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    Systems and methods for creating persistent data for wafer and for using persistent data for inspection-related functions
    1.
    发明专利
    Systems and methods for creating persistent data for wafer and for using persistent data for inspection-related functions 有权
    用于创建用于波形的持续数据和使用用于检查相关功能的持续数据的系统和方法

    公开(公告)号：JP2014195090A

    公开(公告)日：2014-10-09

    申请号：JP2014094395

    申请日：2014-05-01

    Applicant: Kla-Tencor Corp ,  ケーエルエー−テンカー・コーポレーションKla−Tencor Corporation

    Inventor： BHASKAR KRIS ,  CHETANA BHASKAR ,  ASHOK KULKARNI ,  ROSENGAUS ELIEZER ,  CECILIA CAMPOCHIARO ,  MAHER CHRIS ,  BRIAN DUFFY ,  ANEESH KHULLAR ,  ALPA KOHLI ,  LALITA BALASUBRAMANIAN ,  SANTOSH BHATTACHARYYA ,  MAHADEVAN MOHAN

    IPC: H01L21/66 ,  H01L21/02

    CPC classification number: G06T7/001 ,  G06T1/20 ,  G06T2207/30148

    Abstract: PROBLEM TO BE SOLVED: To provide various systems and methods for creating persistent data for a wafer and using persistent data for inspection-related functions.SOLUTION: One system includes a set of processor nodes 20 coupled to a detector 10 of an inspection system. Each of the processor nodes 20 is configured to receive a portion of image data generated by the detector 10 during scanning of a wafer 12. The system also includes an array 22 of storage media separately coupled to each of the processor nodes 20. The processor nodes 20 are configured to send all of the image data or a selected portion of the image data received by the processor nodes 20 to the arrays 22 of storage media such that all of the image data or the selected portion of the image data generated by the detector 10 during the scanning of the wafer 12 is stored in the arrays 22 of the storage media.

    Abstract translation: 要解决的问题：提供用于为晶片创建持久数据并使用持久数据进行检查相关功能的各种系统和方法。解决方案：一个系统包括耦合到检查系统的检测器10的一组处理器节点20。 每个处理器节点20被配置为在晶片12的扫描期间接收由检测器10生成的图像数据的一部分。该系统还包括分别耦合到每个处理器节点20的存储介质的阵列22.处理器节点 20被配置为将由处理器节点20接收的图像数据的所有图像数据或所选部分发送到存储介质的阵列22，使得由检测器生成的图像数据或图像数据的所选部分 在晶片12的扫描期间，10被存储在存储介质的阵列22中。

    SYSTEMS AND METHODS FOR DETECTING DEFECTS ON A WAFER
    5.
    发明申请
    SYSTEMS AND METHODS FOR DETECTING DEFECTS ON A WAFER 审中-公开
    用于检测波形缺陷的系统和方法

    公开(公告)号：WO2010085679A3

    公开(公告)日：2010-10-14

    申请号：PCT/US2010021850

    申请日：2010-01-22

    Applicant: KLA TENCOR CORP ,  CHEN LU ,  KIRKWOOD JASON ,  MAHADEVAN MOHAN ,  SMITH JAMES A ,  GAO LISHENG ,  HUANG JUNQING ,  LUO TAO ,  WALLINGFORD RICHARD

    Inventor： CHEN LU ,  KIRKWOOD JASON ,  MAHADEVAN MOHAN ,  SMITH JAMES A ,  GAO LISHENG ,  HUANG JUNQING ,  LUO TAO ,  WALLINGFORD RICHARD

    IPC: H01L21/66 ,  G01N21/88

    CPC classification number: G01N21/9501 ,  G01N2021/887 ,  H01L22/12

    Abstract: Systems and methods for detecting defects on a wafer are provided. One method includes generating output for a wafer by scanning the wafer with an inspection system using first and second optical states of the inspection system. The first and second optical states are defined by different values for at least one optical parameter of the inspection system. The method also includes generating first image data for the wafer using the output generated using the first optical state and second image data for the wafer using the output generated using the second optical state. In addition, the method includes combining the first image data and the second image data corresponding to substantially the same locations on the wafer thereby creating additional image data for the wafer. The method further includes detecting defects on the wafer using the additional image data.

    Abstract translation: 提供了用于检测晶片上的缺陷的系统和方法。 一种方法包括通过使用检查系统的第一和第二光学状态的检查系统扫描晶片来产生晶片的输出。 第一和第二光学状态由检查系统的至少一个光学参数的不同值来定义。 该方法还包括使用使用第二光学状态产生的输出使用第一光学状态产生的输出和晶片的第二图像数据为晶片产生第一图像数据。 此外，该方法包括将第一图像数据和对应于晶片上基本相同位置的第二图像数据组合，从而产生用于晶片的附加图像数据。 该方法还包括使用附加图像数据检测晶片上的缺陷。

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