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    플라즈마 챔버에서 사용하기 위한 링 구조체들 및 시스템들
    1.
    发明公开
    플라즈마 챔버에서 사용하기 위한 링 구조체들 및 시스템들 审中-公开

    公开(公告)号：KR20210008146A

    公开(公告)日：2021-01-20

    申请号：KR20217000935

    申请日：2017-12-15

    Applicant: LAM RES CORP

    Inventor： KELLOGG MICHAEL C ,  MACE ADAM ,  MARAKHTANOV ALEXEI ,  HOLLAND JOHN ,  CHEN ZHIGANG ,  KOZAKEVICH FELIX ,  MATYUSHKIN ALEXANDER

    IPC: H01J37/32 ,  C23C16/458 ,  C23C16/50

    Abstract: 에지링을지지링에고정하기위한시스템들및 방법들이기술된다. 에지링은에지링의하단표면에삽입되는복수의패스너들을통해지지링에고정된다. 에지링을지지링에고정하는것은플라즈마챔버내에서기판의프로세싱동안에지링의안정성을제공한다. 이에더하여, 지지링이, 플라즈마챔버의절연체벽에연결되는절연체링에고정되기때문에, 에지링을지지링에고정하는것은, 에지링을플라즈마챔버에고정한다. 게다가, 지지링 및에지링은기판의프로세싱동안하나이상의걸쇠메커니즘들을사용하여수직으로풀 다운되고플라즈마챔버로부터에지링 및지지링을제거하기위해걸쇠메커니즘들을사용하여수직으로푸시업된다.

    SHOWERHEAD ELECTRODE
    2.
    发明申请
    SHOWERHEAD ELECTRODE 审中-公开
    喷头电极

    公开(公告)号：WO2012030382A3

    公开(公告)日：2012-08-23

    申请号：PCT/US2011001500

    申请日：2011-08-25

    Applicant: LAM RES CORP ,  DE LA LLERA ANTHONY ,  MANKIDY PRATIK ,  KELLOGG MICHAEL C ,  DHINDSA RAJINDER

    Inventor： DE LA LLERA ANTHONY ,  MANKIDY PRATIK ,  KELLOGG MICHAEL C ,  DHINDSA RAJINDER

    IPC: H01L21/3065 ,  H01L21/205 ,  H05H1/46

    CPC classification number: H01R13/20

    Abstract: Abstract A showerhead electrode, a gasket set and an assembly thereof in plasma reaction chamber for etching semiconductor substrates are provided with improved a gas injection hole pattern, positioning accuracy and reduced warping, which leads to enhanced uniformity of plasma processing rate. A method of assembling the inner electrode and gasket set to a supporting member includes simultaneous engagement of cam locks.

    Abstract translation: 摘要在等离子体反应室中用于蚀刻半导体衬底的喷头电极，衬垫组件及其组件提供了改进的气体喷射孔图案，定位精度和减少的翘曲，这导致等离子体处理速率的均匀性提高。 将内部电极和垫圈组装到支撑构件上的方法包括同时接合凸轮锁。

    CAM LOCK ELECTRODE CLAMP
    3.
    发明申请
    CAM LOCK ELECTRODE CLAMP 审中-公开
    CAM锁电极夹

    公开(公告)号：WO2009114175A3

    公开(公告)日：2009-12-23

    申请号：PCT/US2009001593

    申请日：2009-03-13

    Applicant: LAM RES CORP ,  KELLOGG MICHAEL C ,  NORELL ANTHONY J ,  DE LA LIERA ANTHONY ,  DHINDSA RAJINDER

    Inventor： KELLOGG MICHAEL C ,  NORELL ANTHONY J ,  DE LA LIERA ANTHONY ,  DHINDSA RAJINDER

    IPC: H01L21/683 ,  H01L21/3065 ,  H01L21/687

    CPC classification number: H01L21/68728 ,  H01L21/687 ,  Y10T403/7005 ,  Y10T403/7007 ,  Y10T403/7041

    Abstract: A cam lock clamp comprises a stud having a substantially cylindrical body with a first end including a head area and a second end arranged to support one or more disc springs concentrically about the stud. A socket is arranged to mechanically couple concentrically around the stud with the head area of the stud being exposed above an uppermost portion of the socket. The socket is configured to be firmly attached to a consumable material. A camshaft has a substantially cylindrical body and is configured to mount within a bore of a backing plate. The camshaft further comprises an eccentric cutout area located in a central portion of the camshaft body. The camshaft is configured to engage and lock the head area of the stud when the consumable material and the backing plate are proximate to one another.

    Abstract translation: 凸轮锁定夹具包括具有基本上圆柱形主体的螺柱，其具有包括头部区域的第一端和布置成围绕螺柱同心地支撑一个或多个盘簧的第二端。 插座布置成以同心的方式围绕螺柱共同连接，螺柱的头部区域暴露在插座的最上部分之上。 插座被配置为牢固地连接到消耗材料上。 凸轮轴具有基本上圆柱形的主体并被构造成安装在背板的孔内。 凸轮轴还包括位于凸轮轴主体的中心部分的偏心切口区域。 凸轮轴构造成当消耗材料和背板彼此靠近时接合并锁定螺柱的头部区域。

    EDGE RINGS FOR ELECTROSTATIC CHUCKS
    7.
    发明申请
    EDGE RINGS FOR ELECTROSTATIC CHUCKS 审中-公开
    用于静电切割机的边缘环

