公开(公告)号：JP2004235157A

公开(公告)日：2004-08-19

申请号：JP2004032247

申请日：2004-02-09

Applicant: Lam Res Corp ,  ラム リサーチ コーポレーションLam Research Corporation

Inventor： BARNES MICHAEL ,  BENJAMIN NEIL ,  HOLLAND JOHN ,  BEER RICHARD ,  VELTROP ROBERT

IPC: H05H1/46 ,  C23C16/507 ,  H01J37/32 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065

CPC classification number: H01J37/3222 ,  H01J37/321 ,  H01J37/32238

Abstract: PROBLEM TO BE SOLVED: To provide a high frequency magnetic field excitation plasma arc cutting machine for a large work piece, which uniformly distributes plasma in the whole work piece.
SOLUTION: Means for changing a gas into plasma includes a coil (34) arranged to generate and keep plasma by exciting the gas by coupling the high frequency magnetic field with the gas through a dielectric window (19) provided in the wall of a chamber (10). The coil has a first and second terminals (62, 64) connected to a high frequency power source (36, 38) that induce the high frequency magnetic field, and a plurality of winding segments (51 to 58, 59 and 60) electrically connected between the first and second terminals with the same electrical length thereof. The elements (51 to 58) of each segments are provided parallel to the elements (51 to 58) of other segments.
COPYRIGHT: (C)2004,JPO&NCIPI

公开(公告)号：DE69523940D1

公开(公告)日：2001-12-20

申请号：DE69523940

申请日：1995-12-05

Applicant: LAM RES CORP

Inventor： BARNES MICHAEL ,  BENJAMIN NEIL ,  HOLLAND JOHN ,  BEER RICHARD ,  VELTROP ROBERT

IPC: H05H1/46 ,  C23C16/507 ,  H01J37/32 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065

Abstract: A plasma processor for large workpieces includes a vacuum chamber having plural individually supported dielectric windows for coupling an r.f. field originating outside of the chamber into the chamber to excite the plasma. A planar coil for inductively deriving the field has plural segments with the same electrical length, each including an element connected in parallel with an element of another segment.

公开(公告)号：CA2523264A1

公开(公告)日：1996-06-13

申请号：CA2523264

申请日：1995-12-05

Applicant: LAM RES CORP

Inventor： VELTROP ROBERT ,  BARNES MICHAEL ,  BEER RICHARD ,  BENJAMIN NEIL ,  HOLLAND JOHN

IPC: H05H1/46

Abstract: A plasma processor for large workpieces includes a vacuum chamber having plural individually supported dielectric windows for coupling an r.f. field originating outside of the chamber into the chamber to excite the plasma. A planar coil for inductively deriving the field has plural segments with the same electrical length, each including an element connected in parallel with an element of another segment.

公开(公告)号：AT364896T

公开(公告)日：2007-07-15

申请号：AT02719377

申请日：2002-03-29

Applicant: LAM RES CORP

Inventor： VELTROP ROBERT ,  CHEN JIAN ,  WICKER THOMAS

IPC: H01J37/32 ,  H05H1/46 ,  H01L21/205 ,  H01L21/3065

Abstract: An inductive plasma processor includes an RF plasma excitation coil having plural windings, each having a first end connected in parallel to be driven by a single RF source via a single matching network. Second ends of the windings are connected to ground by termination capacitors, in turn connected by a lead to ground. A current sensor including a winding around a toroidal core is coupled to the lead between each termination capacitor and ground. The current sensor is surrounded by a grounded shield. There is minimum electromagnetic interference from an ambient RF environment to the current sensor, to provide an accurate current sensor.

公开(公告)号：DE69523940T2

公开(公告)日：2002-04-04

申请号：DE69523940

申请日：1995-12-05

Applicant: LAM RES CORP

Inventor： BARNES MICHAEL ,  BENJAMIN NEIL ,  HOLLAND JOHN ,  BEER RICHARD ,  VELTROP ROBERT

IPC: H05H1/46 ,  C23C16/507 ,  H01J37/32 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065

Abstract: A plasma processor for large workpieces includes a vacuum chamber having plural individually supported dielectric windows for coupling an r.f. field originating outside of the chamber into the chamber to excite the plasma. A planar coil for inductively deriving the field has plural segments with the same electrical length, each including an element connected in parallel with an element of another segment.

