公开(公告)号：WO2018075999A1

公开(公告)日：2018-04-26

申请号：PCT/US2017/057770

申请日：2017-10-22

Applicant: KLA-TENCOR CORPORATION

Inventor： HENCH, John ,  GELLINEAU, Antonio ,  ARTEMIEV, Nikolay ,  DI REGOLO, Joseph A.

IPC: H01L21/66

Abstract: Methods and systems for calibrating the location of x-ray beam incidence onto a specimen in an x-ray scatterometry metrology system are described herein. The precise location of incidence of the illumination beam on the surface of the wafer is determined based on occlusion of the illumination beam by two or more occlusion elements. The center of the illumination beam is determined based on measured values of transmitted flux and a model of the interaction of the beam with each occlusion element. The position of the axis of rotation orienting a wafer over a range of angles of incidence is adjusted to align with the surface of wafer and intersect the illumination beam at the measurement location. A precise offset value between the normal angle of incidence of the illumination beam relative to the wafer surface and the zero angle of incidence as measured by the specimen positioning system is determined.

Abstract translation: 本文描述了用于在X射线散射测量计量系统中校准X射线束入射到样本上的位置的方法和系统。 照明光束在晶片表面上的入射的精确位置基于两个或更多个遮挡元件对照明光束的遮挡来确定。 照明光束的中心基于透射通量的测量值以及光束与每个遮挡元件的相互作用的模型来确定。 将晶片定向在一定入射角范围上的旋转轴的位置被调整为与晶片的表面对齐并且在照射光束在测量位置处相交。 确定照明光束相对于晶片表面的法向正入射角与由样本定位系统测量的零入射角之间的精确偏移值。

公开(公告)号：WO2015066395A1

公开(公告)日：2015-05-07

申请号：PCT/US2014/063283

申请日：2014-10-31

Applicant: KLA-TENCOR CORPORATION

Inventor： MCCORD, Mark A. ,  DI REGOLO, Joseph A. ,  GLUSZCZAK, Michael R.

IPC: G01J3/28 ,  G01R31/26

CPC classification number: G01J1/0407 ,  G01J1/0214 ,  G01J3/0251 ,  G01J3/0262 ,  G01J3/28 ,  G01J3/505 ,  G01J2001/0481 ,  G01J2001/4252

Abstract: Systems and methods for accurately measuring the luminous flux and color (spectra) from light-emitting devices are disclosed. An integrating sphere may be utilized to directly receive a first portion of light emitted by a light-emitting device through an opening defined on the integrating sphere. A light collector may be utilized to collect a second portion of light emitted by the light-emitting device and direct the second portion of light into the integrating sphere through the opening defined on the integrating sphere. A spectrometer may be utilized to measure at least one property of the first portion and the second portion of light received by the integrating sphere.

Abstract translation: 公开了用于准确测量发光器件的光通量和颜色（光谱）的系统和方法。 可以使用积分球直接接收由发光装置通过限定在积分球上的开口发射的光的第一部分。 可以利用光收集器来收集由发光装置发射的光的第二部分，并将第二部分的光通过限定在积分球上的开口引导到积分球。 可以使用光谱仪来测量由积分球接收的第一部分和第二部分光的至少一个性质。

公开(公告)号：WO2018209134A1

公开(公告)日：2018-11-15

申请号：PCT/US2018/032141

申请日：2018-05-10

Applicant: KLA-TENCOR CORPORATION

Inventor： BYKANOV, Alexander ,  ARTEMIEV, Nikolay ,  DI REGOLO, Joseph A. ,  GELLINEAU, Antonio ,  KUZNETSOV, Alexander ,  VELDMAN, Andrei ,  HENCH, John

IPC: G01N23/223 ,  G01N23/2204

Abstract: Methods and systems for positioning a specimen and characterizing an x-ray beam incident onto the specimen in a Transmission, Small-Angle X-ray Scatterometry (T-SAXS) metrology system are described herein. A specimen positioning system locates a wafer vertically and actively positions the wafer in six degrees of freedom with respect to the x-ray illumination beam without attenuating the transmitted radiation. In some embodiments, a cylindrically shaped occlusion element is scanned across the illumination beam while the detected intensity of the transmitted flux is measured to precisely locate the beam center. In some other embodiments, a periodic calibration target is employed to precisely locate the beam center. The periodic calibration target includes one or more spatially defined zones having different periodic structures that diffract X-ray illumination light into distinct, measurable diffraction patterns.

公开(公告)号：WO2015160922A1

公开(公告)日：2015-10-22

申请号：PCT/US2015/025930

申请日：2015-04-15

Applicant: KLA-TENCOR CORPORATION

Inventor： KOJIMA, Shinichi ,  WAHBA, Hamada ,  GLUSZCZAK, Michael R. ,  DI REGOLO, Joseph A.

IPC: H01J37/244

CPC classification number: G01N21/64 ,  H01J37/226 ,  H01J37/244 ,  H01J2237/043 ,  H01J2237/2443 ,  H01J2237/2446 ,  H01J2237/24578

Abstract: An electron beam detection apparatus includes a first aperture element including a first set of apertures. The apparatus includes a second aperture element including a second set of apertures. The second set of apertures is arranged in a pattern corresponding with the pattern of the first plurality of apertures. The detection apparatus includes an electron-photon conversion element configured to receive electrons of the electron beam transmitted through the first and second aperture elements. The electron-photon conversion element is configured to generate photons in response to the received electrons. The detection apparatus includes an optical assembly including one or more optical elements. The detection apparatus includes a detector assembly. The optical elements of the optical assembly are configured to direct the generated photons from the electron-photon conversion system to the detector assembly.

Abstract translation: 电子束检测装置包括包括第一组孔的第一孔元件。 该装置包括第二孔元件，其包括第二组孔。 第二组孔被布置成与第一多个孔的图案对应的图案。 检测装置包括电子 - 光子转换元件，其被配置为接收通过第一和第二孔元件传输的电子束的电子。 电子 - 光子转换元件被配置为响应于所接收的电子产生光子。 检测装置包括包括一个或多个光学元件的光学组件。 检测装置包括检测器组件。 光学组件的光学元件被配置为将所产生的光子从电子 - 光子转换系统引导到检测器组件。

公开(公告)号：EP3622276A1

公开(公告)日：2020-03-18

申请号：EP18799085.8

申请日：2018-05-10

Applicant: KLA - Tencor Corporation

Inventor： BYKANOV, Alexander ,  ARTEMIEV, Nikolay ,  DI REGOLO, Joseph A. ,  GELLINEAU, Antonio ,  KUZNETSOV, Alexander ,  VELDMAN, Andrei ,  HENCH, John

IPC: G01N23/223 ,  G01N23/2204