公开(公告)号：DE10126130A1

公开(公告)日：2002-12-12

申请号：DE10126130

申请日：2001-05-29

Applicant: INFINEON TECHNOLOGIES AG

Inventor： BAUCH LOTHAR ,  GRUENING-VON SCHWERIN ULRICKE ,  HAFFNER HENNING ,  KOWALEWSKI JOHANNES ,  SAVIGNAC DOMINIQUE ,  MORHARD KLAUS-DIETER ,  THIELSCHER GUIDO ,  TRINOWITZ REINER

IPC: G03F1/00 ,  H01L21/768 ,  H01L21/28

Abstract: The method involves using a mask illuminated with short-wave light in an optical lithographic method. The mask has elongated, slit-shaped openings for producing essentially circular and/or elongated contact holes (2,6). The illumination conditions are selected so that an image reduction of at least 200 to 400 nm. occurs in the longitudinal direction of the openings.

公开(公告)号：DE10359200A1

公开(公告)日：2005-04-28

申请号：DE10359200

申请日：2003-12-17

Applicant: INFINEON TECHNOLOGIES AG

Inventor： HOFMANN DETLEF ,  HENNIG MARIO ,  THIELSCHER GUIDO ,  GRUSS STEFAN ,  PFORR RAINER ,  FROEHLICH HANS-GEORG

IPC: H01L23/544 ,  G03F9/00 ,  G03F7/20