Abstract:
A cluster tool includes a transfer chamber connected to a plurality of vacuum chambers. An additional process chamber connected to the transfer chamber includes a high pressure chamber assembly seated on a housing. The high pressure chamber assembly, which is adjustable between an open position and a closed position, includes an upper chamber portion and a lower chamber portion. Hydraulic cylinders mounted on the upper chamber portion and having chamber rods that attach to the lower chamber portion are configured to move the lower chamber relative to the upper chamber portion between the two positions. When the two portions are brought together into the closed, the high pressure chamber assembly forms a high pressure chamber suitable for processing wafers with supercritical CO 2 . Once the high pressure chamber is formed, a region between lower chamber portion and a housing may be evacuated to form a vacuum chamber outside a portion of the high pressure chamber.
Abstract:
Methods and systems for preventing feature collapse subsequent to etching include adding a rinse liquid to a microelectronic topography having remnants of another rinse liquid arranged upon its surface and subsequently exposing the topography to a pressurized chamber including a fluid at or greater than critical pressure. The methods include flushing from the pressurized chamber liquid arranged upon the topography and, thereafter, venting the chamber in a manner sufficient to prevent liquid formation therein.
Abstract:
A cluster tool includes a transfer chamber connected to a plurality of vacuum chambers. An additional process chamber connected to the transfer chamber includes a high pressure chamber assembly seated on a housing. The high pressure chamber assembly, which is adjustable between an open position and a closed position, includes an upper and lower chamber portion. Hydraulic cylinders mounted on the upper chamber portion and having chamber rods that attach to the lower chamber portion are configured to move the lower chamber relative to the upper chamber portion between the two positions. When the two portions are in the closed position, the high pressure chamber assembly forms a high pressur chamber suitable for processing wafers with supercritical CO2. Once the high pressure chamber is formed, a region between lower chamber portion and a housing may be evacuated to form a vacuum chamber outside a portion of the high pressure chamber.
Abstract:
A load lock wafer transfer face is provided at an acute angle with respect to a footprint dimension line, so the length of the footprint dimension line does not include the entire minimum length of the wafer transfer distance that must separate a robot from the wafer transfer face of a load lock. Two adjacent load locks provided for use with a robot have two load lock wafer transfer faces defining a nest, in that each such face is at an acute angle with respect to the footprint dimension line. A robot is mounted for rotation at a fixed location relative to wafer cassettes and to the nested load lock wafer transfer faces, avoiding use of a robot track to move transversely. Because the faces are at the acute angle, there is only a component of, and not the entire, minimum wafer transfer distance extending in the direction of the footprint dimension line. The robot is positioned at least partly in the nest formed by the adjacent load lock faces without requiring rotation of the base of the robot on a vertical axis at the same time as the arms of the robot are moved in an extend motion during wafer transfer into the load lock. The footprint of the modules may be substantially reduced, in that at least one dimension of the footprint is minimized, yet the robot may operate with only relatively simple extend motion to transfer the wafers into the load locks, avoiding more complex motions that include both transverse motion (i.e., on a linear track), and rotate motion.
Abstract:
A load lock wafer transfer face is provided at an acute angle with respect to a footprint dimension line, so the length of the footprint dimension line does not include the entire minimum length of the wafer transfer distance that must separate a robot from the wafer transfer face of a load lock. Two adjacent load locks provided for use with a robot have two load lock wafer transfer faces defining a nest, in that each such face is at an acute angle with respect to the footprint dimension line. A robot is mounted for rotation at a fixed location relative to wafer cassettes and to the nested load lock wafer transfer faces, avoiding use of a robot track to move transversely. Because the faces are at the acute angle, there is only a component of, and not the entire, minimum wafer transfer distance extending in the direction of the footprint dimension line. The robot is positioned at least partly in the nest formed by the adjacent load lock faces without requiring rotation of the base of the robot on a vertical axis at the same time as the arms of the robot are moved in an extend motion during wafer transfer into the load lock. The footprint of the modules may be substantially reduced, in that at least one dimension of the footprint is minimized, yet the robot may operate with only relatively simple extend motion to transfer the wafers into the load locks, avoiding more complex motions that include both transverse motion (i.e., on a linear track), and rotate motion.
