公开(公告)号：WO2005020264A2

公开(公告)日：2005-03-03

申请号：PCT/US2004027064

申请日：2004-08-20

Applicant: LAM RES CORP ,  DHINDSA RAJINDER ,  SADJADI REZA S M ,  KOZAKEVICH FELIX ,  TRUSSELL DAVE ,  LI LUMIN ,  LENZ ERIC ,  RUSU CAMELIA ,  SRINIVASAN MUKUND ,  EPPLER AARON ,  TIETZ JIM ,  MARKS JEFFREY

Inventor： DHINDSA RAJINDER ,  SADJADI REZA S M ,  KOZAKEVICH FELIX ,  TRUSSELL DAVE ,  LI LUMIN ,  LENZ ERIC ,  RUSU CAMELIA ,  SRINIVASAN MUKUND ,  EPPLER AARON ,  TIETZ JIM ,  MARKS JEFFREY

IPC: H01J37/32 ,  H01J

CPC classification number: H01J37/32174 ,  H01J37/32082 ,  H01J37/32165

Abstract: A workpiece is processed with a plasma in a vacuum plasma processing chamber by exciting the plasma at several frequencies such that the excitation of the plasma by the several frequencies simultaneously causes several different phenomena to occur in the plasma. The chamber includes central top and bottom electrodes and a peripheral top and/or bottom electrode arrangement that is either powered by RF or is connected to a reference potential by a filter arrangement that passes at least one of the plasma excitation ftequencies to the exclusion of other frequencies.

Abstract translation: 通过以几个频率激发等离子体，在真空等离子体处理室中用等离子体处理工件，使得等离子体被几个频率激发同时导致在等离子体中发生几种不同的现象。 腔室包括中心顶部和底部电极以及由RF供电的外围顶部和/或底部电极装置，或者通过将至少一个等离子体激发频率传递到排除另一个等离子体激发频率的滤波器装置连接到参考电位 频率。

公开(公告)号：EP1661171A4

公开(公告)日：2009-03-11

申请号：EP04781695

申请日：2004-08-20

Applicant: LAM RES CORP

Inventor： DHINDSA RAJINDER ,  SADJADI REZA S M ,  KOZAKEVICH FELIX ,  TRUSSELL DAVE ,  LI LUMIN ,  LENZ ERIC ,  RUSU CAMELIA ,  SRINIVASAN MUKUND ,  EPPLER AARON ,  TIETZ JIM ,  MARKS JEFFREY

IPC: H01J37/32 ,  B23B3/10 ,  H01L21/311 ,  H01L21/467 ,  H05H1/46

CPC classification number: H01J37/32174 ,  H01J37/32082 ,  H01J37/32165

Abstract: A workpiece (18) is processed with a plasma (8) in a vacuum plasma processing chamber (10) by exciting the plasma at several frequencies (51, 52, 54, 56, 58), such that the excitation of the plasma by the several frequencies simultaneously causes several different phenomena to occur in the plasma. The chamber includes top central (14, 36, 36a) and bottom electrodes (13, 16) and a peripheral top (42) and/or bottom electrode (34) arrangement that is either powered by RF or is connected to a reference potential by a filter arrangement that passes at least one of the plasma excitation ftequencies to the exclusion of other frequencies. Controller 24 is employed to direct parameter control of various motors (M), valves (V), frequencies (58), power (59), temperature control means (25, 45) and set points (50).

公开(公告)号：SG176489A1

公开(公告)日：2011-12-29

申请号：SG2011084670

申请日：2007-11-14

Applicant: LAM RES CORP

Inventor： SHAREEF IQBAL A ,  TIETZ JIM ,  WONG VERNON ,  MEINECKE RICH

Abstract: OF THE DISCLOSUREA method for delivering a process gas to a reaction chamber of a plasma processing system using a recipe having a recipe flow rate is provided. The method includes delivering the process gas by a gas flow delivery system controlled by a mass flow controller (MFC) to an orifice. The predicted flow rate is previously computed by pressurizing a gas. The predicted flow rate further being previously computed measuring a set of upstream pressure values of the gas via at least one pressure sensor. The method also includes applying, using a programmed computing device, a calibration factor of a set of calibration factors to determine the predicted flow rate, the calibration factor being a ratio of an average of the set of upstream pressure values to an average of a set of golden upstream pressure values.Figure: 2

公开(公告)号：SG133600A1

公开(公告)日：2007-07-30

申请号：SG2007045271

申请日：2004-08-20

Applicant: LAM RES CORP US

Inventor： DHINDSA RAJINDER ,  SADJADI REZA S M ,  KOZAKEVICH FELIX ,  TRUSSELL DAVE ,  LI LUMIN ,  LENZ ERIC ,  RUSU CAMELIA ,  SRINIVASAN MUKUND ,  EPPLER AARON ,  TIETZ JIM ,  MARKS JEFFREY

IPC: H01J37/32

Abstract: A method of processing a workpiece (18) with a plasma in a vacuum plasma processing chamber (10) having a bottom electrode (13) below the workpiece, comprising the step of exciting a plasma with electric energy at several frequencies, i.e. three or more, such that the excitation of the plasma by applying energy at the several frequencies simultaneously causes several different phenomena to occur in the plasma, wherein the phenomena affct plasma ion energy, plasma ion densityand plasma chemistry. An apparatus for carrying out this method comprises an electric energy source arrangement (51) for supplying the several frequencies (F1, F2, F3) to the bottom electrode.