1.
    发明专利
    未知

    公开(公告)号:DE19825612C2

    公开(公告)日:2002-10-31

    申请号:DE19825612

    申请日:1998-06-08

    Abstract: A semiconductor component has local silicon wiring. A first silicon region and a second silicon region are doped with dopants of opposite conductivity. The second silicon region is arranged at least partially over the first silicon region and is separated from it by an insulation layer. The insulation layer is formed with an opening. A conductive layer is disposed at the opening. The conductive layer is composed of a metal, a metal nitride or a combination thereof and connects the first and the second silicon regions electrically to one another.

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