METAL/SEMICONDUCTOR-BONDED SCHOTTKY-DIODE OPTICAL ELEMENT UTILIZING DISTORTION GROWTH LAYER

    公开(公告)号:JPH08148701A

    公开(公告)日:1996-06-07

    申请号:JP31095894

    申请日:1994-12-14

    Abstract: PURPOSE: To carry out operations at high speed without thermal damages by placing the well structure of a multiple quantum having the characteristics of electro-optical absorption in an intermediate layer between a semiconductor layer and a Schottky metallic film and composing a diode of a metallic layer/a multiple quantum layer/the semiconductor layer. CONSTITUTION: Multiple quantum well structure is formed of the quantum barrier layer 6 of gallium arsenide and the quantum-well layer 7 of indium gallium arsenide in an intrinsic region. A buffer layer 8 of gallium arsenide which is not doped is formed onto the multiple quantum-well structure in a constant thickness (Lb1), and a metallic layer 9 is formed onto the buffer layer 8 for a Schottky electrode layer and a mirror layer. A metallic film layer is jointed directly to a Schottky-diode intermediate layer, a metallic layer also having superior thermal conductivity is stuck fast to the intermediate layer in the trouble of the performance deterioration of the element, due to a photocurrent organic partial temperature rise generated from large input light required for the operation of the optical element at high speed, and thermal damages are resolved, and element performance level is brought close to its limit, thus obtaining operation at high speed.

    OPTIMIZATION OF INP-BASED MULTIPLE QUANTUM WELL STRUCTURE FOR REALIZATION OF OPTICAL SWITCH FOR LONG WAVELENGTH

    公开(公告)号:JPH07294968A

    公开(公告)日:1995-11-10

    申请号:JP31295394

    申请日:1994-12-16

    Abstract: PURPOSE: To enable application to a long wavelength optical switch element by optimizing material constitution and structure by investigating the light absorbing characteristics of InGaAsP/InP as four-component mixed material structure. CONSTITUTION: This method finds out optimized structure for maximizing the ratio of light absorption and output strength by operating the wavelength area of 1.55μm as an area for applying the minimum loss value of optical fibers, by adjusting the component ratio and structure of InGaAsP/InP mixed structure. In addition the maximized value of a maximum light absorption value caused by a heavy holeexciting element at the time of generating no electric field is provided by utilizing a parameter (γ) for finding out optimized structure of InP four-component mixed material. For example, the optimized structure for maximizing the light absorption effect of the exciting element by changing (x) and (y) molar fractions and well width of In1-x Gax Asy P1-y /InP material structure to be utilized for an optical bistable switch element is determined, by using the parameter ρ=[α((0)-α(F)]/α(F) (α is a light absorption coefficient and F is the size of electric field in this case).

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