公开(公告)号：KR20210008146A

公开(公告)日：2021-01-20

申请号：KR20217000935

申请日：2017-12-15

Applicant: LAM RES CORP

Inventor： KELLOGG MICHAEL C ,  MACE ADAM ,  MARAKHTANOV ALEXEI ,  HOLLAND JOHN ,  CHEN ZHIGANG ,  KOZAKEVICH FELIX ,  MATYUSHKIN ALEXANDER

IPC: H01J37/32 ,  C23C16/458 ,  C23C16/50

Abstract: 에지링을지지링에고정하기위한시스템들및 방법들이기술된다. 에지링은에지링의하단표면에삽입되는복수의패스너들을통해지지링에고정된다. 에지링을지지링에고정하는것은플라즈마챔버내에서기판의프로세싱동안에지링의안정성을제공한다. 이에더하여, 지지링이, 플라즈마챔버의절연체벽에연결되는절연체링에고정되기때문에, 에지링을지지링에고정하는것은, 에지링을플라즈마챔버에고정한다. 게다가, 지지링 및에지링은기판의프로세싱동안하나이상의걸쇠메커니즘들을사용하여수직으로풀 다운되고플라즈마챔버로부터에지링 및지지링을제거하기위해걸쇠메커니즘들을사용하여수직으로푸시업된다.

公开(公告)号：WO0101443B1

公开(公告)日：2001-02-08

申请号：PCT/US0017088

申请日：2000-06-22

Applicant: LAM RES CORP

Inventor： HOLLAND JOHN

IPC: H05H1/46 ,  H01J37/32 ,  H01L21/302 ,  H01L21/3065

CPC classification number: H01J37/32146 ,  H01J37/321

Abstract: A vacuum plasma processor includes a coil for reactively exciting a plasma so plasma incident on a workpiece has substantially uniformity. The coil and a window which reactively couples fields from the coil to the plasma have approximately the same diameter. An r.f. source supplies a pulse amplitude modulated envelope including an r.f. carrier to the coil.

Abstract translation: 真空等离子体处理器包括用于对等离子体进行反应激发的线圈，因此入射到工件上的等离子体具有基本均匀的。 线圈和反应性地将场线从线圈耦合到等离子体的窗口具有大致相同的直径。 一个r.f. 源提供包括r.f的脉冲幅度调制包络。 载体到线圈。

公开(公告)号：JP2004235157A

公开(公告)日：2004-08-19

申请号：JP2004032247

申请日：2004-02-09

Applicant: Lam Res Corp ,  ラム リサーチ コーポレーションLam Research Corporation

Inventor： BARNES MICHAEL ,  BENJAMIN NEIL ,  HOLLAND JOHN ,  BEER RICHARD ,  VELTROP ROBERT

IPC: H05H1/46 ,  C23C16/507 ,  H01J37/32 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065

CPC classification number: H01J37/3222 ,  H01J37/321 ,  H01J37/32238

Abstract: PROBLEM TO BE SOLVED: To provide a high frequency magnetic field excitation plasma arc cutting machine for a large work piece, which uniformly distributes plasma in the whole work piece.
SOLUTION: Means for changing a gas into plasma includes a coil (34) arranged to generate and keep plasma by exciting the gas by coupling the high frequency magnetic field with the gas through a dielectric window (19) provided in the wall of a chamber (10). The coil has a first and second terminals (62, 64) connected to a high frequency power source (36, 38) that induce the high frequency magnetic field, and a plurality of winding segments (51 to 58, 59 and 60) electrically connected between the first and second terminals with the same electrical length thereof. The elements (51 to 58) of each segments are provided parallel to the elements (51 to 58) of other segments.
COPYRIGHT: (C)2004,JPO&NCIPI

公开(公告)号：DE60039874D1

公开(公告)日：2008-09-25

申请号：DE60039874

申请日：2000-06-22

Applicant: LAM RES CORP

Inventor： HOLLAND JOHN

IPC: H01J37/32 ,  H05H1/46 ,  H01L21/302 ,  H01L21/3065

Abstract: A vacuum plasma processor includes a coil for reactively exciting a plasma so plasma incident on a workpiece has substantially uniformity. The coil and a window which reactively couples fields from the coil to the plasma have approximately the same diameter. An r.f. source supplies a pulse amplitude modulated envelope including an r.f. carrier to the coil.

公开(公告)号：SG10201404083WA

公开(公告)日：2015-02-27

申请号：SG10201404083W

申请日：2014-07-15

Applicant: LAM RES CORP

Inventor： FISCHER ANDREAS ,  HOLLAND JOHN

Abstract: A plasma processing system having at least a plasma processing chamber for performing plasma processing of a substrate and utilizing at least a first processing state and a second processing state. Plasma is present above the center region of the substrate during the first processing stale to perform plasma processing of at least the center region during the first processing state. Plasma is absent above the center region of the substrate but present adjacent to the bevel edge region during the second processing state to at least perform plasma processing of the bevel edge region during the second processing state. During the second processing state, the upper electrode is in an RF floating state and the substrate is disposed on the lower electrode surface.

