公开(公告)号：JP2001166168A

公开(公告)日：2001-06-22

申请号：JP2000344642

申请日：2000-11-13

Applicant: LUCENT TECHNOLOGIES INC

Inventor： XIE YA-HONG ,  SHMULOVICH JOSEPH ,  GLEBOV ALEXEI ,  BRUCE ALLAN J

IPC: G02B6/12 ,  G02B6/122 ,  G02B6/13

Abstract: PROBLEM TO BE SOLVED: To provide a method for manufacturing an optical device of a silica base on a silicon substrate. SOLUTION: This optical device has a clad layer formed within the silicon substrate. The optical device has an active region which is formed on the clad layer. The clad layer is formed by forming a region of porous silicon on the silicon substrate. The porous silicon is thereafter oxidized and is made higher in density. The active region of the optical device after the treatment to make the density higher is formed on the clad layer.

公开(公告)号：JP2001042273A

公开(公告)日：2001-02-16

申请号：JP2000214298

申请日：2000-07-14

Applicant: LUCENT TECHNOLOGIES INC

Inventor： BRUCE ALLAN J ,  GLEBOV ALEXEI ,  SHMULOVICH JOSEPH ,  XIE YA-HONG

IPC: G02B6/12 ,  G02F1/01 ,  G02F1/313

Abstract: PROBLEM TO BE SOLVED: To provide a method of controlling the heat flow from a heated waveguide transferred through a substrate. SOLUTION: The optical device which is a waveguide is formed on a silicon substrate 20 and is equipped with a heating element 25 on the waveguide. The waveguide is formed on the region of a porous silicon 15 formed on the silicon substrate. The porous silicon region has higher resistance against the heat flow than that of the silicon substrate on which the device is to be formed. Optionally, the porous silicon region has higher resistance against the heat flow than that of the waveguide.

公开(公告)号：CA2323683A1

公开(公告)日：2001-05-30

申请号：CA2323683

申请日：2000-10-18

Applicant: LUCENT TECHNOLOGIES INC

Inventor： BRUCE ALLAN JAMES ,  GLEBOV ALEXEI ,  SHMULOVICH JOSEPH ,  XIE YA-HONG

IPC: G02B6/12 ,  G02B6/122 ,  G02B6/13

Abstract: A process for fabricating a silica-based optical device on a silicon substrate is disclosed. The device has a cladding formed in a silicon substrate. The device also has an active region, and that active region is formed on the cladding. The cladding is fabricated by forming a region of porous silicon in the silicon substrate. The porous silicon is then oxidized and densified. After densification, the active region of the device is formed on the cladding.

公开(公告)号：CA2323683C

公开(公告)日：2006-06-06

申请号：CA2323683

申请日：2000-10-18

Applicant: LUCENT TECHNOLOGIES INC

Inventor： BRUCE ALLAN JAMES ,  SHMULOVICH JOSEPH ,  XIE YA-HONG ,  GLEBOV ALEXEI

IPC: G02B6/13 ,  G02B6/12 ,  G02B6/122

Abstract: A process for fabricating a silica-based optical device on a silicon substra te is disclosed. The device has a cladding formed in a silicon substrate. The devi ce also has an active region, and that active region is formed on the cladding. The cladding is fabricated by forming a region of porous silicon in the silicon substrate . The porous silicon is then oxidized and densified. After densification, the acti ve region of the device is formed on the cladding.