公开(公告)号：EP2378362A4

公开(公告)日：2012-07-04

申请号：EP09822037

申请日：2009-10-21

Applicant: JSR CORP

Inventor： YADA YUJI ,  ANNO YUSUKE ,  KAKIZAWA TOMOHIRO ,  HORI MASAFUMI ,  MITA MICHIHIRO ,  WAKAMATSU GOJI

IPC: G03F7/40 ,  G03F7/00 ,  H01L21/027

CPC classification number: H01L21/0273 ,  G03F7/0035 ,  G03F7/0037 ,  G03F7/40

公开(公告)号：EP2479614A4

公开(公告)日：2013-07-03

申请号：EP10817289

申请日：2010-09-17

Applicant: JSR CORP

Inventor： ASANO YUUSUKE ,  SATOU MITSUO ,  NAKASHIMA HIROMITSU ,  KASAHARA KAZUKI ,  OIZUMI YOSHIFUMI ,  HORI MASAFUMI ,  KAWAKAMI TAKANORI ,  MATSUDA YASUHIKO ,  NAKAHARA KAZUO

IPC: G03F7/039 ,  C08F20/26 ,  G03F7/004 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/0392 ,  C08F20/22 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0388 ,  G03F7/039 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/30 ,  G03F7/32

Abstract: A radiation-sensitive resin composition includes (A) a polymer that includes an acid-labile group, (B) an acid generator that generates an acid upon exposure to radiation, and (C) a polymer that includes a fluorine atom and a functional group shown by the following general formula (x), the polymer (C) having a fluorine atom content higher than that of the polymer (A). €ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ-A-R 1 €ƒ€ƒ€ƒ€ƒ€ƒ(x) wherein R 1 represents an alkali-labile group, and A represents an oxygen atom (excluding an oxygen atom that is bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group), an imino group, -CO-O-*, or -SO 2 -O-* (wherein "*" indicates a bonding hand bonded to R 1 ).

Abstract translation: 一种辐射敏感树脂组合物包括（A）的聚合物没包括在基酸不稳定，（B）以酸产生剂在暴露生成酸在辐射中，以及（C）的聚合物确实包括氟原子和官能团 通过具有氟原子的含量比聚合物（A）的较高的下述通式（X）中，聚合物（C）中所示。 €ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ-AR 1€ƒ€ƒ€ƒ€ƒ€ƒ（x）的worin，R 1碱不稳定的基团的darstellt，和氧原子的darstellt（不含 到处于芳环，羰基，或亚砜一组）直接键合到氧原子，以亚氨基，-CO-O- *， - O-或-SO 2 *（worin“*”表示结合手 结合到R 1）。

公开(公告)号：JP2015092231A

公开(公告)日：2015-05-14

申请号：JP2014187118

申请日：2014-09-12

Applicant: JSR CORP

Inventor： MIYATA HIROMU ,  NAMAI HAYATO ,  HORI MASAFUMI

IPC: G03F7/004 ,  C08F220/18 ,  C08F220/22 ,  G03F7/039 ,  H01L21/027

Abstract: 【課題】保存安定性及び現像欠陥抑制性に優れると共に、LWR性能、CDU性能、解像性、断面形状の矩形性、焦点深度及びMEEF性能にも優れる感放射線性樹脂組成物を提供する。【解決手段】下記式(1)で表される構造を有する化合物、フッ素原子を含む第1重合体及び溶媒を含有する感放射線性樹脂組成物である。【選択図】なし

公开(公告)号：JP2013083973A

公开(公告)日：2013-05-09

申请号：JP2012215292

申请日：2012-09-27

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： HORI MASAFUMI ,  NAKAJIMA HIROMITSU

IPC: G03F7/039 ,  C08F20/38 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a photoresist composition excellent in MEEF (mask error enhancement factor), CDU (critical dimension uniformity) and resolution, and to provide a method for forming a resist pattern using the photoresist composition.SOLUTION: The photoresist composition comprises: [A] a polymer having a (meth)acrylate unit (I) having a norbornane ring with a sulfolactone ring in a side chain and having a weight average molecular weight of 3,000 or more and 8,000 or less; and [B] an acid generator. It is preferable that the polymer [A] further contains a structural unit (II) having an acid dissociable group.

Abstract translation: 要解决的问题：提供在MEEF（掩模误差增强因子），CDU（临界尺寸均匀性）和分辨率方面优异的光致抗蚀剂组合物，并提供使用光致抗蚀剂组合物形成抗蚀剂图案的方法。 光致抗蚀剂组合物包含：[A]具有（甲基）丙烯酸酯单元（I）的侧链中具有降冰片烷环与磺基内酯环的重均分子量为3,000以上且8,000以下的聚合物 或更少; 和[B]酸生成剂。 优选聚合物[A]还含有具有酸解离基团的结构单元（II）。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2013083972A

公开(公告)日：2013-05-09

申请号：JP2012215291

申请日：2012-09-27

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： HORI MASAFUMI ,  KIRITOSHI YUKO

IPC: G03F7/039 ,  C08F20/38 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a photoresist composition excellent in MEEF (mask error enhancement factor), DOF (depth of focus) and resolution, and to provide a method for forming a resist pattern using the photoresist composition.SOLUTION: The photoresist composition comprises: [A] a polymer having a (meth)acrylate unit (I) having a norbornane ring with a sulfolactone ring in a side chain, a structural unit (II) including an acid dissociable group having a monocyclic alicyclic group, and a structural unit (III) including a lactone group; and [B] a radiation-sensitive acid generator.

