RING STRUCTURES AND SYSTEMS FOR USE IN A PLASMA CHAMBER

    公开(公告)号:SG11202004504VA

    公开(公告)日:2020-07-29

    申请号:SG11202004504V

    申请日:2017-12-15

    Applicant: LAM RES CORP

    Abstract: Systems and methods for securing an edge ring to a support ring are described. The edge ring is secured to the support ring via multiple fasteners that are inserted into a bottom surface of the edge ring. The securing of the edge ring to the support ring provides stability of the edge ring during processing of a substrate within a plasma chamber. In addition, the securing of the edge ring to the support ring secures the edge ring to the plasma chamber because the support ring is secured to an insulator ring, which is connected to an insulator wall of the plasma chamber. Moreover, the support ring and the edge ring are pulled down vertically using one or more clasp mechanisms during the processing of the substrate and are pushed up vertically using the clasp mechanisms to remove the edge ring and the support ring from the plasma chamber.

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