公开(公告)号：WO2012018674A3

公开(公告)日：2012-05-18

申请号：PCT/US2011045784

申请日：2011-07-28

Applicant: KLA TENCOR CORP ,  MANASSEN AMMON ,  KANDEL DANIEL ,  BARUCH MOSHE ,  SELIGSON JOEL ,  SVIZHER ALEXANDER ,  COHEN GUY ,  ROTEM EFRAIM ,  BACHAR OHAD ,  NEGRI DARIA ,  SAPIENS NOAM

Inventor： MANASSEN AMMON ,  KANDEL DANIEL ,  BARUCH MOSHE ,  SELIGSON JOEL ,  SVIZHER ALEXANDER ,  COHEN GUY ,  ROTEM EFRAIM ,  BACHAR OHAD ,  NEGRI DARIA ,  SAPIENS NOAM

IPC: H01L21/027

CPC classification number: G03F7/70633 ,  G01N21/55 ,  G03F7/70616

Abstract: The present invention includes an illumination source, at least one illumination symmetrization module (ISM) configured to symmetrize at least a portion of light emanating from the illumination source, a first beam splitter configured to direct a first portion of light processed by the ISM along an object path to a surface of one or more specimens and a second portion of light processed by the ISM along a reference path, and a detector disposed along a primary optical axis, wherein the detector is configured to collect a portion of light reflected from the surface of the one or more specimens.

Abstract translation: 本发明包括照明源，至少一个照明对称化模块（ISM），被配置为对来自照明源发出的光的至少一部分进行对称;第一分束器，被配置为将由ISM处理的光的第一部分沿着 一个或多个样本的表面的物体路径和沿着基准路径由ISM处理的光的第二部分以及沿着主光轴布置的检测器，其中检测器被配置为收集从表面反射的光的一部分 的一个或多个标本。

公开(公告)号：WO2013002988A3

公开(公告)日：2013-07-11

申请号：PCT/US2012041273

申请日：2012-06-07

Applicant: KLA TENCOR CORP ,  MANASSEN AMNON ,  SELIGSON JOEL ,  SAPIENS NOAM

Inventor： MANASSEN AMNON ,  SELIGSON JOEL ,  SAPIENS NOAM

IPC: H01L21/027

CPC classification number: G01J1/4257 ,  G02B21/0016 ,  G02B21/082 ,  G02B21/365 ,  G02B26/0833 ,  G03F7/70633

Abstract: An optical system may include an objective, a source of illumination, an illumination system having illumination optics configured to direct the illumination onto the objective, and at least two dynamic optical array devices located at a pupil conjugate plane and a field conjugate plane, respectively in the illumination optics. The dynamic optical array devices are configured to control one or more properties of illumination coupled from the illumination system to the objective.

Abstract translation: 光学系统可以包括物镜，照明源，具有被配置为将照明引导到物镜上的照明光学器件的照明系统以及分别位于光瞳共轭平面和场共轭平面处的至少两个动态光学阵列装置 照明光学器件。 动态光学阵列装置被配置为控制从照明系统耦合到物镜的照明的一个或多个特性。

公开(公告)号：EP2724361A4

公开(公告)日：2015-03-18

申请号：EP12803940

申请日：2012-06-07

Applicant: KLA TENCOR CORP

Inventor： MANASSEN AMNON ,  SELIGSON JOEL ,  SAPIENS NOAM

IPC: H01L21/027 ,  G01J1/42 ,  G02B26/06 ,  G02B26/08 ,  G02B27/00

CPC classification number: G01J1/4257 ,  G02B21/0016 ,  G02B21/082 ,  G02B21/365 ,  G02B26/0833 ,  G03F7/70633

Abstract: An optical system may include an objective, a source of illumination, an illumination system having illumination optics configured to direct the illumination onto the objective, and at least two dynamic optical array devices located at a pupil conjugate plane and a field conjugate plane, respectively in the illumination optics. The dynamic optical array devices are configured to control one or more properties of illumination coupled from the illumination system to the objective.

公开(公告)号：EP2694983A4

公开(公告)日：2014-10-29

申请号：EP12768608

申请日：2012-04-04

Applicant: KLA TENCOR CORP

Inventor： KANDEL DANIEL ,  COHEN GUY ,  KLEIN DANA ,  LEVINSKI VLADIMIR ,  SAPIENS NOAM ,  SHULMAN ALEX ,  KAMENETSKY VLADIMIR ,  AMIT ERAN ,  VAKSHTEIN IRINA

IPC: G01N37/00 ,  G03F7/20

CPC classification number: G03F7/70633 ,  G01N2223/6116

Abstract: The present invention may include acquiring a plurality of overlay metrology measurement signals from a plurality of metrology targets distributed across one or more fields of a wafer of a lot of wafers, determining a plurality of overlay estimates for each of the plurality of overlay metrology measurement signals using a plurality of overlay algorithms, generating a plurality of overlay estimate distributions, and generating a first plurality of quality metrics utilizing the generated plurality of overlay estimate distributions, wherein each quality metric corresponds with one overlay estimate distribution of the generated plurality of overlay estimate distributions, each quality metric a function of a width of a corresponding generated overlay estimate distribution, each quality metric further being a function of asymmetry present in an overlay metrology measurement signal from an associated metrology target.

公开(公告)号：EP2457071A4

公开(公告)日：2015-09-02

申请号：EP10802847

申请日：2010-07-21

Applicant: KLA TENCOR CORP

Inventor： KANDEL DANIEL ,  LEVINSKI VLADIMIR ,  SAPIENS NOAM

IPC: G01J4/00

CPC classification number: G01N21/95607 ,  G01B11/14 ,  G01B11/24 ,  G01B2210/56 ,  G03F7/70633

公开(公告)号：EP2745313A4

公开(公告)日：2014-12-24

申请号：EP12823553

申请日：2012-07-30

Applicant: KLA TENCOR CORP

Inventor： MANASSEN AMNON ,  KANDEL DANIEL ,  BARUCH MOSHE ,  LEVINSKI VLADIMIR ,  SAPIENS NOAM ,  SELIGSON JOEL L ,  HILL ANDY ,  BACHAR OHAD ,  NEGRI DARIA ,  ZAHARAN OFER

IPC: H01L21/66 ,  G03F7/20

CPC classification number: G03F7/70633