Abstract translation: 要解决的问题：提供在MEEF（掩模误差增强因子），DOF（聚焦深度）和分辨率方面优异的光致抗蚀剂组合物，并提供使用光致抗蚀剂组合物形成抗蚀剂图案的方法。 光致抗蚀剂组合物包含：[A]具有侧链中具有磺基内酯环的降冰片烷环的（甲基）丙烯酸酯单元（I）的聚合物，包含酸解离基团的结构单元（II），其具有 单环脂族基团和包含内酯基团的结构单元（III）; 和[B]辐射敏感酸产生剂。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2012093741A

公开(公告)日：2012-05-17

申请号：JP2011214135

申请日：2011-09-29

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： KIMURA TORU ,  NAKAJIMA HIROMITSU ,  KIMURA REIKO ,  KASAHARA KAZUKI ,  HORI MASAFUMI ,  YOSHIDA MASASHI

IPC: G03F7/039 ,  C08F220/20

CPC classification number: G03F7/2041 ,  G03F7/0046 ,  G03F7/0397

Abstract: PROBLEM TO BE SOLVED: To form a resist film suppressing generation of defects due to development failure in liquid immersion exposure while the hydrophobicity of a film surface is increased and also being excellent in lithographic performance.SOLUTION: There is provided a radiation-sensitive resin composition characterized by comprising a polymer (A) having a repeating unit (a1) having a group represented by the following general formula (1) or (2) and having a fluorine atom, in an amount of 0.1 mass% or more and 20 mass% or less based on the total volume of a polymer.

Abstract translation: 要解决的问题：为了形成抗蚀剂膜，其抑制由于液面曝光时的显影失败而产生的缺陷，同时膜表面的疏水性增加并且还具有优异的光刻性能。 解决方案：提供一种辐射敏感性树脂组合物，其特征在于包含具有由以下通式（1）或（2）表示的基团的重复单元（a1）的聚合物（A），并具有氟原子 ，相对于聚合物的总体积为0.1质量％以上20质量％以下。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2011227437A

公开(公告)日：2011-11-10

申请号：JP2010208639

申请日：2010-09-16

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： ASANO YUSUKE ,  SATO MITSUHISA ,  NAKAJIMA HIROMITSU ,  KASAHARA KAZUKI ,  OIZUMI YOSHIJI ,  HORI MASAFUMI ,  KAWAKAMI TAKANORI ,  MATSUDA YASUHIKO ,  NAKAHARA KAZUO

IPC: G03F7/004 ,  C08F20/10 ,  C08F20/54 ,  G03F7/039 ,  G03F7/38 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition which can improve hydrophilicity during alkali development while ensuring hydrophobicity during liquid immersion exposure, suppress a development defect of an un-exposure part, and give a resist coating film which is excellent in a pattern shape after development.SOLUTION: The radiation-sensitive resin composition contains polymer (A) with acid dissociable group, an acid generator (B) which generates an acid by radiation, and polymer (C) which has a functional group represented by general formula (x) and a fluorine atom, and the polymer (C) is a polymer with more fluorine atom content than the polymer(A). [In the general formula (x), Rrepresents alkali dissociable group, A represents oxygen atom (excluding ones directly bonded to aromatic ring, carbonyl group, and sulfoxyl group), imino group, -CO-O-* or -SO-O-* ("*"represents a bonding hand which is bonded to R.).]

Abstract translation: 解决的问题：提供一种能够改善在碱性显影期间的亲水性同时确保浸渍曝光期间的疏水性的辐射敏感性树脂组合物，抑制未曝光部分的显影缺陷，并且得到抗蚀剂涂膜 发育后的图案形状优异。 解决方案：辐射敏感性树脂组合物含有具有酸解离基团的聚合物（A），通过辐射产生酸的酸产生剂（B）和具有由通式（x）表示的官能团的聚合物（C） ）和氟原子，聚合物（C）是比聚合物（A）具有更多的氟原子含量的聚合物。 [通式（x）中，R 1表示碱解离基，A表示氧原子（不包括直接与芳环键合，羰基和亚砜基），亚氨基 基团，-CO-O- *或-SO 2 -O- *（“*”表示键合到R 1的键合手 。）。]

版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2013152451A

公开(公告)日：2013-08-08

申请号：JP2012281859

申请日：2012-12-25

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YOSHIDA MASASHI ,  KASAHARA KAZUKI ,  NAKAHARA KAZUO ,  HORI MASAFUMI

