Microscopic dimension measuring apparatus
    3.
    发明专利

    公开(公告)号:JP2004117365A

    公开(公告)日:2004-04-15

    申请号:JP2003338380

    申请日:2003-09-29

    CPC classification number: G01B11/00

    Abstract: PROBLEM TO BE SOLVED: To conduct critical microscopic dimension measurement reproducibly and to eliminate the influence of a measuring point and orientation of a characteristic part.
    SOLUTION: The microscopic dimension measuring apparatus (1) comprises a light source (2), a beam forming optical system (3), and a condenser (11). Between the beam forming optical system (3) and the condenser (11), first, a first microlens array (5) is placed which comprises each microlens (I, II, III) producing a divergent light flux so that a pupil (9) of the condenser is filled. Behind the microlens array (5), a first auxiliary optical element (6) is placed which has positive refracting power so that the pupil (9) of the condenser is placed on a focal plane. Behind the first auxiliary optical element (6), a second auxiliary optical element (16) having positive refracting power is placed. Behind the second auxiliary optical element (16), a second microlens array (17) is placed. Illumination based on the Kohler's principle is produced, and highly homogeneous field illumination appears which has rotationally symmetric intensity distribution with respect to the pupil (9) of the condenser simultaneously.
    COPYRIGHT: (C)2004,JPO

    DEVICE AND METHOD FOR INSPECTING AN OBJECT

    公开(公告)号:AU2003253422A1

    公开(公告)日:2004-03-11

    申请号:AU2003253422

    申请日:2003-08-21

    Abstract: A device and method for inspecting an object ( 2 ) uses a bright field illumination beam path ( 4 ) of a bright field light source ( 5 ), said beam path being formed so that it passes through the projection optics ( 3 ), and a dark field illumination beam path ( 6 ) of a dark field light source ( 7 ), this beam path being formed so that it also passes through the projection optics ( 3 ). The object ( 2 ) can be projected by the projection optics ( 3 ) onto the least one detector ( 8 ), and the object ( 2 ) is simultaneously illuminated by both light sources ( 5, 7 ). In order to simultaneously detect bright field images and dark field images without involving complicated filtering operations, the light used for the dark field illumination is pulsed and the pulse intensity of the light used for the dark field illumination is greater by at least one order of magnitude than the intensity of the continuous light, which is used for the bright field illumination, during a pulsed interval.

    6.
    发明专利
    未知

    公开(公告)号:DE10245473A1

    公开(公告)日:2004-04-08

    申请号:DE10245473

    申请日:2002-09-28

    Abstract: Critical dimension measurement instrument (1) has a light source (2), radiation shaping optics (3) and a condenser (11). Between shaping optics and condenser is micro-lens array (5), with each lens generating a divergent beam bundle that fills the condenser pupil. Following the array is an optical auxiliary element with positive refractive coefficient with its focal plane coinciding with the condenser pupil. A second auxiliary optical element of positive refractive coefficient and a second micro-lens array are then position in the beam path prior to the condenser.

    7.
    发明专利
    未知

    公开(公告)号:DE10204367A1

    公开(公告)日:2003-09-18

    申请号:DE10204367

    申请日:2002-02-02

    Abstract: Autofocus module for a microscope system (2) comprises: at least two light sources (20, 21) each of which generates a light beam (22) for focussing; optical deflector or prism (27, 32) for deflection of a part of each beam into an beam that is used to illuminate an object; and at least first and second detectors (35, 45) for detecting light originating from respective light sources reflected from the object. Independent claims are included for: (1) a corresponding microscope system; (2) autofocus method. According to the method the optimal focal position is determined using the measured intensities on the first and second detectors.

    8.
    发明专利
    未知

    公开(公告)号:DE10204367B4

    公开(公告)日:2006-05-11

    申请号:DE10204367

    申请日:2002-02-02

    Abstract: Autofocus module for a microscope system (2) comprises: at least two light sources (20, 21) each of which generates a light beam (22) for focussing; optical deflector or prism (27, 32) for deflection of a part of each beam into an beam that is used to illuminate an object; and at least first and second detectors (35, 45) for detecting light originating from respective light sources reflected from the object. Independent claims are included for: (1) a corresponding microscope system; (2) autofocus method. According to the method the optimal focal position is determined using the measured intensities on the first and second detectors.

    10.
    发明专利
    未知

    公开(公告)号:DE10239548A1

    公开(公告)日:2004-03-04

    申请号:DE10239548

    申请日:2002-08-23

    Abstract: A device and method for inspecting an object ( 2 ) uses a bright field illumination beam path ( 4 ) of a bright field light source ( 5 ), said beam path being formed so that it passes through the projection optics ( 3 ), and a dark field illumination beam path ( 6 ) of a dark field light source ( 7 ), this beam path being formed so that it also passes through the projection optics ( 3 ). The object ( 2 ) can be projected by the projection optics ( 3 ) onto the least one detector ( 8 ), and the object ( 2 ) is simultaneously illuminated by both light sources ( 5, 7 ). In order to simultaneously detect bright field images and dark field images without involving complicated filtering operations, the light used for the dark field illumination is pulsed and the pulse intensity of the light used for the dark field illumination is greater by at least one order of magnitude than the intensity of the continuous light, which is used for the bright field illumination, during a pulsed interval.

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