公开(公告)号：DE102004027277A1

公开(公告)日：2005-12-29

申请号：DE102004027277

申请日：2004-06-04

Applicant: INFINEON TECHNOLOGIES AG

Inventor： GUTJAHR KARSTEN ,  GRUSS STEFAN ,  HOFMANN DETLEF ,  FROEHLICH HANS-GEORG

IPC: G03F7/20 ,  G03F9/00

Abstract: The method involves exposing two samples with gauge marks to exposure fields. A simulation model with a regulation algorithm is provided in an illumination device for correction of inter field errors arising out during exposure of the samples. A set of offset values is determined for the two samples, and a parameter of the regulation algorithm is determined for the illumination device on basis of the offset values.

公开(公告)号：DE10359200A1

公开(公告)日：2005-04-28

申请号：DE10359200

申请日：2003-12-17

Applicant: INFINEON TECHNOLOGIES AG

Inventor： HOFMANN DETLEF ,  HENNIG MARIO ,  THIELSCHER GUIDO ,  GRUSS STEFAN ,  PFORR RAINER ,  FROEHLICH HANS-GEORG

IPC: H01L23/544 ,  G03F9/00 ,  G03F7/20