公开(公告)号：DE60234733D1

公开(公告)日：2010-01-28

申请号：DE60234733

申请日：2002-03-05

Applicant: JSR CORP

Inventor： NAGAI TOMOKI ,  NUMATA JUN ,  KUSUMOTO SHIROU ,  KOBAYASHI EIICHI

IPC: C07D209/86 ,  C08F8/02 ,  C08F8/30 ,  C08F12/24 ,  C08L25/18 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

Abstract: A carbazole derivative of the following formula (1), wherein R and R individually represent a hydrogen atom or a monovalent organic group, or R and R form, together with the carbon atom to which R and R bond, a divalent organic group having a 3-8 member carbocyclic structure or a 3-8 member heterocyclic structure, and R represents a hydrogen atom or a monovalent organic group. The carbazole derivative is suitable as an additive for increasing sensitivity of a chemically amplified resist. A chemically amplified radiation-sensitive resin composition, useful as a chemically amplified resist, comprising the carbazole derivative is also disclosed.

公开(公告)号：DE60043838D1

公开(公告)日：2010-04-01

申请号：DE60043838

申请日：2000-12-22

Applicant: JSR CORP

Inventor： KAI TOSHIYUKI ,  WANG YONG ,  KUSUMOTO SHIROU ,  OHTA YOSHIHISA

IPC: G03F7/038 ,  H01L21/027 ,  G03F7/004

Abstract: A negative radiation-sensitive resin composition including (A) an alkali-soluble resin containing a copolymer selected from the group consisting of a hydroxystyrene/styrene copolymer having hydroxystyrene units in a content of from 65 to 90 mol% and a hydroxystyrene/ alpha -methylstyrene copolymer having hydroxystyrene units in a content of from 65 to 90 mol%, (B) a radiation-sensitive acid-generating agent containing a hydroxyl group-containing onium salt compound, and (C) a cross-linking agent containing an N-(alkoxymethyl)glycoluril compound. The composition is suitable as a chemically amplified negative resist, to which alkaline developing solutions having usual concentration are applicable and which can form, in usual line-and-space patterns, resist patterns having a rectangular cross-sectional shape in a high resolution and also has superior sensitivity, developability and dimensional fidelity.