System for measuring polarimetric spectrum and other properties of sample
    1.
    发明专利
    System for measuring polarimetric spectrum and other properties of sample 有权
    测量极性光谱和样品的其他性质的系统

    公开(公告)号:JP2011141288A

    公开(公告)日:2011-07-21

    申请号:JP2011055357

    申请日:2011-03-14

    CPC classification number: G01J4/02 G01J3/447 G01N21/21

    Abstract: PROBLEM TO BE SOLVED: To provide a system which relates to a non-destructive technology for measuring a surface parameter of a sample for measuring the birefringence of a surface, a film thickness, etc. using a polarimetric spectrum. SOLUTION: A polarized sample beam 46 of broadband radiation is focused to the surface of a sample 3 and the radiation polarized by the sample is collected by a mirror system in different planes of incidence. The modulated radiation is analyzed with respect to a polarization plane to provide a polarimetric spectrum. Thickness and refractive information may then be derived from the spectrum. The polarization of the sample beam is altered by the focusing and the sample, and the collection of the modulated radiation is repeated employing two different apertures 28 to detect the presence or absence of a birefringence axis in the sample. In the other preferred embodiment, the technology may be combined with ellipsometry for determining the thicknesses and refractive indices of thin films. COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题:提供一种涉及用于测量样品的表面参数的非破坏性技术的系统,用于使用偏振光谱测量表面的双折射,膜厚等。 解决方案:将宽带辐射的极化样品束46聚焦到样品3的表面,并且由样品偏振的辐射由不同入射平面中的反射镜系统收集。 相对于偏振平面分析调制的辐射以提供偏振光谱。 然后可以从光谱导出厚度和折射信息。 通过聚焦和样品改变样品光束的偏振,并且重复使用两个不同的孔28来检测调制的辐射的收集,以检测样品中双折射轴的存在或不存在。 在另一个优选实施例中,该技术可以与用于确定薄膜的厚度和折射率的椭偏仪相结合。 版权所有(C)2011,JPO&INPIT

    SYSTEM FOR MEASURING POLARIMETRIC SPECTRUM AND OTHER PROPERTIES OF A SAMPLE
    2.
    发明申请
    SYSTEM FOR MEASURING POLARIMETRIC SPECTRUM AND OTHER PROPERTIES OF A SAMPLE 审中-公开
    测量极性光谱和样品的其他性质的系统

    公开(公告)号:WO0047961A9

    公开(公告)日:2001-10-25

    申请号:PCT/US0003290

    申请日:2000-02-09

    CPC classification number: G01J4/02 G01J3/447 G01N21/21

    Abstract: A polarized sample beam (12) of broadband radiation is focused onto the surface of a sample (3) and the radiation modified by the sample is collected by means of a mirror system (16) in different planes of incidence. The sample beam focused to the sample has a multitude of polarization states. The modified radiation is analyzed with respect to a polarization plane to provide a polarimetric spectrum. Preferably the polarization of the sample beam is altered only by the focusing and the sample, and the analyzing is done with respect to a fixed polarization plane. In the preferred embodiment, the focusing of the sample beam and the collection of the modified radiation are repeated employing two different apertures (30) to detect the presence or absence of a birefringence axis in the sample. In another preferred embodiment, the above-described technique may be combined with ellipsometry for determining the thickness and refractive indices of thin films.

    Abstract translation: 将宽带辐射的偏振样品束(12)聚焦到样品(3)的表面上,并且通过不同入射平面的反射镜系统(16)收集由样品改性的辐射。 聚焦到样品的样品束具有许多极化状态。 相对于偏振平面分析修改的辐射以提供偏振光谱。 优选地,样品光束的偏振仅由聚焦和样品改变,并且相对于固定的偏振平面进行分析。 在优选实施例中,采用两个不同的孔(30)来重复样品束的聚焦和修改的辐射的收集,以检测样品中双折射轴的存在或不存在。 在另一个优选实施例中,上述技术可以与用于确定薄膜的厚度和折射率的椭偏仪组合。

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