公开(公告)号：DE50006747D1

公开(公告)日：2004-07-15

申请号：DE50006747

申请日：2000-11-23

Applicant: INFINEON TECHNOLOGIES AG

Inventor： CZECH GUENTHER ,  FRIEDRICH CHRISTOPH ,  FUELBER DR ,  KAESMAIER RAINER ,  WIDMANN DR

IPC: G03F1/00 ,  G03F1/14 ,  G03F7/20

Abstract: Layers are patterned with a lithography method during the fabrication of integrated circuits. A mask, which may be reflective or transmissive, for carrying out the method. The photosensitive layers are exposed to radiation that is emitted by a radiation source. The radiation lies in the extreme ultraviolet region and is guided via the mask onto the photosensitive layers.