/02 , C23C16/272 , C30B25/105 , C30B25/18 , C30B29/02 , C30B29/04 , H01J37/32009 , H01J37/34 , H01J37/3447 , H01L21/0242 , H01L21/02433 , H01L21/02491 , H01L21/02516 , H01L21/02527 , H01L21/0262
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