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公开(公告)号:DE112011102209T5
公开(公告)日:2013-06-27
申请号:DE112011102209
申请日:2011-06-09
Applicant: KLA TENCOR CORP
Inventor: GUPTA AJAY , RONG SONGNIAN , CHEN CHIEN-HUEI ADAM , KIRKWOOD JASON , THATTAISUNDARAM GOVIND , MAHADEVAN MOHAN , WU KENONG , KULKARNI ASHOK
IPC: G06F19/00
Abstract: Es werden verschiedene Ausführungsformen zur Bestimmung von Parametern für die Waferinspektion und/oder -metrologie bereitgestellt.
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公开(公告)号:WO2012016243A3
公开(公告)日:2013-08-15
申请号:PCT/US2011046154
申请日:2011-08-01
Applicant: KLA TENCOR CORP , GAO LISHENG , WU KENONG , PARK ALLEN , CHANG ELLIS , ZAFAR KHURRAM , HUANG JUNQING JENNY , GU PING , MAHER CHRISTOPHER , CHEN GRACE H , RONG SONGNIAN , WU LIU-MING
Inventor: GAO LISHENG , WU KENONG , PARK ALLEN , CHANG ELLIS , ZAFAR KHURRAM , HUANG JUNQING JENNY , GU PING , MAHER CHRISTOPHER , CHEN GRACE H , RONG SONGNIAN , WU LIU-MING
CPC classification number: G06T7/001 , G06T2207/10061 , G06T2207/20021 , G06T2207/20056 , G06T2207/30148
Abstract: The present invention includes searching imagery data in order to identify one or more patterned regions on a semiconductor wafer, generating one or more virtual Fourier filter (VFF) working areas, acquiring an initial set of imagery data from the VFF working areas, defining VFF training blocks within the identified patterned regions of the VFF working areas utilizing the initial set of imagery data, wherein each VFF training block is defined to encompass a portion of the identified patterned region displaying a selected repeating pattern, calculating an initial spectrum for each VFF training block utilizing the initial set of imagery data from the VFF training blocks, and generating a VFF for each training block by identifying frequencies of the initial spectrum having maxima in the frequency domain, wherein the VFF is configured to null the magnitude of the initial spectrum at the frequencies identified to display spectral maxima.
Abstract translation: 本发明包括搜索图像数据以便识别半导体晶片上的一个或多个图案化区域,生成一个或多个虚拟傅立叶滤波器(VFF)工作区域,从VFF工作区域获取初始图像数据集,定义VFF训练 利用初始的图像数据集,在VFF工作区域的所识别的图案化区域内的块,其中每个VFF训练块被定义为包含所识别的图案化区域的一部分,显示所选择的重复模式,计算每个VFF训练块的初始频谱 利用来自VFF训练块的初始图像数据组,以及通过识别在频域中具有最大值的初始频谱的频率,为每个训练块生成VFF,其中VFF被配置为在 识别出显示频谱最大值的频率。
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公开(公告)号:WO2012016243A8
公开(公告)日:2012-09-27
申请号:PCT/US2011046154
申请日:2011-08-01
Applicant: KLA TENCOR CORP , GAO LISHENG , WU KENONG , PARK ALLEN , CHANG ELLIS , ZAFAR KHURRAM , HUANG JUNQING JENNY , GU PING , MAHER CHRISTOPHER , CHEN GRACE H , RONG SONGNIAN , WU LIU-MING
Inventor: GAO LISHENG , WU KENONG , PARK ALLEN , CHANG ELLIS , ZAFAR KHURRAM , HUANG JUNQING JENNY , GU PING , MAHER CHRISTOPHER , CHEN GRACE H , RONG SONGNIAN , WU LIU-MING
IPC: G06T7/60
CPC classification number: G06T7/001 , G06T2207/10061 , G06T2207/20021 , G06T2207/20056 , G06T2207/30148
Abstract: The present invention includes searching imagery data in order to identify one or more patterned regions on a semiconductor wafer, generating one or more virtual Fourier filter (VFF) working areas, acquiring an initial set of imagery data from the VFF working areas, defining VFF training blocks within the identified patterned regions of the VFF working areas utilizing the initial set of imagery data, wherein each VFF training block is defined to encompass a portion of the identified patterned region displaying a selected repeating pattern, calculating an initial spectrum for each VFF training block utilizing the initial set of imagery data from the VFF training blocks, and generating a VFF for each training block by identifying frequencies of the initial spectrum having maxima in the frequency domain, wherein the VFF is configured to null the magnitude of the initial spectrum at the frequencies identified to display spectral maxima.
Abstract translation: 本发明包括搜索图像数据以便识别半导体晶片上的一个或多个图案化区域,生成一个或多个虚拟傅里叶滤波器(VFF)工作区域,从VFF工作区域获取初始图像数据集合,定义VFF训练 使用初始图像数据集合在VFF工作区域的所识别图案化区域内的块,其中每个VFF训练块被定义为涵盖显示选定重复图案的所识别图案化区域的一部分,计算每个VFF训练块的初始光谱 利用来自VFF训练块的初始图像数据集,并且通过识别在频域中具有最大值的初始频谱的频率来为每个训练块生成VFF,其中VFF被配置为使得初始频谱的幅度在 确定频率显示频谱最大值。
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公开(公告)号:WO2012005863A2
公开(公告)日:2012-01-12
申请号:PCT/US2011039876
申请日:2011-06-09
Applicant: KLA TENCOR CORP , THATTAISUNDARAM GOVIND , MAHADEVAN MOHAN , GUPTA AJAY , CHEN CHIEN-HUEI ADAM , KULKARNI ASHOK , KIRKWOOD JASON , WU KENONG , RONG SONGNIAN
Inventor: THATTAISUNDARAM GOVIND , MAHADEVAN MOHAN , GUPTA AJAY , CHEN CHIEN-HUEI ADAM , KULKARNI ASHOK , KIRKWOOD JASON , WU KENONG , RONG SONGNIAN
IPC: G06F19/00
CPC classification number: G05B19/41875 , G05B2219/32182 , G05B2219/45031 , Y02P90/22
Abstract: Various embodiments for determining parameters for wafer inspection and/or metrology are provided.
Abstract translation: 提供了用于确定晶片检查和/或度量的参数的各种实施例。
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