MULTILAYER TARGETS FOR CALIBRATION AND ALIGNMENT OF X-RAY BASED MEASUREMENT SYSTEMS

    公开(公告)号:WO2019191335A1

    公开(公告)日:2019-10-03

    申请号:PCT/US2019/024437

    申请日:2019-03-27

    Abstract: Multilayer targets enabling fast and accurate, absolute calibration and alignment of X-ray based measurement systems are described herein. The multilayer calibration targets have very high diffraction efficiency and are manufactured using fast, low cost production techniques. Each target includes a multilayer structure built up with pairs of X-ray transparent and X-ray absorbing materials. The layers of the multilayer target structure is oriented parallel to an incident X-ray beam. Measured diffraction patterns indicate misalignment in position and orientation between the incident X-Ray beam and the multilayer target. In another aspect, a composite multilayer target includes at least two multilayer structures arranged adjacent one another along a direction aligned with the incident X-ray beam, adjacent one another along a direction perpendicular to the incident X-ray beam, or a combination thereof. In some embodiments, the multilayer structures are spatially separated from one another by a gap distance.

    METHODS AND SYSTEMS FOR SEMICONDUCTOR METROLOGY BASED ON POLYCHROMATIC SOFT X-RAY DIFFRACTION

    公开(公告)号:WO2019014283A1

    公开(公告)日:2019-01-17

    申请号:PCT/US2018/041533

    申请日:2018-07-11

    Abstract: Methods and systems for performing measurements of semiconductor structures based on high-brightness, polychromatic, reflective small angle x-ray scatterometry (RSAXS) metrology are presented herein. RSAXS measurements are performed over a range of wavelengths, angles of incidence, and azimuth angles with small illumination beam spot size, simultaneously or sequentially. In some embodiments, RSAXS measurements are performed with x-ray radiation in the soft x-ray (SXR) region at grazing angles of incidence in the range of 5-20 degrees. In some embodiments, the x-ray illumination source size is 10 micrometers or less, and focusing optics project the source area onto a wafer with a demagnification factor of 0.2 or less, enabling an incident x-ray illumination spot size of less than two micrometers. In another aspect, active focusing optics project programmed ranges of illumination wavelengths, angles of incidence, and azimuth angles, or any combination thereof, onto a metrology area, either simultaneously or sequentially.

    CALIBRATION OF A SMALL ANGLE X-RAY SCATTEROMETRY BASED METROLOGY SYSTEM
    3.
    发明申请
    CALIBRATION OF A SMALL ANGLE X-RAY SCATTEROMETRY BASED METROLOGY SYSTEM 审中-公开
    基于小角度X射线散射计测量系统的标定

    公开(公告)号:WO2018075999A1

    公开(公告)日:2018-04-26

    申请号:PCT/US2017/057770

    申请日:2017-10-22

    Abstract: Methods and systems for calibrating the location of x-ray beam incidence onto a specimen in an x-ray scatterometry metrology system are described herein. The precise location of incidence of the illumination beam on the surface of the wafer is determined based on occlusion of the illumination beam by two or more occlusion elements. The center of the illumination beam is determined based on measured values of transmitted flux and a model of the interaction of the beam with each occlusion element. The position of the axis of rotation orienting a wafer over a range of angles of incidence is adjusted to align with the surface of wafer and intersect the illumination beam at the measurement location. A precise offset value between the normal angle of incidence of the illumination beam relative to the wafer surface and the zero angle of incidence as measured by the specimen positioning system is determined.