    公开(公告)号：WO2010021890A3

    公开(公告)日：2010-05-14

    申请号：PCT/US2009053579

    申请日：2009-08-12

    Applicant: LAM RES CORP ,  KENWORTHY IAN JARED ,  FONG KELLY ,  KELLOGG MICHAEL C

    Inventor： KENWORTHY IAN JARED ,  FONG KELLY ,  KELLOGG MICHAEL C

    IPC: H05H1/34 ,  H01L21/205 ,  H01L21/3065

    CPC classification number: H01L21/6831 ,  H01L21/68735 ,  Y10T279/23

    Abstract: A disclosed device for use with an electrostatic chuck configured to hold a substrate in a plasma environment comprises an edge ring configured to be placed either in contact with portions of only a ceramic top piece, a base plate, or coupled to the base plate through a plurality of pins and pin slots. The edge ring is further configured to be concentric with the ceramic top piece. In one embodiment, the edge ring includes an inner edge having an edge step arranged to provide mechanical coupling between the edge ring and the outer periphery of the ceramic top piece. The edge ring further includes an outer edge and a flat portion located between the inner edge and the outer edge. The flat portion is arranged to be both horizontal when the edge ring is placed around the outer periphery of the ceramic top piece and parallel to the substrate.

    Abstract translation: 用于静电卡盘的公开的装置被配置为将基板保持在等离子体环境中包括边缘环，该边缘环被配置成与陶瓷顶部件，基板的部分接触，或者通过一个 多个引脚和引脚插槽。 边缘环进一步构造成与陶瓷顶部件同心。 在一个实施例中，边缘环包括具有边缘台阶的内边缘，该边缘台阶布置成在边缘环和陶瓷顶部件的外周边之间提供机械联接。 边缘环还包括外边缘和位于内边缘和外边缘之间的平坦部分。 当边缘环绕陶瓷顶片的外周放置并平行于基底时，平坦部分布置成水平的。

    CLAMPED SHOWERHEAD ELECTRODE ASSEMBLY
    8.
    发明申请
    CLAMPED SHOWERHEAD ELECTRODE ASSEMBLY 审中-公开
    夹紧式淋浴电极组件

    公开(公告)号：WO2010005541A3

    公开(公告)日：2010-04-22

    申请号：PCT/US2009003953

    申请日：2009-07-06

    Applicant: LAM RES CORP ,  KADKHODAYAN BABAK ,  DHINDSA RAJINDER ,  DE LA LLERA ANTHONY ,  KELLOGG MICHAEL C

    Inventor： KADKHODAYAN BABAK ,  DHINDSA RAJINDER ,  DE LA LLERA ANTHONY ,  KELLOGG MICHAEL C

    IPC: H05H1/34 ,  H01L21/3065 ,  H05H1/38

    CPC classification number: H01J37/32532 ,  H01J37/32091 ,  H01J37/3244 ,  H01J37/32449 ,  H01J37/32541 ,  H01J37/32568 ,  H01J37/32605

    Abstract: An electrode assembly for a plasma reaction chamber used in semiconductor substrate processing. The assembly includes an upper showerhead electrode which includes an inner electrode mechanically attached to a backing plate by a clamp ring and an outer electrode attached to the backing plate by a series of spaced apart cam locks. A guard ring surrounds the backing plate and is movable to positions at which openings in the guard ring align with openings in the backing plate so that the cam locks can be rotated with a tool to release cam pins extending upward from the upper face of the outer electrode. To compensate for differential thermal expansion, the clamp ring can include expansion joins at spaced locations which allow the clamp ring to absorb thermal stresses.

    Abstract translation: 用于等离子体反应室的电极组件，用于半导体衬底处理。 组件包括上喷头电极，其包括通过夹紧环机械连接到背板的内电极和通过一系列间隔开的凸轮锁附接到背板的外电极。 防护环围绕背板并且可移动到保护环中的开口与背板中的开口对准的位置，使得凸轮锁可以用工具旋转以释放从外部的上表面向上延伸的凸轮销 电极。 为了补偿差分热膨胀，夹紧环可以包括在间隔位置处的膨胀接合，这允许夹紧环吸收热应力。

    CLAMPED MONOLITHIC SHOWERHEAD ELECTRODE
    10.
    发明专利
    CLAMPED MONOLITHIC SHOWERHEAD ELECTRODE 未知

    公开(公告)号：MY159992A

    公开(公告)日：2017-02-15

    申请号：MYPI2011000025

    申请日：2009-07-06

    Applicant: LAM RES CORP

    Inventor： PATRICK ROGER ,  BETTENCOURT GREGORY R ,  KELLOGG MICHAEL C

    IPC: H05H1/34 ,  C23C16/455 ,  H01J37/32 ,  H01L21/3065 ,  H05H1/38

    Abstract: AN ELECTRODE ASSEMBLY FOR A PLASMA REACTION CHAMBER USED IN SEMICONDUCTOR SUBSTRATE PROCESSING.THE ASSEMBLY INCLUDES AN UPPER SHOWERHEAD ELECTRODE WHICH IS MECHANICALLY ATTACHED TO A BACKING PLATE (140) BY A SERIES OF SPACED APART CAM LOCKS.A GUARD RING (170) SURROUNDS THE BACKING PLATE (140) AND IS MOVABLE TO POSITIONS AT WHICH OPENINGS IN THE GUARD RING (170) ALIGN WITH OPENINGS IN THE BACKING PLATE (140) SO THAT THE CAM LOCKS CAN BE ROTATED WITH A TOOL TO RELEASE LOCKING PINS EXTENDING FROM THE UPPER FACE OF THE ELECTRODE.

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