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    Gasket having positioning structure for clamped monolithic showerhead electrode
    4.
    发明专利
    Gasket having positioning structure for clamped monolithic showerhead electrode 审中-公开
    夹紧单片电极定位结构的垫片

    公开(公告)号：JP2010251752A

    公开(公告)日：2010-11-04

    申请号：JP2010090225

    申请日：2010-04-09

    Applicant: Lam Res Corp ,  ラム リサーチ コーポレーションLam Research Corporation

    Inventor： BETTENCOURT GREGORY R ,  BHATTACHARYYA GAUTAM ,  SIMON GOSSELIN ,  CHAO SANDY

    IPC: H01L21/3065

    CPC classification number: H01L21/67069 ,  H01J37/16 ,  H01J37/3244 ,  H01J37/32541 ,  H01J37/32605 ,  H01J2237/166

    Abstract: PROBLEM TO BE SOLVED: To provide an electrode assembly for a plasma reaction chamber used in semiconductor substrate processing.
    SOLUTION: The assembly includes an upper side showerhead electrode 110 attached mechanically to a receiving plate by a series of cam locks separated from one another. In a position 3 to 4 inches apart from the center of the showerhead electrode 110, a gasket comprising a projecting part thereon and having thermal conductivity and electrical conductivity is compressed between the showerhead electrode 110 and a receiving plate 140. The receiving plate is surrounded by a guard ring 170 and the guard ring 170 can be moved to a position where an opening in the guard ring 170 is aligned with an opening in the receiving plate, and in this position, it is possible to rotate the cam lock by equipment in order to release a lock pin extending from the top surface of the electrode.
    COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题：提供用于半导体衬底处理中的等离子体反应室的电极组件。 解决方案：组件包括通过一系列彼此分离的凸轮锁机械地附接到接收板的上侧喷头电极110。 在距喷头电极110的中心3至4英寸的位置处，在其上具有导热性和导电性的突出部分的垫圈在喷头电极110和接收板140之间被压缩。接收板被 保护环170和保护环170可以移动到保护环170中的开口与接收板中的开口对准的位置，并且在该位置中，可以按照设备旋转凸轮锁 以释放从电极的顶表面延伸的锁定销。 版权所有（C）2011，JPO＆INPIT

    HOT EDGE RING WITH SLOPED UPPER SURFACE
    5.
    发明专利
    HOT EDGE RING WITH SLOPED UPPER SURFACE 未知

    公开(公告)号：MY152425A

    公开(公告)日：2014-09-30

    申请号：MYUI2010005121

    申请日：2010-10-29

    Applicant: LAM RES CORP

    Inventor： KOSHHIISHI AKIRA ,  MANI SATHYA ,  BHATTACHARYYA GAUTAM ,  BETTENCOURT GREGORY R ,  CHAO SANDY

    IPC: H01L21/00

    Abstract: A HOT EDGE RING WITH EXTENDED LIFETIME COMPRISES AN ANNULAR BODY HAVING A SLOPED UPPER SURFACE.THE HOT EDGE RING INCLUDES A STEP UNDERLYING AN OUTER EDGE OF A SEMICONDUCTOR SUBSTRATE SUPPORTED IN A PLASMA PROCESSING CHAMBER WHEREIN PLASMA IS USED TO PROCESS THE SUBSTRATE. THE STEP INCLUDES A VERTICAL SURFACE WHICH SURROUNDS THE OUTER EDGE OF THE SUBSTRATE AND THE SLOPED UPPER SURFACE EXTENDS UPWARDLY AND OUTWARDLY FROM THE UPPER PERIPHERY OF THE VERTICAL SURFACE.

