公开(公告)号：KR20200130473A

公开(公告)日：2020-11-18

申请号：KR20207031652

申请日：2019-04-02

Applicant: LAM RES CORP

Inventor： SHAREEF IQBAL A ,  SMITH DENNIS ,  DAUGHERTY JOHN E

IPC: G01F1/48 ,  G01F1/84

Abstract: 유체전달시스템은 N 개의제 1 밸브들을포함한다. N 개의제 1 밸브들의유입구들은 N 개의가스소스들에각각유체적으로연결되고, 여기서 N은 0보다큰 정수이다. N 개의질량유량제어기들은 N 개의제 1 밸브들중 대응하는밸브의유출구와유체로연통하는유입구를갖는 MEMS (microelectromechanical) 코리올리 (Coriolis) 유량센서를포함한다. 제 2 밸브는 MEMS 코리올리유량센서의유출구와유체로연통하는유입구및 프로세싱챔버에배치된기판을처리하기위해유체를공급하는유출구를갖는다. 제어기는 MEMS 코리올리유량센서와통신하고 MEMS 코리올리유량센서를통해흐르는유체의질량유량레이트 (mass flow rate) 및밀도중 적어도하나를결정하도록구성된다.

公开(公告)号：WO2009155221A3

公开(公告)日：2010-03-25

申请号：PCT/US2009047279

申请日：2009-06-12

Applicant: LAM RES CORP ,  YUN GUNSU ,  SHAREEF IQBAL A ,  JORGENSEN KURT ,  CHARATAN ROBERT

Inventor： YUN GUNSU ,  SHAREEF IQBAL A ,  JORGENSEN KURT ,  CHARATAN ROBERT

IPC: H01L21/00 ,  H01L21/02

CPC classification number: G05D7/0635 ,  Y10T137/7761

Abstract: A method for establishing a mass flow controller (MFC) control scheme, which is configured for reducing a time scale for gas delivery into a processing chamber, for a recipe is provided. The method includes identifying a set of delayed gas species utilized during execution of the recipe with a set of delivery time slower than a target delivery time scale. The method also includes establishing an initial overshoot strength and an initial overshoot duration for each gas specie of the set of delayed gas species. The method further includes establishing MFC control scheme by adjusting an MFC hardware for each gas specie during the execution of the recipe. Adjusting the MFC hardware includes applying the initial overshoot strength for the initial overshoot duration to determine if the MFC control scheme provides for each gas specie a pressure profile within a target accuracy of an equilibrium pressure for the processing chamber.

Abstract translation: 提供了一种用于建立质量流量控制器（MFC）控制方案，其被配置为用于减少用于配方的气体输送到处理室中的时间标度。 该方法包括在具有比目标递送时间标度慢的一组递送时间的情况下识别在执行配方期间使用的一组延迟气体种类。 该方法还包括为该组延迟气体种类的每种气体物质建立初始过冲强度和初始过冲持续时间。 该方法还包括在执行配方期间通过调整每种气体样品的MFC硬件来建立MFC控制方案。 调整MFC硬件包括对初始过冲持续时间应用初始过冲强度，以确定MFC控制方案是否为每种气体提供在处理室的平衡压力的目标精度内的压力分布。

公开(公告)号：SG176489A1

公开(公告)日：2011-12-29

申请号：SG2011084670

申请日：2007-11-14

Applicant: LAM RES CORP

Inventor： SHAREEF IQBAL A ,  TIETZ JIM ,  WONG VERNON ,  MEINECKE RICH

Abstract: OF THE DISCLOSUREA method for delivering a process gas to a reaction chamber of a plasma processing system using a recipe having a recipe flow rate is provided. The method includes delivering the process gas by a gas flow delivery system controlled by a mass flow controller (MFC) to an orifice. The predicted flow rate is previously computed by pressurizing a gas. The predicted flow rate further being previously computed measuring a set of upstream pressure values of the gas via at least one pressure sensor. The method also includes applying, using a programmed computing device, a calibration factor of a set of calibration factors to determine the predicted flow rate, the calibration factor being a ratio of an average of the set of upstream pressure values to an average of a set of golden upstream pressure values.Figure: 2