Abstract:
A dual sided slot valve is in a vacuum body between adjacent process and transport modules. Separate valves are provided for each of two valve body slots, one body slot being separately closed or opened independently of the other. The separate valves allow a vacuum in the transport module while an adjacent process module is open to the atmosphere for servicing. The valve allows access to an open valve for servicing the open valve in that one actuator motor stops the valve in an open, but not vertically-spaced, position relative to the respective slot. The open valve is more easily reached by a gloved hand of a service worker. A separate actuator motor moves the valve vertically down from the open position and away from the slot to expose the sealing surface around the slot for cleaning. The vertical distance of the vertically-moved valve from an access opening makes it difficult for the worker's glove to reach the valve for service. However, in the vertically-moved position the valve does not interfere with the ability to clean around the valve door. The dual sided slot valves are offset relative to each other to reduce the distance occupied by the valve body between the adjacent transport and process modules.
Abstract:
A CLUSTER TOOL (300, 400) INCLUDES A TRANSFER CHAMBER (302, 402) CONNECTED TO A PLURALITY OF VACUUM CHAMBERS. AN ADDITIONAL PROCESS CHAMBER (320, 420) CONNECTED TO THE TRANSFER CHAMBER (302, 402) INCLUDES A HIGH PRESSURE CHAMBER (322, 520) ASSEMBLY (520) SEATED ON A HOUSING (502). THE HIGH PRESSURE CHAMBER (322, 520) ASSEMBLY (520), WHICH IS ADJUSTABLE BETWEEN AN OPEN POSITION AND A CLOSED POSITION, INCLUDES AN UPPER CHAMBER PORTION (522) AND A LOWER CHAMBER PORTION (524). HYDRAULIC CYLINDERS MOUNTED ON THE UPPER CHAMBER PORTION (522) AND HAVING CHAMBER RODS THAT ATTACH TO THE LOWER CHAMBER PORTION (524) ARE CONFIGURED TO MOVE THE LOWER CHAMBER RELATIVE TO THE UPPER CHAMBER PORTION (522) BETWEEN THE TWO POSITIONS. WHEN THE TWO PORTIONS ARE BROUGHT TOGETHER INTO THE CLOSED, THE HIGH PRESSURE CHAMBER (322, 520) ASSEMBLY (520) FORMS A HIGH PRESSURE CHAMBER (322, 520) SUITABLE FOR PROCESSING WAFERS WITH SUPERCRITICAL CO2. ONCE THE HIGH PRESSURE CHAMBER (322, 520) IS FORMED, A REGION BETWEEN LOWER CHAMBER PORTION (524) AND A HOUSING (502) MAY BE EVACUATED TO FORM A VACUUM CHAMBER OUTSIDE A PORTION OF THE HIGH PRESSURE CHAMBER (322, 520). MOST ILLUSTRATIVE DRAWING:
Abstract:
A dual sided slot valve is in a vacuum body between adjacent process and transport modules. Separate valves are provided for each of two valve body slots, one body slot being separately closed or opened independently of the other. The separate valves allow a vacuum in the transport module while an adjacent process module is open to the atmosphere for servicing. The valve allows access to an open valve for servicing the open valve in that one actuator motor stops the valve in an open, but not vertically-spaced, position relative to the respective slot. The open valve is more easily reached by a gloved hand of a service worker. A separate actuator motor moves the valve vertically down from the open position and away from the slot to expose the sealing surface around the slot for cleaning. The vertical distance of the vertically-moved valve from an access opening makes it difficult for the worker's glove to reach the valve for service. However, in the vertically-moved position the valve does not interfere with the ability to clean around the valve door. The dual sided slot valves are offset relative to each other to reduce the distance occupied by the valve body between the adjacent transport and process modules.