IPC: G03F7/004 ,  C07C309/12 ,  C07C381/12 ,  C08F20/28 ,  G03F7/039

Abstract: PROBLEM TO BE SOLVED: To provide a photoresist composition capable of suppressing development defects.SOLUTION: A photoresist composition comprises: [A] a polymer having a structural unit (I) including an acid-dissociable group; and [B] an acid generating agent including a compound expressed by a formula (1) below. In the formula (1), Ris a monovalent alicyclic hydrocarbon group having 3-20 carbon atoms. An aliphatic heterocycle may be condensed with a carbon ring of the alicyclic hydrocarbon group. X is **-(X-R')-X-. Xis *-COO- or -O-. Xis -COO- or -O-. R' is a divalent alicyclic hydrocarbon group having 3-20 carbon atoms. An aliphatic heterocycle may be condensed with a carbon ring of the alicyclic hydrocarbon group. n is 0 or 1. Ris a divalent straight chain hydrocarbon group having even number of carbon atoms or a divalent straight chain fluorination hydrocarbon group having even number of carbon atoms. Ris a hydrogen atom or a fluorine atom.

Abstract translation: 要解决的问题：提供能够抑制显影缺陷的光致抗蚀剂组合物。解决方案：光致抗蚀剂组合物包含：[A]具有包含酸解离基团的结构单元（I）的聚合物; 和[B]包含由下式（1）表示的化合物的酸产生剂。 式（1）中，R为碳原子数为3〜20的1价脂环式烃基。 脂族杂环可以与脂环族烃基的碳环稠合。 X是** - （X-R'） - X-。 Xis * -COO-或-O-。 Xis -COO-或-O-。 R'是具有3-20个碳原子的二价脂环族烃基。 脂族杂环可以与脂环族烃基的碳环稠合。 n为0或1. R为具有偶数碳原子的二价直链烃基或具有偶数碳原子的二价直链氟化烃基。 R是氢原子或氟原子。

公开(公告)号：JP2013101371A

公开(公告)日：2013-05-23

申请号：JP2012281812

申请日：2012-12-25

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： ITO NOBUJI ,  SAKAKIBARA HIROKAZU ,  HORI MASAFUMI ,  FURUKAWA TAIICHI

IPC: G03F7/038 ,  C08F220/28 ,  G03F7/004 ,  G03F7/039 ,  G03F7/32 ,  H01L21/027

CPC classification number: G03F7/004 ,  G03F7/0046 ,  G03F7/0048 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/325

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition, which suppresses generation of a missing contact hole in a process using a developing solution containing an organic solvent, and which is excellent in lithographic characteristics.SOLUTION: The radiation-sensitive resin composition is used for a method for forming a negative resist pattern using a developing solution containing 80 mass% or more of an organic solvent; and the resin composition comprises [A] a base polymer having an acid dissociable group, [B] a polymer having a higher fluorine atom content percentage than that of the [A] polymer, [C] a radiation-sensitive acid generator, [D] a solvent, and [E] a compound having a relative permittivity higher at least by 15 than the relative permittivity of the [D] solvent. The [A] polymer has a structural unit expressed by formula (1) described below. The [E] compound is included in an amount of 10 pts.mass or more and 200 pts.mass or less with respect to 100 pts.mass of the [A] polymer.

Abstract translation: 要解决的问题：提供一种辐射敏感性树脂组合物，其在使用含有机溶剂的显影液的方法中抑制缺失接触孔的产生，并且其光刻特性优异。 光敏树脂组合物用于使用含有80质量％以上有机溶剂的显影液形成负型抗蚀剂图案的方法; 树脂组合物包含[A]具有酸解离基团的基础聚合物，[B]具有比[A]聚合物更高的氟原子含量百分比的聚合物，[C]辐射敏感酸产生剂[D ]溶剂，[E]相对介电常数比[D]溶剂的相对介电常数至少高15的化合物。 [A]聚合物具有由下述式（1）表示的结构单元。 [E]化合物的含量相对于100质量份[A]聚合物为10质量份以上且200质量份以下。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2012185472A

公开(公告)日：2012-09-27

申请号：JP2011211650

申请日：2011-09-27

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： HORI MASAFUMI ,  NAKAJIMA HIROMITSU ,  MARUYAMA KEN

IPC: G03F7/039 ,  C08F20/38 ,  C09K3/00 ,  G03F7/004

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition capable of forming a resist pattern which sufficiently satisfies MEEF, LWR and CDU and pattern collapse resistance properties, and to provide a method for forming the resist pattern using the radiation sensitive resin composition.SOLUTION: The radiation sensitive resin composition contains: [A] a polymer including a structural unit (I) expressed by formula (1) and a structural unit having an acid dissociable group; [B] a salt having photo-degradation properties expressed by formula (2); and [C] a radiation sensitive acid generator.

Abstract translation: 解决的问题：提供一种能够形成足以满足MEEF，LWR和CDU的抗蚀剂图案的耐辐射敏感性树脂组合物和图案抗倒塌性能，并提供使用该辐射敏感树脂形成抗蚀剂图案的方法 组成。 解决方案：辐射敏感性树脂组合物包含：[A]包含由式（1）表示的结构单元（I）的聚合物和具有酸解离基团的结构单元; [B]具有由式（2）表示的光降解性的盐; 和[C]辐射敏感酸产生剂。 版权所有（C）2012，JPO＆INPIT