公开(公告)号：EP2732272A4

公开(公告)日：2015-08-19

申请号：EP12811849

申请日：2012-07-10

Applicant: KLA TENCOR CORP

Inventor： ROMANOVSKY ANATOLY ,  MALEEV IVAN ,  KAVALDJIEV DANIEL ,  YUDITSKY YURY ,  WOLL DIRK ,  BIELLAK STEVEN

IPC: G01N21/88 ,  G01N21/47 ,  G01N21/95 ,  G01N21/956 ,  H01L21/66

CPC classification number: G01N21/9501 ,  G01N21/47 ,  G01N21/8806 ,  G01N21/8851 ,  G01N21/956

Abstract: Systems configured to inspect a wafer are provided. One system includes an illumination subsystem configured to simultaneously form multiple illumination areas on the wafer with substantially no illumination flux between each of the areas. The system also includes a scanning subsystem configured to scan the multiple illumination areas across the wafer. In addition, the system includes a collection subsystem configured to simultaneously and separately image light scattered from each of the areas onto two or more sensors. Characteristics of the two or more sensors are selected such that the scattered light is not imaged into gaps between the two or more sensors. The two or more sensors generate output responsive to the scattered light. The system further includes a computer subsystem configured to detect defects on the wafer using the output of the two or more sensors.