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    레이저 암시야 시스템에서 반점을 억제하는 방법 및 장치
    1.
    发明公开
    레이저 암시야 시스템에서 반점을 억제하는 방법 및 장치 审中-公开
    用于抑制激光暗场系统中的斑点的方法和装置

    公开(公告)号：KR20180019243A

    公开(公告)日：2018-02-23

    申请号：KR20187003926

    申请日：2016-07-05

    Applicant: KLA TENCOR CORP

    Inventor： GAIND VAIBHAW ,  KIRKWOOD JASON

    IPC: H01L21/66 ,  H01L21/268 ,  H01L21/67

    CPC classification number: G01N21/9501 ,  G01N2021/8822 ,  H04N5/2256

    Abstract: 반도체샘플에서결함을검출하는장치및 방법이개시된다. 시스템은비영차가우시안조명빔을샘플의복수의위치를향해지향시키는조명모듈과, 상기비영차가우시안조명빔에응답하여상기샘플로부터산란된광을검출하고상기샘플의각 위치에대한복수의출력이미지또는신호를생성하는수집모듈을포함한다. 시스템은 (i) 하나이상의비영차가우시안조명빔의점 확산함수와실질적으로정합하는필터링된이미지또는신호부분을보유하도록상기출력이미지또는신호를처리하고, (ii) 상기샘플에서결함들을검출하기위해상기필터링된이미지또는신호부분들을분석함으로써결함을검출하는프로세서시스템을또한포함한다.

    Abstract translation: 公开了一种用于检测半导体样品中的缺陷的设备和方法。 系统高恩妃零阶高斯照明光束的照明模块，并响应于一个高斯照明光束的非字母顺序通过检测从样品散射的光，并用于样品或的每个位置的多个输出图像的朝向所述多个样本的位置的引导 还有一个用于生成信号的采集模块。 处理所述输出图像或信号的系统（i）至保持滤波的图像，或信号部分基本上一个或多个非字母顺序高斯照射束的点扩展函数相匹配，以及，（ⅱ），以检测样品中的缺陷 以及一种处理器系统，用于通过分析滤波后的图像或信号部分来检测缺陷。

    SYSTEMS AND METHODS FOR DETECTING DEFECTS ON A WAFER
    4.
    发明申请
    SYSTEMS AND METHODS FOR DETECTING DEFECTS ON A WAFER 审中-公开
    用于检测波形缺陷的系统和方法

    公开(公告)号：WO2010085679A3

    公开(公告)日：2010-10-14

    申请号：PCT/US2010021850

    申请日：2010-01-22

    Applicant: KLA TENCOR CORP ,  CHEN LU ,  KIRKWOOD JASON ,  MAHADEVAN MOHAN ,  SMITH JAMES A ,  GAO LISHENG ,  HUANG JUNQING ,  LUO TAO ,  WALLINGFORD RICHARD

    Inventor： CHEN LU ,  KIRKWOOD JASON ,  MAHADEVAN MOHAN ,  SMITH JAMES A ,  GAO LISHENG ,  HUANG JUNQING ,  LUO TAO ,  WALLINGFORD RICHARD

    IPC: H01L21/66 ,  G01N21/88

    CPC classification number: G01N21/9501 ,  G01N2021/887 ,  H01L22/12

    Abstract: Systems and methods for detecting defects on a wafer are provided. One method includes generating output for a wafer by scanning the wafer with an inspection system using first and second optical states of the inspection system. The first and second optical states are defined by different values for at least one optical parameter of the inspection system. The method also includes generating first image data for the wafer using the output generated using the first optical state and second image data for the wafer using the output generated using the second optical state. In addition, the method includes combining the first image data and the second image data corresponding to substantially the same locations on the wafer thereby creating additional image data for the wafer. The method further includes detecting defects on the wafer using the additional image data.

    Abstract translation: 提供了用于检测晶片上的缺陷的系统和方法。 一种方法包括通过使用检查系统的第一和第二光学状态的检查系统扫描晶片来产生晶片的输出。 第一和第二光学状态由检查系统的至少一个光学参数的不同值来定义。 该方法还包括使用使用第二光学状态产生的输出使用第一光学状态产生的输出和晶片的第二图像数据为晶片产生第一图像数据。 此外，该方法包括将第一图像数据和对应于晶片上基本相同位置的第二图像数据组合，从而产生用于晶片的附加图像数据。 该方法还包括使用附加图像数据检测晶片上的缺陷。

