公开(公告)号：WO0039838A3

公开(公告)日：2000-11-16

申请号：PCT/US9931076

申请日：1999-12-28

Applicant: LAM RES CORP

Inventor： WICKER THOMAS ,  COOK JOEL ,  CHEN JIAN

IPC: H01J37/32 ,  H01L21/302 ,  H01L21/3065

CPC classification number: H01J37/32009 ,  H01J37/321 ,  H01J37/3266

Abstract: The invention relates to a plasma processing reactor for processing a substrate. The plasma processing reactor includes a process chamber. The plasma processing reactor further includes an inductive coil configured to be coupled to a RF power source having a RF frequency wherein the inductive coil generates an electric field inside of the process chamber. The plasma processing reactor additionally includes a magnetic field producing device configured to produce a magnetic field inside the process chamber in proximity of the electric field.

Abstract translation: 本发明涉及用于处理衬底的等离子体处理反应器。 等离子体处理反应器包括处理室。 等离子体处理反应器还包括电感线圈，该电感线圈被配置成耦合到具有RF频率的RF电源，其中感应线圈在处理室内产生电场。 等离子体处理反应器还包括磁场产生装置，该磁场产生装置被配置为在电场附近的处理室内部产生磁场。

公开(公告)号：AT364896T

公开(公告)日：2007-07-15

申请号：AT02719377

申请日：2002-03-29

Applicant: LAM RES CORP

Inventor： VELTROP ROBERT ,  CHEN JIAN ,  WICKER THOMAS

IPC: H01J37/32 ,  H05H1/46 ,  H01L21/205 ,  H01L21/3065

Abstract: An inductive plasma processor includes an RF plasma excitation coil having plural windings, each having a first end connected in parallel to be driven by a single RF source via a single matching network. Second ends of the windings are connected to ground by termination capacitors, in turn connected by a lead to ground. A current sensor including a winding around a toroidal core is coupled to the lead between each termination capacitor and ground. The current sensor is surrounded by a grounded shield. There is minimum electromagnetic interference from an ambient RF environment to the current sensor, to provide an accurate current sensor.