公开(公告)号：DE10259057A1

公开(公告)日：2004-07-15

申请号：DE10259057

申请日：2002-12-17

Applicant: INFINEON TECHNOLOGIES AG

Inventor： ELIAN KLAUS ,  ESCHBAUMER CHRISTIAN ,  JUTGLA ANGELA ,  HEUSINGER NICOLE ,  KERN MARION

IPC: G03F1/00 ,  G03F7/004 ,  G03F7/075

Abstract: A photoresist composition containing, as carrier polymer, a copolymer of tert.-butyl methacrylate and 3-heptaisobutyl-POSS-propyl methacrylate (RTM: acrylic monomer with a polycyclic octasiloxane group in the side chain). A photo-resist composition (I) containing (a) a carrier polymer of formula (II), (b) a selected photo-acid generator and (c) a solvent. R = alkyl; x, y = 0.1-0.9 An Independent claim is also included for a method for the production of a photo-mask by coating a mask blank with composition (I), inscribing the blank, developing the composition on the blank and then plasma-etching the blank, preferably using a gas mixture containing oxygen and chlorine for the plasma.