公开(公告)号：CA2206679C

公开(公告)日：2007-09-11

申请号：CA2206679

申请日：1995-12-05

Applicant: LAM RES CORP

Inventor： BENJAMIN NEIL ,  BARNES MICHAEL ,  BEER RICHARD ,  VELTROP ROBERT ,  HOLLAND JOHN

IPC: H05H1/46 ,  C23C16/507 ,  H01J37/32 ,  H01L21/00 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065

Abstract: A plasma processor for large workpieces includes a vacuum chamber having plural individually supported dielectric windows for coupling an r.f. field originating outside of the chamber into the chamber t o excite the plasma. A planar coil for inductively deriving the field has plural segments with the same electrical length, each includin g an element connected in parallel with an element of another segment.

公开(公告)号：ES2163537T3

公开(公告)日：2002-02-01

申请号：ES95942546

申请日：1995-12-05

Applicant: LAM RES CORP

Inventor： BARNES MICHAEL ,  BENJAMIN NEIL ,  HOLLAND JOHN ,  BEER RICHARD ,  VELTROP ROBERT

IPC: H05H1/46 ,  C23C16/507 ,  H01J37/32 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065

Abstract: A plasma processor for large workpieces includes a vacuum chamber having plural individually supported dielectric windows for coupling an r.f. field originating outside of the chamber into the chamber to excite the plasma. A planar coil for inductively deriving the field has plural segments with the same electrical length, each including an element connected in parallel with an element of another segment.

公开(公告)号：AU4373796A

公开(公告)日：1996-06-26

申请号：AU4373796

申请日：1995-12-05

Applicant: LAM RES CORP

Inventor： BARNES MICHAEL ,  BENJAMIN NEIL ,  HOLLAND JOHN ,  BEER RICHARD ,  VELTROP ROBERT

IPC: H05H1/46 ,  C23C16/507 ,  H01J37/32 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065

Abstract: A plasma processor for large workpieces includes a vacuum chamber having plural individually supported dielectric windows for coupling an r.f. field originating outside of the chamber into the chamber to excite the plasma. A planar coil for inductively deriving the field has plural segments with the same electrical length, each including an element connected in parallel with an element of another segment.

公开(公告)号：SG11202111579YA

公开(公告)日：2021-11-29

申请号：SG11202111579Y

申请日：2020-04-27

Applicant: MKS INSTR INC ,  LAM RES CORP

Inventor： RADOMSKI AARON T ,  GITLIN BENJAMIN J ,  FISK LARRY J ,  OLDZIEJ MARIUSZ ,  BURRY AARON M ,  SMYKA JONATHAN W ,  MARAKHTANOV ALEXEI ,  JI BING ,  KOZAKEVICH FELIX LEIB ,  HOLLAND JOHN ,  BHOWMICK RANADEEP

IPC: H01J37/32

Abstract: A radio frequency (RF) generator system includes first and second RF power sources, each RF power source applying a respective RF signal and second RF signal to a load. The first RF signal is applied in accordance with the application of the second RF signal. The application of the first RF signal is synchronized to application of the second RF signal. The first RF signal may be amplitude modulated in synchronization with the second RF signal, and the amplitude modulation can include blanking of the first RF signal. A frequency offset may be applied to the first RF signal in synchronization with the second RF signal. A variable actuator associated with the first RF power source may be controlled in accordance with the second RF signal.

公开(公告)号：AT457521T

公开(公告)日：2010-02-15

申请号：AT98948202

申请日：1998-09-16

Applicant: LAM RES CORP

Inventor： HOLLAND JOHN ,  DEMOS ALEX

IPC: H01J37/00 ,  H05H1/46 ,  H01J37/32 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065

Abstract: A vacuum plasma processor for treating a workpiece with an RF plasma has a plasma excitation coil including a peripheral portion supplying a substantial magnetic flux density to peripheral portions of the plasma. Additional conducting segments spatially adjacent to and electrically connected to a segment of the peripheral portion supply additional magnetic flux having a substantial magnetic flux density to the plasma peripheral portions. The additional conductor segments are in each of four corners of the coil, being connected electrically in parallel or series to coil conductor segments forming the corners. In another embodiment, the coil includes several nested conducting corner segments. In different embodiments, the corner segments are (1) coplanar with the remainder of the coil and (2) closer to the plasma than the remainder of the coil. The coil includes two electrically parallel, spiral like windings, each with an interior terminal connected to one output terminal of a matching network and an output terminal connected via a capacitor to another output terminal of the matching network. The capacitor values and the lengths of the windings relative to the plasma RF excitation wavelength are such that current flowing in the coil has maximum and minimum standing wave values in the peripheral and interior coil portions, respectively. The coil and workpiece peripheries have similar rectangular dimensions and geometries.