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1.发明公开METHOD AND SYSTEM FOR PROVIDING A QUALITY METRIC FOR IMPROVED PROCESS CONTROL 审中-公开用于提供改进的过程控制的质量方法的方法和系统
公开(公告)号：EP2694983A4
公开(公告)日：2014-10-29
申请号：EP12768608
申请日：2012-04-04
Applicant: KLA TENCOR CORP
Inventor： KANDEL DANIEL , COHEN GUY , KLEIN DANA , LEVINSKI VLADIMIR , SAPIENS NOAM , SHULMAN ALEX , KAMENETSKY VLADIMIR , AMIT ERAN , VAKSHTEIN IRINA
CPC classification number: G03F7/70633 , G01N2223/6116
Abstract: The present invention may include acquiring a plurality of overlay metrology measurement signals from a plurality of metrology targets distributed across one or more fields of a wafer of a lot of wafers, determining a plurality of overlay estimates for each of the plurality of overlay metrology measurement signals using a plurality of overlay algorithms, generating a plurality of overlay estimate distributions, and generating a first plurality of quality metrics utilizing the generated plurality of overlay estimate distributions, wherein each quality metric corresponds with one overlay estimate distribution of the generated plurality of overlay estimate distributions, each quality metric a function of a width of a corresponding generated overlay estimate distribution, each quality metric further being a function of asymmetry present in an overlay metrology measurement signal from an associated metrology target.
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