公开(公告)号：DE102005051812A1

公开(公告)日：2007-02-01

申请号：DE102005051812

申请日：2005-10-27

Applicant: INFINEON TECHNOLOGIES AG

Inventor： HARFMANN MARKUS ,  BINTER ALEXANDER ,  SCHAGERL GUENTER ,  SANTOS RODRIGUEZ FRANCISCO JAV ,  PRAX EMIL ,  FATHULLA AHMAD

IPC: H01L21/306 ,  G01B11/06 ,  H01L21/66

Abstract: A device with etching equipment for etching complete layers or parts of layers to be removed from semiconductor wafers (5) with a liquid etching medium comprises a spectrometer (13) for measuring the concentration of the etching medium. Independent claims are also included for the following. (1) etching complete layers or parts of layers to be removed from semiconductor wafers; and (2) the application of a spectrometer in an etching device.