公开(公告)号：DE10208754A1

公开(公告)日：2003-11-13

申请号：DE10208754

申请日：2002-02-28

Applicant: INFINEON TECHNOLOGIES AG

Inventor： SEIBOLD KERSTIN ,  KIRCH OLIVER

IPC: G03F7/039 ,  G03F7/40 ,  H01L21/027 ,  C08F220/18 ,  C08F220/28 ,  C08F222/06 ,  C08F230/08 ,  G03F7/26

Abstract: The invention relates to a polymer obtained by copolymerization of a first comonomer having a group catalytically cleavable by acid, a second comonomer having an anchor group for the subsequent linkage of an amplification agent, and a third comonomer having a carboxyl group being esterified with an alkyl group. It is also possible for one or more carbon atoms in the alkyl group to be replaced by oxygen. The polymer may also include fourth comonomers that include silicon-containing groups. By using the alkyl or alkoxyalkyleneoxy side groups introduced with the third comonomer, the glass transition temperature of the polymer can be reduced so that a photoresist containing the polymer provides a homogeneous polymer film on heating.

公开(公告)号：DE10208754B4

公开(公告)日：2007-03-01

申请号：DE10208754

申请日：2002-02-28

Applicant: INFINEON TECHNOLOGIES AG

Inventor： SEIBOLD KERSTIN ,  KIRCH OLIVER

IPC: C08F220/18 ,  C08F220/28 ,  C08F222/06 ,  C08F230/08 ,  G03F7/039 ,  G03F7/26 ,  G03F7/40 ,  H01L21/027

Abstract: The invention relates to a polymer obtained by copolymerization of a first comonomer having a group catalytically cleavable by acid, a second comonomer having an anchor group for the subsequent linkage of an amplification agent, and a third comonomer having a carboxyl group being esterified with an alkyl group. It is also possible for one or more carbon atoms in the alkyl group to be replaced by oxygen. The polymer may also include fourth comonomers that include silicon-containing groups. By using the alkyl or alkoxyalkyleneoxy side groups introduced with the third comonomer, the glass transition temperature of the polymer can be reduced so that a photoresist containing the polymer provides a homogeneous polymer film on heating.

公开(公告)号：DE10208786B4

公开(公告)日：2006-02-09

申请号：DE10208786

申请日：2002-02-28

Applicant: INFINEON TECHNOLOGIES AG

Inventor： YIP SIEW SIEW ,  ROTTSTEGGE JOERG ,  RICHTER ERNST ,  FALK GERTRUD ,  SEBALD MICHAEL ,  SEIBOLD KERSTIN ,  KERN MARION

IPC: G03F7/40

Abstract: Amplification of structurized resist uses chemical amplification photoresist (CAR) containing film-forming polymer (I) with acid-labile groups releasing groups that increase solubility in aqueous alkaline developer and anchor groups for coupling with amplification agent (II) containing reactive groups, photoacid and solvent for (I). The structurized CAR is amplified by applying (II) as liquid phase in solvent, then washed with water. Amplification of a structurized resist uses a chemical amplification photoresist (CAR) to a substrate, in which the CAR contains a film-forming polymer (I) with acid-labile groups releasing groups that increase its solubility in aqueous alkaline developers and also (protected) anchor groups for coupling with amplification agent (II), a photoacid (III) and a solvent (IV) for (I). This is applied to a substrate, dried to form resist film, exposed selectively to release acid from (III) in the exposed sections; heated to remove the acid-labile groups from (I) and release polar groups, giving a contrasted resist with polar and unpolar sections; and developed with an alkaline developer, which has higher polarity than (IV) and does not dissolve (I), so that the polar sections are removed. The structurized resist is then treated with (II), which has reactive group(s) that can react with the reactive anchor groups of (I), as liquid phase in solvent(s) in which (I) is insoluble and leaving the (II) solution on the structurized resist so that it couples with (I) to give an amplified resist; then washed with a medium containing water as solvent to remove excess (II).

公开(公告)号：DE10208786A1

公开(公告)日：2003-10-09

申请号：DE10208786

申请日：2002-02-28

Applicant: INFINEON TECHNOLOGIES AG

Inventor： YIP SIEW SIEW ,  ROTTSTEGGE JOERG ,  RICHTER ERNST ,  FALK GERTRUD ,  SEBALD MICHAEL ,  SEIBOLD KERSTIN ,  KERN MARION

IPC: G03F7/40

Abstract: Amplification of structurized resist uses chemical amplification photoresist (CAR) containing film-forming polymer (I) with acid-labile groups releasing groups that increase solubility in aqueous alkaline developer and anchor groups for coupling with amplification agent (II) containing reactive groups, photoacid and solvent for (I). The structurized CAR is amplified by applying (II) as liquid phase in solvent, then washed with water. Amplification of a structurized resist uses a chemical amplification photoresist (CAR) to a substrate, in which the CAR contains a film-forming polymer (I) with acid-labile groups releasing groups that increase its solubility in aqueous alkaline developers and also (protected) anchor groups for coupling with amplification agent (II), a photoacid (III) and a solvent (IV) for (I). This is applied to a substrate, dried to form resist film, exposed selectively to release acid from (III) in the exposed sections; heated to remove the acid-labile groups from (I) and release polar groups, giving a contrasted resist with polar and unpolar sections; and developed with an alkaline developer, which has higher polarity than (IV) and does not dissolve (I), so that the polar sections are removed. The structurized resist is then treated with (II), which has reactive group(s) that can react with the reactive anchor groups of (I), as liquid phase in solvent(s) in which (I) is insoluble and leaving the (II) solution on the structurized resist so that it couples with (I) to give an amplified resist; then washed with a medium containing water as solvent to remove excess (II).