Abstract:
A load lock wafer transfer face is provided at an acute angle with respect to a footprint dimension line, so the length of the footprint dimension line does not include the entire minimum length of the wafer transfer distance that must separate a robot from the wafer transfer face of a load lock. Two adjacent load locks provided for use with a robot have two load lock wafer transfer faces defining a nest, in that each such face is at an acute angle with respect to the footprint dimension line. A robot is mounted for rotation at a fixed location relative to wafer cassettes and to the nested load lock wafer transfer faces, avoiding use of a robot track to move transversely. Because the faces are at the acute angle, there is only a component of, and not the entire, minimum wafer transfer distance extending in the direction of the footprint dimension line. The robot is positioned at least partly in the nest formed by the adjacent load lock faces without requiring rotation of the base of the robot on a vertical axis at the same time as the arms of the robot are moved in an extend motion during wafer transfer into the load lock. The footprint of the modules may be substantially reduced, in that at least one dimension of the footprint is minimized, yet the robot may operate with only relatively simple extend motion to transfer the wafers into the load locks, avoiding more complex motions that include both transverse motion (i.e., on a linear track) and rotate motion.
Abstract:
A LOAD LOCK WAFER TRANSFER FACE (216) IS PROVIDED AT AN ACUTE ANGLE WITH RESPECT TO A FOOTPRINT DIMENSION LINE (228), SO THE LENGTH OF A DISTANCE (230) ALONG THE FOOTPRINT DIMENSION LINE (228) DOES NOT INCLUDE THE ENTIRE MINIMUM LENGTH OF THE WAFER TRANSFER DISTANCE (127) THAT MUST SEPARATE A ROBOT (212) FROM THE WAFER TRANSFER FACE (216) OF A LOAD LOCK (204). TWO ADJACENT LOAD LOCKS (204) PROVIDED FOR USE WITH A ROBOT (212) HAVE TWO LOAD LOCK WAFER TRANSFER FACES (216) DEFINING A NEST (248), IN THAT EACH SUCH FACE (216) IS AT AN CUTE ANGLE WITH RESPECT TO THE FOOTPRINT DIMENSION LINE (228). A ROBOT (212) IS MOUNTED FOR ROTATION AT AFIXED LOCATION RELATIVE TO WAFER CASSETTES (210) AND TO THE NESTED LOAD LOCK WAFER TRANSFER FACES (216), AVOIDING USE OF A ROBOT TRACK (112) TO MOVE TRANSVERSELY. BECAUSE THE FACES (216) ARE AT ACUTE ANGLE, THERE IS ONLY A COMPONENT (232) OF, AND NOT THE ENTIRE, MINIMUM WAFER TRANSFER DISTANCE (127) EXTENDING IN THE DIRECTION OF THE FOOTPRINT DIMENSION LINE (228). THE ROBOT (212) IS POSITIONED AT LEAST PARTLY IN THE NEST (248) FORMED BY THE ADJACENT LOAD LOCK FACES (216) WITHOUT REQUIRING ROTATION OF THE BASE (260) OF THE ROBOT (212) ON A VERTICAL AXIS (214) AT THE SAME TIME AS THE ARMS OF THE ROBOT (212) ARE MOVED IN AN EXTEND MOTION DURING WAFER TRANSFER INTO THE LOAD LOCK (204). A FOOTPRINT OF A SYSTEM INCLUDING THE LOAD LOCKS MAY BE SUBSTANTIALLY REDUCED, IN THAT AT LEAST ONE DIMENSION OF THE FOOTPRINT IS MINIMIZED, YET THE ROBOT (212) MAY OPERATE WITH ONLY RELATIVELY SIMPLE EXTEND MOTION TO TRANSFER THE WAFER (208) INTO THE LOAD LOCKS (204), AVOIDING MORE COMPLEX MOTIONS THAT INCLUDE BOTH TRANSVERSE MOTION (I.E., ON A LINEAR TRACK) AND ROTATE MOTION.FIGURE 2A