플라즈마 챔버에서 사용하기 위한 링 구조체들 및 시스템들

    公开(公告)号:KR20210008146A

    公开(公告)日:2021-01-20

    申请号:KR20217000935

    申请日:2017-12-15

    Applicant: LAM RES CORP

    Abstract: 에지링을지지링에고정하기위한시스템들및 방법들이기술된다. 에지링은에지링의하단표면에삽입되는복수의패스너들을통해지지링에고정된다. 에지링을지지링에고정하는것은플라즈마챔버내에서기판의프로세싱동안에지링의안정성을제공한다. 이에더하여, 지지링이, 플라즈마챔버의절연체벽에연결되는절연체링에고정되기때문에, 에지링을지지링에고정하는것은, 에지링을플라즈마챔버에고정한다. 게다가, 지지링 및에지링은기판의프로세싱동안하나이상의걸쇠메커니즘들을사용하여수직으로풀 다운되고플라즈마챔버로부터에지링 및지지링을제거하기위해걸쇠메커니즘들을사용하여수직으로푸시업된다.

    RING STRUCTURES AND SYSTEMS FOR USE IN A PLASMA CHAMBER

    公开(公告)号:SG11202004504VA

    公开(公告)日:2020-07-29

    申请号:SG11202004504V

    申请日:2017-12-15

    Applicant: LAM RES CORP

    Abstract: Systems and methods for securing an edge ring to a support ring are described. The edge ring is secured to the support ring via multiple fasteners that are inserted into a bottom surface of the edge ring. The securing of the edge ring to the support ring provides stability of the edge ring during processing of a substrate within a plasma chamber. In addition, the securing of the edge ring to the support ring secures the edge ring to the plasma chamber because the support ring is secured to an insulator ring, which is connected to an insulator wall of the plasma chamber. Moreover, the support ring and the edge ring are pulled down vertically using one or more clasp mechanisms during the processing of the substrate and are pushed up vertically using the clasp mechanisms to remove the edge ring and the support ring from the plasma chamber.

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