    ANNEAU DE BORD CHAUD AVEC SURFACE SUPÉRIEURE EN PENTE
    6.
    发明专利
    ANNEAU DE BORD CHAUD AVEC SURFACE SUPÉRIEURE EN PENTE 未知

    公开(公告)号：FR2952226A1

    公开(公告)日：2011-05-06

    申请号：FR1058977

    申请日：2010-11-02

    Applicant: LAM RES CORP

    Inventor： KOSHIISHI AKIRA ,  MANI SATHYA ,  BHATTACHARYYA GAUTAM ,  BETTENCOURT GREGORY R ,  CHAO SANDY

    IPC: H01L21/673 ,  H01L21/3065

    Abstract: Anneau de bord chaud avec une durée de vie prolongée comprenant un corps annulaire ayant une surface supérieure en pente. L'anneau de bord chaud comprend un gradin sous-jacent d'un bord extérieur d'un substrat semi-conducteur supporté dans une chambre de traitement au plasma dans laquelle on utilise du plasma pour traiter le substrat. Le gradin comprend une surface verticale qui entoure le bord extérieur du substrat et la surface supérieure en pente s'étend vers le haut et vers l'extérieur à partir de la périphérie supérieure de la surface verticale. (Voir Figure 4).

    HOT EDGE RING WITH SLOPED UPPER SURFACE
    7.
    发明专利
    HOT EDGE RING WITH SLOPED UPPER SURFACE 未知

    公开(公告)号：SG170717A1

    公开(公告)日：2011-05-30

    申请号：SG2010079754

    申请日：2010-10-27

    Applicant: LAM RES CORP

    Inventor： KOSHISHI AKIRA ,  MANI SATHYA ,  BHATTACHARYYA GAUTAM ,  BETTENCOURT GREGORY R ,  CHAO SANDY

    Abstract: A hot edge ring with extended lifetime comprises an annular body having a sloped upper surface. The hot edge ring includes a step underlying an outer edge of a semiconductor substrate supported in a plasma processing chamber wherein plasma is used to process the substrate. The step includes a vertical surface which surrounds the outer edge of the substrate and the sloped upper surface extends upwardly and outwardly from the upper periphery of the vertical surface.

    CLAMPED MONOLITHIC SHOWERHEAD ELECTRODE
    8.
    发明专利
    CLAMPED MONOLITHIC SHOWERHEAD ELECTRODE 未知

    公开(公告)号：MY159992A

    公开(公告)日：2017-02-15

    申请号：MYPI2011000025

    申请日：2009-07-06

    Applicant: LAM RES CORP

    Inventor： PATRICK ROGER ,  BETTENCOURT GREGORY R ,  KELLOGG MICHAEL C

    IPC: H05H1/34 ,  C23C16/455 ,  H01J37/32 ,  H01L21/3065 ,  H05H1/38

    Abstract: AN ELECTRODE ASSEMBLY FOR A PLASMA REACTION CHAMBER USED IN SEMICONDUCTOR SUBSTRATE PROCESSING.THE ASSEMBLY INCLUDES AN UPPER SHOWERHEAD ELECTRODE WHICH IS MECHANICALLY ATTACHED TO A BACKING PLATE (140) BY A SERIES OF SPACED APART CAM LOCKS.A GUARD RING (170) SURROUNDS THE BACKING PLATE (140) AND IS MOVABLE TO POSITIONS AT WHICH OPENINGS IN THE GUARD RING (170) ALIGN WITH OPENINGS IN THE BACKING PLATE (140) SO THAT THE CAM LOCKS CAN BE ROTATED WITH A TOOL TO RELEASE LOCKING PINS EXTENDING FROM THE UPPER FACE OF THE ELECTRODE.

    CLAMPED MONOLITHIC SHOWERHEAD ELECTRODE
    10.
    发明专利
    CLAMPED MONOLITHIC SHOWERHEAD ELECTRODE 未知

    公开(公告)号：SG169960A1

    公开(公告)日：2011-04-29

    申请号：SG2010068500

    申请日：2010-09-17

    Applicant: LAM RES CORP

    Inventor： BETTENCOURT GREGORY R ,  BHATTACHARYYA GAUTAM ,  SIMON GOSSELIN ENG ,  CHAO SANDY ,  LLERA ANTHONY DE LA ,  MANKIDY PRATIK

    Abstract: An electrode assembly for a plasma reaction chamber used in semiconductor substrate processing. The assembly includes an upper showerhead electrode which is mechanically attached to a backing plate by a series of spaced apart cam locks. A guard ring surrounds the backing plate and is movable to positions at which openings in the guard ring align with openings in the backing plate so that the cam locks can be rotated with a tool to release locking pins extending from the upper face of the showerhead electrode.

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