公开(公告)号：SG175649A1

公开(公告)日：2011-11-28

申请号：SG2011075975

申请日：2007-10-10

Applicant: LAM RES CORP

Inventor： LARSON DEAN J ,  BROWN DANIEL ,  COMENDANT KEITH ,  WANG VICTOR

Abstract: An electrode assembly and method of centering an outer ring around an electrode assembly in a plasma reaction chamber used in semiconductor substrate processing. The method includes positioning the outer ring around an outer surface of a backing member of the electrode assembly, and inserting at least one centering element between the outer ring and the backing member. The centering element can be a plurality of spring-loaded centering elements received in a cavity on the outer surface of the backing member, the centering elements having a first end adapted to contact the outer ring and a second end adapted to receive a spring. The outer ring surrounds an outer surface of the backing member, such that the plurality of spring-loaded centering elements are positioned between the outer surface of the backing member and an inner surface of the outer ring.Figure 7

公开(公告)号：SG175648A1

公开(公告)日：2011-11-28

申请号：SG2011075967

申请日：2007-10-16

Applicant: LAM RES CORP

Inventor： LARSON DEAN J ,  BROWN DANIEL ,  ULLAL SAURABH J

Abstract: An electrode assembly for a plasma reaction chamber used in semiconductor substrate processing. The assembly includes an upper electrode, a backing member attachable to an upper surface of the upper electrode, and an outer ring. The outer ring surrounds an outer surface of the backing member and is located above the upper surface of the upper electrode.Figure 1