Abstract:
A bonded assembly to reduce particle contamination in a semiconductor vacuum chamber such as a plasma processing apparatus is provided, including an elastomeric sheet adhesive bond between mating surfaces of a component and a support member to accommodate thermal stresses. The elastomeric sheet comprises a silicone adhesive to withstand a high shear strain of =800% at a temperature range between room temperature and 300°C such as heat curable high molecular weight dimethyl silicone with optional fillers. The sheet form has bond thickness control for parallelism of bonded surfaces. The sheet adhesive may be cut into pre-form shapes to conform to regularly or irregularly shaped features, maximize surface contact area with mating parts, and can be installed into cavities. Installation can be manually, manually with installation tooling, or with automated machinery. Composite layers of sheet adhesive having different physical properties can be laminated or coplanar.
Abstract:
An electrode assembly and method of centering an outer ring around an electrode assembly in a plasma reaction chamber used in semiconductor substrate processing. The method includes positioning the outer ring around an outer surface of a backing member of the electrode assembly, and inserting at least one centering element between the outer ring and the backing member. The centering element can be a plurality of spring-loaded centering elements received in a cavity on the outer surface of the backing member, the centering elements having a first end adapted to contact the outer ring and a second end adapted to receive a spring. The outer ring surrounds an outer surface of the backing member, such that the plurality of spring-loaded centering elements are positioned between the outer surface of the backing member and an inner surface of the outer ring.Figure 7
Abstract:
A SHOWERHEAD ELECTRODE FOR A PLASMA PROCESSING APPARATUS INCLUDES AN ELASTOMERIC SHEET ADHESIVE BOND BETWEEN MATING SURFACES OF AN ELECTRODE AND A BACKING MEMBER TO ACCOMMODATE STRESSES GENERATED DURING TEMPERATURE CYCLING DUE TO MISMATCH IN COEFFICIENTS OF THERMAL EXPANSION. THE ELASTOMERIC SHEET COMPRISES A THERMALLY CONDUCTIVE SILICONE ADHESIVE ABLE TO WITHSTAND A HIGH SHEAR STRAIN OF ≥300% IN A TEMPERATURE RANGE OF ROOM TEMPERATURE TO 3000C SUCH AS HEAT CURABLE HIGH MOLECULAR WEIGHT DIMETHYL SILICONE WITH FILLERS. THE SHEET FORM ADHESIVE HAS BOND THICKNESS CONTROL FOR PARALLELISM OF BONDED SURFACES OVER LARGE AREAS. THE SHEET ADHESIVE MAY BE CAST OR DIE CUT INTO PREFORM SHAPES THAT CAN CONFORM TO IRREGULARLY SHAPED FEATURES, MAXIMIZE SURFACE CONTACT AREA WITH MATING ELECTRODE SURFACES, AND INSTALLED INTO CAVITIES OF THE MATING ASSEMBLY. INSTALLATION CAN BE MANUALLY, MANUALLY WITH INSTALLATION TOOLING, OR WITH AUTOMATED MACHINERY. COMPOSITE LAYERS OF SHEET ADHESIVE HAVING DIFFERENT PHYSICAL PROPERTIES CAN BE LAMINATED OR COPLANAR.
Abstract:
A COMPOSITE SHOWERHEAD ELECTRODE ASSEMBLY FOR A A showerhead electrode for a plasma processing apparatus includes an elastomeric sheet adhesive bond between mating surfaces of an electrode and a backing member to accommodate stresses generated during temperature cycling due to mismatch in coefficients of thermal expansion. The elastomeric sheet comprises a thermally conductive silicone adhesive able to withstand a high shear strain of 300% in a ≥ temperature range of room temperature to 3000C such as heat curable high molecular weight dimethyl silicone with fillers. The sheet form adhesive has bond thickness control for parallelism of bonded surfaces over large areas. The sheet adhesive may be cast or die cut into pre-form shapes that can conform to irregularly shaped features, maximize surface contact area with mating electrode surfaces, and installed into cavities of the mating assembly. Installation can be manually, manually with installation tooling, or with automated machinery. Composite layers of sheet adhesive having different physical properties can be laminated or coplanar. Figure 1 - 29 -
Abstract:
A bonded assembly to reduce particle contamination in a semiconductor vacuum chamber such as a plasma processing apparatus is provided, including an elastomeric sheet adhesive bond between mating surfaces of a component and a support member to accommodate thermal stresses. The elastomeric sheet comprises a silicone adhesive to withstand a high shear strain of =800% at a temperature range between room temperature and 300°C such as heat curable high molecular weight dimethyl silicone with optional fillers. The sheet form has bond thickness control for parallelism of bonded surfaces. The sheet adhesive may be cut into pre-form shapes to conform to regularly or irregularly shaped features, maximize surface contact area with mating parts, and can be installed into cavities. Installation can be manually, manually with installation tooling, or with automated machinery. Composite layers of sheet adhesive having different physical properties can be laminated or coplanar.Figure 1A
Abstract:
A showerhead electrode for a plasma processing apparatus includes an elastomeric sheet adhesive bond between mating surfaces of an electrode and a backing member to accommodate stresses generated during temperature cycling due to mismatch in coefficients of thermal expansion. The elastomeric sheet comprises a thermally conductive silicone adhesive able to withstand a high shear strain of 300% in a temperature range of room temperature to 3000C such as heat curable high molecular weight dimethyl silicone with fillers. The sheet form adhesive has bond thickness control for parallelism of bonded surfaces over large areas. The sheet adhesive may be cast or die cut into pre-form shapes that can conform to irregularly shaped features, maximize surface contact area with mating electrode surfaces, and installed into cavities of the mating assembly. Installation can be manually, manually with installation tooling, or with automated machinery. Composite layers of sheet adhesive having different physical properties can be laminated or coplanar.Figure 1