    Abstract translation: 本文描述了用于在X射线散射测量计量系统中校准X射线束入射到样本上的位置的方法和系统。 照明光束在晶片表面上的入射的精确位置基于两个或更多个遮挡元件对照明光束的遮挡来确定。 照明光束的中心基于透射通量的测量值以及光束与每个遮挡元件的相互作用的模型来确定。 将晶片定向在一定入射角范围上的旋转轴的位置被调整为与晶片的表面对齐并且在照射光束在测量位置处相交。 确定照明光束相对于晶片表面的法向正入射角与由样本定位系统测量的零入射角之间的精确偏移值。

    METHODS AND SYSTEMS FOR CHARACTERIZATION OF AN X-RAY BEAM WITH HIGH SPATIAL RESOLUTION

    公开(公告)号:WO2018209134A1

    公开(公告)日:2018-11-15

    申请号:PCT/US2018/032141

    申请日:2018-05-10

    Abstract: Methods and systems for positioning a specimen and characterizing an x-ray beam incident onto the specimen in a Transmission, Small-Angle X-ray Scatterometry (T-SAXS) metrology system are described herein. A specimen positioning system locates a wafer vertically and actively positions the wafer in six degrees of freedom with respect to the x-ray illumination beam without attenuating the transmitted radiation. In some embodiments, a cylindrically shaped occlusion element is scanned across the illumination beam while the detected intensity of the transmitted flux is measured to precisely locate the beam center. In some other embodiments, a periodic calibration target is employed to precisely locate the beam center. The periodic calibration target includes one or more spatially defined zones having different periodic structures that diffract X-ray illumination light into distinct, measurable diffraction patterns.

    X-RAY ZOOM LENS FOR SMALL ANGLE X-RAY SCATTEROMETRY

    公开(公告)号:WO2018128988A1

    公开(公告)日:2018-07-12

    申请号:PCT/US2018/012086

    申请日:2018-01-02

    Abstract: Methods and systems for controlling illumination beam spot size for Transmission, Small-Angle X-ray Scatterometry (T-SAXS) measurements of different sized metrology targets are described herein. An X-ray illumination optics subsystem includes one or more focusing optical elements with object and image planes at fixed locations and one or more illumination apertures or slits that independently control magnification and beam divergence. In a further aspect, the illumination source size and shape is controlled, along with magnification and beam divergence. In this manner, beam divergence and illumination, spot size on a specimen are independently controlled, while maintaining constant illumination flux.

    BEAM SHAPING SLIT FOR SMALL SPOT SIZE TRANSMISSION SMALL ANGLE X-RAY SCATTEROMETRY
    6.
    发明申请
    BEAM SHAPING SLIT FOR SMALL SPOT SIZE TRANSMISSION SMALL ANGLE X-RAY SCATTEROMETRY 审中-公开
    用于小光斑尺寸透射的小光束成形小角度X射线散射测量

    公开(公告)号:WO2017185101A1

    公开(公告)日:2017-10-26

    申请号:PCT/US2017/029215

    申请日:2017-04-24

    Abstract: Methods and systems for reducing the effect of finite source size on illumination beam spot size for Transmission, Small-Angle X-ray Scatterometry (T-SAXS) measurements are described herein. A beam shaping slit having a slender profile is located in close proximity to the specimen under measurement and does not interfere with wafer stage components over the full range of angles of beam incidence. In one embodiment, four independently actuated beam shaping slits are employed to effectively block a portion of an incoming x-ray beam and generate an output beam having a box shaped illumination cross-section. In one aspect, each of the beam shaping slits is located at a different distance from the specimen in a direction aligned with the beam axis. In another aspect, the beam shaping slits are configured to rotate about the beam axis in coordination with the orientation of the specimen.

    Abstract translation: 本文描述了用于减小传输小角X射线散射测量(T-SAXS)测量的有限光源尺寸对照射束点大小的影响的方法和系统。 具有细长轮廓的光束成形狭缝位于被测样本附近,并且不会在光束入射角的整个范围内与晶圆台部件相互干扰。 在一个实施例中,采用四个独立致动的光束成形缝隙来有效地阻挡进入的X射线束的一部分并且生成具有盒形照射横截面的输出束。 在一个方面,每个光束成形狭缝在与光束轴线对准的方向上位于与样本不同的距离处。 在另一方面,光束成形狭缝被配置成与样本的方向一致地围绕光束轴线旋转。

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