中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

10 records (took 0.026 seconds)

    MERGED-MASK MICRO-MACHINING PROCESS
    2.
    发明公开
    MERGED-MASK MICRO-MACHINING PROCESS 有权
    跨褪色口罩微机械方法

    公开(公告)号：EP1196788A1

    公开(公告)日：2002-04-17

    申请号：EP00945370.5

    申请日：2000-07-13

    Applicant: Input Output, Inc.

    Inventor： YU, Lianzhong,13906 NE 9th PL ,  RIED, Robert, P. ,  GOLDBERG, Howard, D. ,  YU, Duli

    IPC: G01P9/04 ,  G01P15/135 ,  G02B26/00 ,  C23F1/00 ,  G03F7/26

    CPC classification number: G02B26/0816 ,  B81B2201/042 ,  B81C1/00396 ,  B81C2201/0132 ,  B81C2201/0133 ,  B81C2203/0109 ,  C23F1/02

    Abstract: The present invention provides merged-mask processes for fabricating micro-machined devices in general and mirrored assemblies for use in optical scanning devices in particular. The process includes (a) providing a substrate having a predetermined thickness; (b) applying a first masking layer on a first portion of the substrate and a second masking layer on a second portion of the substrate, said second masking layer being at least as thick as the first masking layer; (c) etching a portion of the second masking layer to provide a first exposed portion of the substrate; (d) etching the first exposed portion of the substrate to a first depth; (e) etching the second masking layer to provide a second exposed portion of the substrate; and (f) etching simultaneously the first exposed portion of the substrate to a second depth and the second exposed portion of the substrate to a first depth. The process further comprises patterning the first masking layer before applying the second masking layer to provide the second portion of the substrate for etching and etching the first masking layer to expose the second portion of the substrate. The first and second masking layers are applied prior to etching the substrate.

    MERGED-MASK MICRO-MACHINING PROCESS
    4.
    发明授权
    MERGED-MASK MICRO-MACHINING PROCESS 有权
    麻省理工学院麻省理工学院ÜBERBLENDETENMASKEN

    公开(公告)号：EP1196788B1

    公开(公告)日：2004-12-22

    申请号：EP00945370.5

    申请日：2000-07-13

    Applicant: Input/Output, Inc.

    Inventor： YU, Lianzhong ,  RIED, Robert, P. ,  GOLDBERG, Howard, D. ,  YU, Duli

    IPC: G01P9/04 ,  G01P15/135 ,  G02B26/00 ,  C23F1/00 ,  G03F7/26 ,  G03F7/00

    CPC classification number: G02B26/0816 ,  B81B2201/042 ,  B81C1/00396 ,  B81C2201/0132 ,  B81C2201/0133 ,  B81C2203/0109 ,  C23F1/02

    Abstract: The present invention provides merged-mask processes for fabricating micro-machined devices in general and mirrored assemblies for use in optical scanning devices in particular. The process includes (a) providing a substrate having a predetermined thickness; (b) applying a first masking layer on a first portion of the substrate and a second masking layer on a second portion of the substrate, said second masking layer being at least as thick as the first masking layer; (c) etching a portion of the second masking layer to provide a first exposed portion of the substrate; (d) etching the first exposed portion of the substrate to a first depth; (e) etching the second masking layer to provide a second exposed portion of the substrate; and (f) etching simultaneously the first exposed portion of the substrate to a second depth and the second exposed portion of the substrate to a first depth. The process further comprises patterning the first masking layer before applying the second masking layer to provide the second portion of the substrate for etching and etching the first masking layer to expose the second portion of the substrate. The first and second masking layers are applied prior to etching the substrate.

    Abstract translation: 本发明提供了用于一般地制造微机械装置和特别是用于光学扫描装置的镜面组件的合并掩模工艺。 一种制造三维结构的方法，包括：提供衬底，将第一掩蔽材料层施加到所述衬底上，将第二掩蔽材料层施加到所述第一掩模材料的所述层上，将所述第二掩模材料的所述层 掩模材料，将第三掩模材料层施加到未被第二掩模材料的图案化层覆盖的部分上，第三掩模材料的层至少与第一和第二掩模材料的层的组合厚度一样厚 掩模材料，图案化第一和第三掩模材料的层，蚀刻衬底的暴露部分，蚀刻第一和第三掩模材料的层的暴露部分并蚀刻衬底的暴露部分。

    MICRO-MACHINED MIRROR DEVICE
    5.
    发明公开
    MICRO-MACHINED MIRROR DEVICE 有权
    微制造的反射镜器件

    公开(公告)号：EP1200865A1

    公开(公告)日：2002-05-02

    申请号：EP00947273.9

    申请日：2000-07-13

    Applicant: Input Output, Inc.

    Inventor： YU, Duli ,  YU, Lianzhong ,  GOLDBERG, Howard, D. ,  SCHMIDT, Martin, A. ,  RIED, Robert, P.

    IPC: G02B7/182

    CPC classification number: G02B26/0841 ,  G02B7/1821

    Abstract: A micro machined mirror assembly is provided that includes a micro machined top cap (205), mirror (210), and bottom cap (215) mounted onto a ceramic substrate. The micro machined mirror is resiliently supported by a pair of T-shaped hinges and includes travel stops that limit motion of the mirror in the x-, y-, and z-directions. The top and bottom micro machined caps also include travel stops that limit motion of the mirror in the z-direction.

Patent Agency Ranking