公开(公告)号：DE60018350T2

公开(公告)日：2006-07-06

申请号：DE60018350

申请日：2000-11-08

Applicant: JSR CORP

Inventor： WANG YONG ,  KOBAYASHI EIICHI ,  MIYAJI MASAAKI ,  NUMATA JUN ,  SHIMOKAWA TSUTOMU

IPC: C07D209/48 ,  G03F7/028 ,  C07D207/46 ,  C07D209/76 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039

Abstract: An N-sulfonyloxyimide compound having the formula (1): wherein X represents a single bond or a double bond, Y and Z represent a hydrogen atom or others and may combine to form a cyclic structure; and R is a group having the formula (2): wherein X represents an organic group having an ester linkage, R represents an alkyl group or an alkoxyl group; and m is an integer of 1 to 11 and n is an integer of 0 to 10, satisfying m + n ≤ 11; and chemically amplified positive and negative radiation-sensitive resin compositions using the compound are provided. The N-sulfonyloxyimide compound is a good radiation-sensitive acid-generating agent, has no problem of volatilization or side reaction, can keep dark reaction from taking place during the storage. The compound is useful as a component of radiation-sensitive chemically amplified resists.

公开(公告)号：DE60236710D1

公开(公告)日：2010-07-29

申请号：DE60236710

申请日：2002-04-25

Applicant: JSR CORP

Inventor： NAGAI TOMOKI ,  NUMATA JUN ,  KOBAYASHI EIICHI ,  SHIMOKAWA TSUTOMU

IPC: G03F7/004 ,  G03F7/039 ,  C08F12/24 ,  H01L21/027

公开(公告)号：DE60234733D1

公开(公告)日：2010-01-28

申请号：DE60234733

申请日：2002-03-05

Applicant: JSR CORP

Inventor： NAGAI TOMOKI ,  NUMATA JUN ,  KUSUMOTO SHIROU ,  KOBAYASHI EIICHI

IPC: C07D209/86 ,  C08F8/02 ,  C08F8/30 ,  C08F12/24 ,  C08L25/18 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

Abstract: A carbazole derivative of the following formula (1), wherein R and R individually represent a hydrogen atom or a monovalent organic group, or R and R form, together with the carbon atom to which R and R bond, a divalent organic group having a 3-8 member carbocyclic structure or a 3-8 member heterocyclic structure, and R represents a hydrogen atom or a monovalent organic group. The carbazole derivative is suitable as an additive for increasing sensitivity of a chemically amplified resist. A chemically amplified radiation-sensitive resin composition, useful as a chemically amplified resist, comprising the carbazole derivative is also disclosed.

公开(公告)号：DE60018350D1

公开(公告)日：2005-04-07

申请号：DE60018350

申请日：2000-11-08

Applicant: JSR CORP

Inventor： WANG YONG ,  KOBAYASHI EIICHI ,  MIYAJI MASAAKI ,  NUMATA JUN ,  SHIMOKAWA TSUTOMU

IPC: G03F7/028 ,  C07D207/46 ,  C07D209/76 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  C07D209/48

Abstract: An N-sulfonyloxyimide compound having the formula (1): wherein X represents a single bond or a double bond, Y and Z represent a hydrogen atom or others and may combine to form a cyclic structure; and R is a group having the formula (2): wherein X represents an organic group having an ester linkage, R represents an alkyl group or an alkoxyl group; and m is an integer of 1 to 11 and n is an integer of 0 to 10, satisfying m + n ≤ 11; and chemically amplified positive and negative radiation-sensitive resin compositions using the compound are provided. The N-sulfonyloxyimide compound is a good radiation-sensitive acid-generating agent, has no problem of volatilization or side reaction, can keep dark reaction from taking place during the storage. The compound is useful as a component of radiation-sensitive chemically amplified resists.