公开(公告)号：WO2013172561A3

公开(公告)日：2014-01-03

申请号：PCT/KR2013003469

申请日：2013-04-23

Applicant: KOREA RES INST OF STANDARDS

Inventor： KIM JONG-AHN ,  KIM JAE-WAN ,  EOM TAE-BONG ,  KANG CHU-SHIK ,  JIN JONG-HAN

IPC: G01D5/26 ,  G01D5/244

CPC classification number: G01D5/34707 ,  G01D5/2455 ,  G01D5/34746 ,  G01D5/34776 ,  G01D5/34792

Abstract: The present invention provides an absolute position measurement method, absolute position measurement device, and scale. The scale includes a scale pattern formed by replacing repetitively arranged pseudo-random codes with a sequence of N-stage linear feedback transition resisters by using a first symbol having a first width and representing a first state and a second symbol having the first width and representing a second state. The first symbol is divided into two or more first symbol areas, the second symbol is divided into two or more second symbol areas, and there is at least one overlap area having the same structure due to the overlap of the first symbol and the second symbol.

Abstract translation: 本发明提供绝对位置测量方法，绝对位置测量装置和刻度。 缩放比例包括通过使用具有第一宽度并表示第一状态的第一符号和具有第一宽度的第二符号代替重复排列的伪随机码与N级线性反馈转换电阻序列而形成的比例模式， 第二个状态 第一符号被划分为两个或更多个第一符号区域，第二符号被划分为两个或更多个第二符号区域，并且由于第一符号和第二符号的重叠而存在具有相同结构的至少一个重叠区域 。