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    COMPUTER-IMPLEMENTED METHODS, CARRIER MEDIA, AND SYSTEMS FOR SELECTING POLARIZATION SETTINGS FOR AN INSPECTION SYSTEM
    3.
    发明申请
    COMPUTER-IMPLEMENTED METHODS, CARRIER MEDIA, AND SYSTEMS FOR SELECTING POLARIZATION SETTINGS FOR AN INSPECTION SYSTEM 审中-公开
    计算机实现方法，载体介质和选择用于检查系统的极化设置的系统

    公开(公告)号：WO2009140411A2

    公开(公告)日：2009-11-19

    申请号：PCT/US2009043825

    申请日：2009-05-13

    Applicant: KLA TENCOR CORP ,  WALLINGFORD RICHARD ,  CHEN STEPHANIE ,  KIRKWOOD JASON ,  LUO TAO ,  ZHANG YONG ,  GAO LISHENG

    Inventor： WALLINGFORD RICHARD ,  CHEN STEPHANIE ,  KIRKWOOD JASON ,  LUO TAO ,  ZHANG YONG ,  GAO LISHENG

    IPC: G01N21/88 ,  G01B11/30 ,  G01N21/47

    CPC classification number: G01N21/21 ,  G01N21/9501 ,  G01N2021/8822 ,  G01N2021/8867

    Abstract: Computer-implemented methods, carrier media, and systems for selecting polarization settings for an inspection system for inspection of a layer of a wafer are provided. One method includes detecting a population of defects on the layer of the wafer using results of each of scans of the wafer performed with different combinations of polarization settings of the inspection system for illumination and collection of light scattered from the wafer. The method also includes identifying a subpopulation of the defects for each of the different combinations, each of which includes the defects that are common to at least two of the different combinations, and determining a characteristic of a measure of signal-to-noise for each of the subpopulations. The method further includes selecting the polarization settings for the illumination and the collection to be used for the inspection corresponding to the subpopulation having the best value for the characteristic.

    Abstract translation: 提供了计算机实现的方法，载体介质和用于选择用于检查晶片层的检查系统的偏振设置的系统。 一种方法包括使用用于照射的检查系统的偏振设置的不同组合和从晶片散射的光的收集的晶片的每次扫描的结果来检测晶片层上的缺陷群。 该方法还包括识别每个不同组合的缺陷的子群体，每个组合包括对于至少两个不同组合是共同的缺陷，以及确定每个组合的信噪比度量的特性 的亚群。 该方法还包括选择用于与用于该特征具有最佳值的亚群相对应的检查的照明和收集的偏振设置。

    SYSTEMS AND METHODS FOR DETECTING DEFECTS ON A WAFER
    4.
    发明申请
    SYSTEMS AND METHODS FOR DETECTING DEFECTS ON A WAFER 审中-公开
    用于检测波形缺陷的系统和方法

    公开(公告)号：WO2010085679A3

    公开(公告)日：2010-10-14

    申请号：PCT/US2010021850

    申请日：2010-01-22

    Applicant: KLA TENCOR CORP ,  CHEN LU ,  KIRKWOOD JASON ,  MAHADEVAN MOHAN ,  SMITH JAMES A ,  GAO LISHENG ,  HUANG JUNQING ,  LUO TAO ,  WALLINGFORD RICHARD

    Inventor： CHEN LU ,  KIRKWOOD JASON ,  MAHADEVAN MOHAN ,  SMITH JAMES A ,  GAO LISHENG ,  HUANG JUNQING ,  LUO TAO ,  WALLINGFORD RICHARD

    IPC: H01L21/66 ,  G01N21/88

    CPC classification number: G01N21/9501 ,  G01N2021/887 ,  H01L22/12

    Abstract: Systems and methods for detecting defects on a wafer are provided. One method includes generating output for a wafer by scanning the wafer with an inspection system using first and second optical states of the inspection system. The first and second optical states are defined by different values for at least one optical parameter of the inspection system. The method also includes generating first image data for the wafer using the output generated using the first optical state and second image data for the wafer using the output generated using the second optical state. In addition, the method includes combining the first image data and the second image data corresponding to substantially the same locations on the wafer thereby creating additional image data for the wafer. The method further includes detecting defects on the wafer using the additional image data.

    Abstract translation: 提供了用于检测晶片上的缺陷的系统和方法。 一种方法包括通过使用检查系统的第一和第二光学状态的检查系统扫描晶片来产生晶片的输出。 第一和第二光学状态由检查系统的至少一个光学参数的不同值来定义。 该方法还包括使用使用第二光学状态产生的输出使用第一光学状态产生的输出和晶片的第二图像数据为晶片产生第一图像数据。 此外，该方法包括将第一图像数据和对应于晶片上基本相同位置的第二图像数据组合，从而产生用于晶片的附加图像数据。 该方法还包括使用附加图像数据检测晶片上的缺陷。

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