    COMPUTER-IMPLEMENTED METHODS, CARRIER MEDIA, AND SYSTEMS FOR SELECTING POLARIZATION SETTINGS FOR AN INSPECTION SYSTEM
    5.
    发明申请
    COMPUTER-IMPLEMENTED METHODS, CARRIER MEDIA, AND SYSTEMS FOR SELECTING POLARIZATION SETTINGS FOR AN INSPECTION SYSTEM 审中-公开
    计算机实现方法，载体介质和选择用于检查系统的极化设置的系统

    公开(公告)号：WO2009140411A2

    公开(公告)日：2009-11-19

    申请号：PCT/US2009043825

    申请日：2009-05-13

    Applicant: KLA TENCOR CORP ,  WALLINGFORD RICHARD ,  CHEN STEPHANIE ,  KIRKWOOD JASON ,  LUO TAO ,  ZHANG YONG ,  GAO LISHENG

    Inventor： WALLINGFORD RICHARD ,  CHEN STEPHANIE ,  KIRKWOOD JASON ,  LUO TAO ,  ZHANG YONG ,  GAO LISHENG

    IPC: G01N21/88 ,  G01B11/30 ,  G01N21/47

    CPC classification number: G01N21/21 ,  G01N21/9501 ,  G01N2021/8822 ,  G01N2021/8867

    Abstract: Computer-implemented methods, carrier media, and systems for selecting polarization settings for an inspection system for inspection of a layer of a wafer are provided. One method includes detecting a population of defects on the layer of the wafer using results of each of scans of the wafer performed with different combinations of polarization settings of the inspection system for illumination and collection of light scattered from the wafer. The method also includes identifying a subpopulation of the defects for each of the different combinations, each of which includes the defects that are common to at least two of the different combinations, and determining a characteristic of a measure of signal-to-noise for each of the subpopulations. The method further includes selecting the polarization settings for the illumination and the collection to be used for the inspection corresponding to the subpopulation having the best value for the characteristic.

    Abstract translation: 提供了计算机实现的方法，载体介质和用于选择用于检查晶片层的检查系统的偏振设置的系统。 一种方法包括使用用于照射的检查系统的偏振设置的不同组合和从晶片散射的光的收集的晶片的每次扫描的结果来检测晶片层上的缺陷群。 该方法还包括识别每个不同组合的缺陷的子群体，每个组合包括对于至少两个不同组合是共同的缺陷，以及确定每个组合的信噪比度量的特性 的亚群。 该方法还包括选择用于与用于该特征具有最佳值的亚群相对应的检查的照明和收集的偏振设置。

    METHODS AND APPARATUS FOR SPECKLE SUPPRESSION IN LASER DARK-FIELD SYSTEMS
    6.
    发明申请
    METHODS AND APPARATUS FOR SPECKLE SUPPRESSION IN LASER DARK-FIELD SYSTEMS 审中-公开
    激光雷达系统中光谱抑制的方法与装置

    公开(公告)号：WO2017011226A9

    公开(公告)日：2017-04-13

    申请号：PCT/US2016040991

    申请日：2016-07-05

    Applicant: KLA-TENCOR CORP

    Inventor： GAIND VAIBHAW ,  KIRKWOOD JASON

    IPC: H01L21/66 ,  H01L21/268 ,  H01L21/67

    CPC classification number: G01N21/9501 ,  G01N2021/8822 ,  H04N5/2256

    Abstract: Disclosed are apparatus and methods for detecting defects on a semiconductor sample. The system includes an illumination module for directing a nonzero-order Gaussian illumination beam towards a plurality of locations on a sample and a collection module for detecting light scattered from the sample in response to the nonzero-order Gaussian illumination beams and generating a plurality of output images or signals for each location on the sample. The system further comprises a processor system for detecting defects by (i) processing the output images or signals so as to retain filtered image or signal portions that substantially match a point spread function of the one or more nonzero-order Gaussian illumination beams, and (ii) analyzing the filtered image or signal portions to detect defects on the sample.

    Abstract translation: 公开了用于检测半导体样品上的缺陷的装置和方法。 该系统包括用于将非零阶高斯照明光束引导到样本上的多个位置的照明模块和用于响应于非零阶高斯照明光束检测从样本散射的光的收集模块，并且生成多个输出 样品上每个位置的图像或信号。 该系统还包括一个处理器系统，用于通过（i）处理输出图像或信号来检测缺陷，以保持基本上与一个或多个非零阶高斯照明光束的点扩散函数基本一致的滤波图像或信号部分，以及（ ii）分析滤波图像或信号部分以检测样品上的缺陷。

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