公开(公告)号：DE69535922D1

公开(公告)日：2009-04-09

申请号：DE69535922

申请日：1995-12-05

Applicant: LAM RES CORP

Inventor： BARNES MICHAEL ,  HOLLAND JOHN ,  VELTROP ROBERT ,  BENJAMIN NEIL ,  BEER RICHARD

IPC: H01J37/32 ,  H05H1/46 ,  C23C16/507 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065

Abstract: A plasma processor for large workpieces includes a vacuum chamber having plural individually supported dielectric windows for coupling an r.f. field originating outside of the chamber into the chamber to excite the plasma. A planar coil for inductively deriving the field has plural segments with the same electrical length, each including an element connected in parallel with an element of another segment.

公开(公告)号：CA2206679A1

公开(公告)日：1996-06-13

申请号：CA2206679

申请日：1995-12-05

Applicant: LAM RES CORP

Inventor： BEER RICHARD ,  BENJAMIN NEIL ,  VELTROP ROBERT ,  HOLLAND JOHN ,  BARNES MICHAEL

IPC: H05H1/46 ,  C23C16/507 ,  H01J37/32 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/00

Abstract: A plasma processor for large workpieces includes a vacuum chamber having plural individually supported dielectric windows for coupling an r.f. field originating outside of the chamber into the chamber to excite the plasma. A planar coil for inductively deriving the field has plural segments with the same electrical length, each including an element connected in parallel with an element of another segment.

公开(公告)号：CA2206679C

公开(公告)日：2007-09-11

申请号：CA2206679

申请日：1995-12-05

Applicant: LAM RES CORP

Inventor： BENJAMIN NEIL ,  BARNES MICHAEL ,  BEER RICHARD ,  VELTROP ROBERT ,  HOLLAND JOHN

IPC: H05H1/46 ,  C23C16/507 ,  H01J37/32 ,  H01L21/00 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065

Abstract: A plasma processor for large workpieces includes a vacuum chamber having plural individually supported dielectric windows for coupling an r.f. field originating outside of the chamber into the chamber t o excite the plasma. A planar coil for inductively deriving the field has plural segments with the same electrical length, each includin g an element connected in parallel with an element of another segment.

公开(公告)号：ES2163537T3

公开(公告)日：2002-02-01

申请号：ES95942546

申请日：1995-12-05

Applicant: LAM RES CORP

Inventor： BARNES MICHAEL ,  BENJAMIN NEIL ,  HOLLAND JOHN ,  BEER RICHARD ,  VELTROP ROBERT

IPC: H05H1/46 ,  C23C16/507 ,  H01J37/32 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065

Abstract: A plasma processor for large workpieces includes a vacuum chamber having plural individually supported dielectric windows for coupling an r.f. field originating outside of the chamber into the chamber to excite the plasma. A planar coil for inductively deriving the field has plural segments with the same electrical length, each including an element connected in parallel with an element of another segment.

公开(公告)号：AU4373796A

公开(公告)日：1996-06-26

申请号：AU4373796

申请日：1995-12-05

Applicant: LAM RES CORP

Inventor： BARNES MICHAEL ,  BENJAMIN NEIL ,  HOLLAND JOHN ,  BEER RICHARD ,  VELTROP ROBERT

IPC: H05H1/46 ,  C23C16/507 ,  H01J37/32 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065

Abstract: A plasma processor for large workpieces includes a vacuum chamber having plural individually supported dielectric windows for coupling an r.f. field originating outside of the chamber into the chamber to excite the plasma. A planar coil for inductively deriving the field has plural segments with the same electrical length, each including an element connected in parallel with an element of another segment.