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    3.
    发明专利
    未知

    公开(公告)号：DE602004018648D1

    公开(公告)日：2009-02-05

    申请号：DE602004018648

    申请日：2004-08-04

    Applicant: JSR CORP

    Inventor： FUJIWARA KOUICHI ,  YAMAGUCHI HIROSHI ,  NAKAMURA ATSUSHI

    IPC: C08F220/28 ,  C08F220/30 ,  G03F7/039 ,  H01L21/30

    Abstract: To provide a resist which is excellent in the solubility in a resist solvent and little dependent on baking temperature and can form developed patterns reduced in line edge roughness. An acrylic polymer characterized by comprising units of the general formula (1), units of general formula (2), and units of general formula (3) and/or units of general formula (4), wherein R, R', R" and R€´ are each hydrogen, methyl, or trifluoromethyl; R 1 is hydrogen, C 1-4 linear or branched alkyl, alkoxy, or C 1-4 linear or branched fluoroalkyl; X is a C 7-20 polycyclic aliphatic hydrocarbon group consisting of carbon atoms and hydrogen atoms; R 2 and R 3 are each independently C 1-4 linear or branched alkyl; R 4 is a C 4-20 alicyclic hydrocarbon group; R 5 is C 1-4 linear or branched alkyl; and R 6 and R 7 are each hydrogen or C 1-4 linear or branched alkyl.

    4.
    发明专利
    未知

    公开(公告)号：AT481430T

    公开(公告)日：2010-10-15

    申请号：AT03770122

    申请日：2003-11-04

    Applicant: JSR CORP

    Inventor： ISHII HIROYUKI ,  FUJIWARA KOUICHI ,  YAMAGUCHI HIROSHI ,  NISHIMURA YUKIO

    IPC: C08F220/26 ,  G03F7/039

    Abstract: An acrylic copolymer having a specific structure and a radiation-sensitive resin composition comprising the acrylic copolymer having high transparency to radiation, excelling in basic properties as a resist such as sensitivity, resolution, dry etching resistance, and pattern shape, and, in particular, excelling in forming contact holes and lines-and-spaces.

    5.
    发明专利
    未知

    公开(公告)号：AT418570T

    公开(公告)日：2009-01-15

    申请号：AT04771184

    申请日：2004-08-04

    Applicant: JSR CORP

    Inventor： FUJIWARA KOUICHI ,  YAMAGUCHI HIROSHI ,  NAKAMURA ATSUSHI

    IPC: C08F220/28 ,  C08F220/30 ,  G03F7/039 ,  H01L21/30

    Abstract: To provide a resist which is excellent in the solubility in a resist solvent and little dependent on baking temperature and can form developed patterns reduced in line edge roughness. An acrylic polymer characterized by comprising units of the general formula (1), units of general formula (2), and units of general formula (3) and/or units of general formula (4), wherein R, R', R" and R€´ are each hydrogen, methyl, or trifluoromethyl; R 1 is hydrogen, C 1-4 linear or branched alkyl, alkoxy, or C 1-4 linear or branched fluoroalkyl; X is a C 7-20 polycyclic aliphatic hydrocarbon group consisting of carbon atoms and hydrogen atoms; R 2 and R 3 are each independently C 1-4 linear or branched alkyl; R 4 is a C 4-20 alicyclic hydrocarbon group; R 5 is C 1-4 linear or branched alkyl; and R 6 and R 7 are each hydrogen or C 1-4 linear or branched alkyl.

    ACRYLIC POLYMERS AND RADIATION-SENSITIVE RESIN COMPOSITIONS
    10.
    发明公开
    ACRYLIC POLYMERS AND RADIATION-SENSITIVE RESIN COMPOSITIONS 有权
    ACRYLPOLYMERE UND STRAHLUNGSEMFINDLICHE HARZZUSAMMENSETZUNG

    公开(公告)号：EP1652866A4

    公开(公告)日：2007-04-11

    申请号：EP04771184

    申请日：2004-08-04

    Applicant: JSR CORP

    Inventor： FUJIWARA KOUICHI ,  YAMAGUCHI HIROSHI ,  NAKAMURA ATSUSHI

    IPC: C08F220/28 ,  C08F220/30 ,  G03F7/039 ,  H01L21/30

    CPC classification number: C08F220/30 ,  G03F7/0397 ,  Y10S430/108 ,  Y10S430/111

    Abstract: To provide a resist which is excellent in the solubility in a resist solvent and little dependent on baking temperature and can form developed patterns reduced in line edge roughness. An acrylic polymer characterized by comprising units of the general formula (1), units of general formula (2), and units of general formula (3) and/or units of general formula (4), wherein R, R', R" and R€´ are each hydrogen, methyl, or trifluoromethyl; R 1 is hydrogen, C 1-4 linear or branched alkyl, alkoxy, or C 1-4 linear or branched fluoroalkyl; X is a C 7-20 polycyclic aliphatic hydrocarbon group consisting of carbon atoms and hydrogen atoms; R 2 and R 3 are each independently C 1-4 linear or branched alkyl; R 4 is a C 4-20 alicyclic hydrocarbon group; R 5 is C 1-4 linear or branched alkyl; and R 6 and R 7 are each hydrogen or C 1-4 linear or branched alkyl.

    Abstract translation: 提供一种在抗蚀剂溶剂中溶解性优异且几乎不依赖于烘烤温度的抗蚀剂，并且可以形成线边缘粗糙度降低的显影图案。 一种丙烯酸类聚合物，其特征在于包含通式（1）的单元，通式（2）的单元和通式（3）的单元和/或通式（4）的单元，其中R，R'，R“ R 1是氢，甲基或三氟甲基; R 1是氢，C 1-4直链或支链烷基，烷氧基或C 1-4直链或支链氟烷基; X是C 7-20多环脂族烃基 由碳原子和氢原子组成; R 2和R 3各自独立地为C 1-4直链或支链烷基; R 4为C 4-20脂环族烃基; R 5为C 1-4直链或支链烷基;和 R 6和R 7各自为氢或C 1-4直链或支链烷基。

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